Process for reducing the content of boron compounds in halosilane-containing compositions

US2022017546A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2022017546-A1
Application numberUS-201817294455-A
CountryUS
Kind codeA1
Filing dateDec 7, 2018
Priority dateDec 7, 2018
Publication dateJan 20, 2022
Grant date

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Abstract

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The content of boron compounds in a composition containing at least one halosilane is reduced by bringing the composition into contact with at least one phenylsilane and removing the at least one halosilane. The invention further relates to the use of phenylsilanes for removing boron compounds from halosilane-containing compositions.

First claim

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1 .- 16 . (canceled) 17 . A method for reducing the content of boron compounds in a composition containing at least one halosilane, comprising the steps of a) bringing the composition into contact with at least one phenylsilane, b) removing the at least one halosilane by means of a thermal separation method, wherein the phenylsilane is selected from the group consisting of the phenylsilanes of formulae A, B, C, and D, and mixtures thereof wherein R 1 , R 2 , R 3 each individually, are H, alkyl, F, Cl, Br, I, R 5 , or OR 5 , where R 5 each individually is alkyl, aryl, or polyether, and R 4 each individually is H, alkyl, aryl, F, Cl, Br, or I. 18 . The method of claim 17 , wherein R 4 ═H and R 1 , R 2 , R 3 each individually are H, Cl, Me, Et, or Ph. 19 . The method of claim 17 , wherein at least one phenylsilane is selected from the group consisting of the phenylsilanes A1, A2, A3, A4, A5 and A6. 20 . The method of claim 17 , wherein the thermal separation method comprises a distillation. 21 . The method of claim 17 , wherein the halosilane removed in step b) has a boron content of less than 1 ppmw. 22 . The method of claim 17 , wherein the halosilane removed in step b) has a boron content of less than 0.1 ppmw. 23 . The method of claim 17 , wherein the halosilane removed in step b) has a boron content of less than 0.01 ppmw. 24 . The method of claim 17 , wherein the boiling point of the phenylsilane is above 145° C. 25 . The method of claim 17 , wherein the boiling point of the phenylsilane is above 145° C. to 250° C. 26 . The method of claim 17 , wherein the boiling point of the phenylsilane is above 150 to 201° C. 27 . The method of claim 17 , wherein the phenylsilane is used in an amount of 1 ppmw to 5% by weight, based on the amount of chlorosilane. 28 . The method of claim 17 , wherein the phenylsilane is used in an amount of 100 ppmw to 3% by weight, based on the amount of chlorosilane. 29 . The method of claim 17 , wherein the phenylsilane is used in an amount of 1 ppmw to 1% by weight, based on the amount of chlorosilane. 30 . The method of claim 17 , wherein step a) is carried out at a temperature of −80 to 600° C. 31 . The method of claim 17 , wherein step a) is carried out at a temperature of −40 to 350° C. 32 . The method of claim 17 , wherein step a) and/or step b) is carried out continuously. 33 . The method of claim 17 , wherein halosilane comprises chlorosilanes of formulae H n SiCl 4-n , H m Cl 6-m Si 2 , (CH 3 ) n SiCl 4-n where n=1-4 and m=0-4, (CH 3 ) n H m SiCl 4-n-m where n=0-4 and m=0, 1, and Me n Si 2 Cl 6-n where n=1-6. 34 . The method of claim 17 , wherein the boron compounds are halogen compounds of boron. 35 . The method of claim 17 , wherein the composition is a product stream from the production of chlorosilane by the process of low-temperature conversion, high-temperature conversion or hydrochlorination, or is a product stream from the production of organochlorosilane by the Müller-Rochow process. 36 . The method of claim 17 , wherein steps a) and b) are incorporated into an integrated system for the production of polycrystalline silicon or into an integrated system for the production of silicones. 37 . A process for removing boron compounds from compositions containing at least one halosilane comprising employing at least one phenylsilanes of formulae A, B, C or D 38 . The process of claim 37 , wherein R 4 each individually is H or R 1 , and R 2 , R 3 each individually are H, Cl, Me, Et, or Ph. 39 . The process of claim 37 , wherein at least one phenylsilane is selected from the group consisting of the phenylsilanes A1, A2, A3, A4, A5 and A6.

Assignees

Inventors

Classifications

  • C07F7/20Primary

    Purification, separation · CPC title

  • prepared by hydrochlorination of silicon or of a silicon-containing material · CPC title

  • Boron compounds · CPC title

  • Purification · CPC title

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What does patent US2022017546A1 cover?
The content of boron compounds in a composition containing at least one halosilane is reduced by bringing the composition into contact with at least one phenylsilane and removing the at least one halosilane. The invention further relates to the use of phenylsilanes for removing boron compounds from halosilane-containing compositions.
Who is the assignee on this patent?
Wacker Chemie Ag
What technology area does this patent fall under?
Primary CPC classification C07F7/20. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jan 20 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).