Resistive memory devices having laser-induced graphene composites and methods of making same

US2022055904A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2022055904-A1
Application numberUS-201917419231-A
CountryUS
Kind codeA1
Filing dateDec 30, 2019
Priority dateDec 28, 2018
Publication dateFeb 24, 2022
Grant date

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  1. Title

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Abstract

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Resistive memory devices having laser-induced graphene (LIG) composites, and methods of making resistive memory devices having LIG composites.

First claim

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1 - 116 . (canceled) 117 . A method of making a resistive memory device comprising: (a) selecting a LIG composite; and (b) depositing a metal by e-beam evaporation on the LIG composite. 118 . The method of claim 117 further comprising performing an O 2 plasma treatment on LIG composite before the step of depositing. 119 . The method of claim 117 , wherein the metal comprises Al. 120 . The method of claim 117 , wherein the LIG composite comprises LIG-PDMS composite. 121 . The method of claim 117 further comprising: (a) utilizing a laser to irradiate a substrate to form LIG on the substrate; and (b) forming the LIG composition from the LIG on the substrate. 122 . The method of claim 117 , wherein the step of depositing comprising utilizing a shadow mask. 123 . The method of claim 117 , wherein the resistive memory device is capable of resistive switch behavior at a tensile strain of 77% without degradation. 124 . A resistive memory device comprising a LIG composite. 125 . The resistive memory device of claim 124 , wherein the resistive memory device is made by a method of comprising (a) selecting a LIG composite; and (b) depositing a metal by e-beam evaporation on the LIG composite. 126 . The resistive memory device of claim 124 , wherein the LIG composite comprises LIG-PDMS composite. 125 A- 126 A. (canceled) 127 - 128 . (canceled) 129 . The resistive memory device of claim 123 , wherein the resistive memory device is capable of resistive switch behavior at a tensile strain of 7.7% without degradation.

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Classifications

  • CuInSe2 material PV cells · CPC title

  • Resistance change memory devices, e.g. resistive RAM [ReRAM] devices · CPC title

  • Fuel cells · CPC title

  • Manufacture or treatment of nanostructures · CPC title

  • for inserting or intercalating light metals · CPC title

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What does patent US2022055904A1 cover?
Resistive memory devices having laser-induced graphene (LIG) composites, and methods of making resistive memory devices having LIG composites.
Who is the assignee on this patent?
B G Negev Technologies And Applications Ltd At Ben Gurion Univ, Univ Rice William M
What technology area does this patent fall under?
Primary CPC classification C01B32/194. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Feb 24 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).