Processing method of wafer

US2021391217A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2021391217-A1
Application numberUS-202117330590-A
CountryUS
Kind codeA1
Filing dateMay 26, 2021
Priority dateJun 10, 2020
Publication dateDec 16, 2021
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

There is provided a processing method of a wafer for processing the wafer that includes, on a front surface side, a device region in which a device is formed in each of plural regions marked out by plural planned dividing lines and includes a recess part on the back surface side and includes an annular reinforcing part at a peripheral part. The processing method of a wafer includes a holding step of holding the bottom surface of the recess part, a cutting step of cutting the wafer along the planned dividing lines by a cutting blade to divide the device region into plural device chips and form grooves on the front surface side of the reinforcing part, and a dividing step of dividing the reinforcing part along the planned dividing lines with the grooves being the points of origin by giving an external force to the reinforcing part.

First claim

Opening claim text (preview).

What is claimed is: 1 . A processing method of a wafer for processing the wafer that includes, on a front surface side, a device region in which a device is formed in each of a plurality of regions marked out by a plurality of planned dividing lines arranged in a lattice manner to intersect each other and includes a recess part formed in a region corresponding to the device region on a back surface side and includes an annular reinforcing part that surrounds the device region and the recess part at a peripheral part, the processing method of a wafer comprising: a tape sticking step of sticking an adhesive tape to the back surface side of the wafer along the recess part and the reinforcing part; a holding step of holding a bottom surface of the recess part by a first chuck table with intervention of the adhesive tape; a cutting step of cutting the wafer along the planned dividing lines by a cutting blade to divide the device region into a plurality of device chips and form grooves on the front surface side of the reinforcing part; and a dividing step of dividing the reinforcing part along the planned dividing lines with the grooves being points of origin by giving an external force to the reinforcing part. 2 . The processing method of a wafer according to claim 1 , wherein, in the dividing step, by sucking the adhesive tape by a second chuck table having recesses and projections at a position corresponding to the reinforcing part of the wafer in a state in which the wafer is supported by the second chuck table, the adhesive tape is disposed along the recesses and projections to divide the reinforcing part. 3 . The processing method of a wafer according to claim 1 , further comprising: a separation step of separating the device region and the reinforcing part by annularly cutting a peripheral part of the device region by the cutting blade after execution of the holding step and before execution of the dividing step. 4 . The processing method of a wafer according to claim 1 , further comprising: a reinforcing part removal step of removing the reinforcing part by jetting fluid to the reinforcing part after execution of the dividing step. 5 . The processing method of a wafer according to claim 4 , wherein the fluid is jetted from a center side of the wafer toward a peripheral side of the wafer. 6 . The processing method of a wafer according to claim 4 , wherein the fluid is mixed fluid containing a gas and a liquid. 7 . The processing method of a wafer according to claim 4 , wherein the fluid is a liquid. 8 . The processing method of a wafer according to claim 1 , further comprising: a scribed line forming step of forming a plurality of scribed lines in the reinforcing part along a radial direction of the reinforcing part after execution of the cutting step and before execution of the dividing step.

Assignees

Inventors

Classifications

  • used during dicing or grinding · CPC title

  • Wafer tapes, e.g. grinding or dicing support tapes · CPC title

  • Located in scribe lines · CPC title

  • Marks applied to devices, e.g. for alignment or identification · CPC title

  • H10P54/00Primary

    Cutting or separating of wafers, substrates or parts of devices · CPC title

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What does patent US2021391217A1 cover?
There is provided a processing method of a wafer for processing the wafer that includes, on a front surface side, a device region in which a device is formed in each of plural regions marked out by plural planned dividing lines and includes a recess part on the back surface side and includes an annular reinforcing part at a peripheral part. The processing method of a wafer includes a holding st…
Who is the assignee on this patent?
Disco Corp
What technology area does this patent fall under?
Primary CPC classification H10P54/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Dec 16 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).