Electrode For Electrolysis

Patent metadata

Field	Value
Publication number	US-2022018032-A1
Application number	US-202017311850-A
Country	US
Kind code	A1
Filing date	Feb 17, 2020
Priority date	Feb 22, 2019
Publication date	Jan 20, 2022
Grant date	—

Abstract

The present invention provides an electrode for electrolysis in which a planarized metal substrate having a mesh structure such that the aspect ratio of an individual cross-section of a wire constituting the mesh structure is 120% or greater is used to increase the surface area of a coating layer, thereby increasing adhesion to a membrane and gas trap is reduced to reduce overvoltage.

First claim

1 . An electrode for electrolysis comprising:
A metal substrate layer having a mesh structure; and A coating layer including a ruthenium-based oxide, a cerium-based oxide, a platinum-based oxide, and an amine-based compound, wherein the coating layer is formed on the surface of a wire constituting the mesh structure, and an individual cross-section of the wire has an aspect ratio of 120% or greater.

2 . The electrode for electrolysis of claim 1 , wherein the aspect ratio is 120-180%.

3 . The electrode for electrolysis of claim 1 , wherein a metal of the metal substrate layer is one of nickel, titanium, tantalum, aluminum, hafnium, zirconium, molybdenum, tungsten, stainless steel, or an alloy thereof.

4 . The electrode for electrolysis of claim 1 , wherein a thickness of the metal substrate layer is 100-300 μm.

5 . A method for manufacturing an electrode for electrolysis, comprising:
Planarizing a metal substrate having a mesh structure such that an aspect ratio of an individual cross-section of a wire constituting the mesh structure is 120% or greater; Applying a coating composition on a surface of the wire of the planarized metal substrate; and Performing coating by drying and firing the metal substrate applied with the coating composition, Wherein the coating composition includes a ruthenium-based precursor, a cerium-based precursor, a platinum-based precursor, and an amine-based compound.

6 . The method of claim 5 , wherein the planarizing is performed by roll-pressing or chemical etching.

7 . The method of claim 5 , wherein the metal substrate is a nickel substrate.

8 . The method of claim 5 , wherein
The ruthenium-based precursor is one or more selected from the group consisting of ruthenium hexafluoride (ruf 6 ), ruthenium (III) chloride (rucl 3 ), ruthenium (III) chloride hydrate (rucl 3 -xh 2 o), ruthenium (III) bromide (rubr 3 ), ruthenium (III) bromide hydrate (rubr 3 -xh 2 o), ruthenium (III) iodide (rui 3 ), and acetic acid ruthenium salt, The cerium-based precursor is one or more selected from the group consisting of cerium (III) nitrate hexahydrate (Ce(NO 3 ) 3 .6H 2 O), cerium (IV) sulfate tetrahydrate (Ce(SO 4 ) 2 .4H 2 O), and cerium (III) chloride heptahydrate (cecl 3 .7H 2 O), and The platinum-based precursor is one or more selected from the group consisting of chloroplatinic acid hexahydrate (h 2 ptcl 6 .6H 2 O), diamine dinitro platinum (Pt(NH 3 ) 2 (NO) 2 ), platinum (IV) chloride (ptcl 4 ), platinum (II) chloride (ptcl 2 ), potassium tetrachloroplatinate (k 2 ptcl 4 ), and potassium hexachloroplatinate (k 2 ptcl 6 ).

9 . The method of claim 5 , wherein the amine-based compound is urea.

10 . The method of claim 5 , wherein the applying, drying, and firing are each performed 5-20 times, repeatedly.

Assignees

• Lg Chemical Ltd

Inventors

• Eom Hee Jun
• Kim Yeon Yi
• Kim Myung Hun
• Lee Dong Chul
• Jung Sang Yun
• Hwang Gyo Hyun
• Jung Jong Wook
• Bang Yong Ju

Classifications

• C25B11/095 Primary

  at least one of the compounds being organic · CPC title

• C25B11/052 Primary

  Electrodes comprising one or more electrocatalytic coatings on a substrate · CPC title

• C25B11/063

  Valve metal, e.g. titanium · CPC title

• C25B1/46

  in diaphragm cells · CPC title

• C25B11/093

  at least one noble metal or noble metal oxide and at least one non-noble metal oxide · CPC title