X-ray fluorescence analyzer
US-2015362445-A1 · Dec 17, 2015 · US
US2021313086A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2021313086-A1 |
| Application number | US-201915734238-A |
| Country | US |
| Kind code | A1 |
| Filing date | Nov 11, 2019 |
| Priority date | Nov 13, 2018 |
| Publication date | Oct 7, 2021 |
| Grant date | — |
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The invention relates to a method of manufacturing a structured grating, a corresponding structured grating component ( 1 ) and an imaging system. The method comprising the steps of: providing ( 110, 120, 130 ) a catalyst ( 30 ) on a substrate ( 20 ), the catalyst ( 20 ) having a grating pattern; growing ( 140 ) nanostructures ( 50 ) on the catalyst ( 30 ) so as to form walls ( 52 ) and trenches ( 54 ) based on the grating pattern; and filling ( 160 ) the trenches ( 54 ) between the walls ( 52 ) of nanostructures ( 50 ) using an X-ray absorbing material ( 70 ). The invention provides an improved method for manufacturing a structured grating and such structured grating component ( 1 ), which is particularly suitable for dark-field X-ray imaging or phase-contrast imaging.
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1 . A method of manufacturing a structured grating, the method comprising: providing a catalyst on a substrate, the catalyst having a grating pattern; growing nanostructures on the catalyst to form walls and trenches based on the grating pattern; and filling the trenches between the walls of nanostructures using an X-ray absorbing material. 2 . The method according to claim 1 , wherein the nanostructures are grown using a material having a lower X-ray absorbance than the X-ray absorbing material. 3 . The method according to claim 1 , wherein the nanostructures comprise carbon nanotubes. 4 . The method according to claim 1 , further including applying a passivation layer prior to filling the trenches using the X-ray absorbing material. 5 . The method according to claim 4 , wherein applying the passivation layer includes a chemical vapor deposition. 6 . The method according to claim 4 , wherein the passivation layer is applied to a defined distance from the substrate, wherein the defined distance is less than 2 μm. 7 . The method according to claim 4 , wherein filling the trenches comprises electroplating. 8 . The method according to claim 1 , wherein filling the trenches comprises at least one of: mechanical filling using mechanical stress, high temperature and underpressure; filling the trenches with a metal powder embedded in a binder substance and baking the binder substance to achieve solid filling of the trenches; and imprinting the grating structures using the grown nanostructures. 9 . The method according to claim 1 , further comprising bending the grating structure to adjust the grating structure to a cone beam of an X-ray source. 10 . A structured grating component, comprising: a substrate; a catalyst on the substrate, the catalyst having a grating pattern; nanostructures on the substrate forming walls and trenches based on the grating pattern; and X-ray absorbing material filling the trenches between the walls of nanostructures, wherein the nanostructures include carbon nanotubes. 11 . The structured grating component according to claim 10 , further comprising: a passivation layer arranged between the X-ray absorbing material and the nanostructures. 12 . The structured grating component according to claim 10 , wherein the substrate is in direct contact with the X-ray absorbing material. 13 . The structured grating component according to claim 10 , wherein the nanostructures comprise support elements joining two adjacent walls, wherein the support elements are provided at different positions in a longitudinal direction on two opposite sides of a wall, respectively. 14 . An imaging system, comprising a structured grating component according to claim 10 .
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