Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance

Patent metadata

Field	Value
Publication number	US-2021292505-A1
Application number	US-201816611527-A
Country	US
Kind code	A1
Filing date	May 8, 2018
Priority date	May 9, 2017
Publication date	Sep 23, 2021
Grant date	—

Abstract

The invention relates to a layer construction comprising a curable protective layer C and a photopolymer layer B, to a method for producing such a layer construction, to a method for producing a hologram using such a layer construction, to a sealed holographic medium and to the use of such a layer construction for producing a hologram.

First claim

1 .- 15 . (canceled)

16 . A Layer construction comprising a curable protective layer C and an areal photopolymer layer B which is at least partly joined to the protective layer C, wherein the protective layer C comprises
I) at least one thermoplastic resin selected from the group consisting of polyvinylbutyral with M w ≥100 000 g/mol or amorphous polymethyl methacrylate with M w ≥100 000 g/mol; II) at least one reactive diluent selected from the group consisting of pentaerythritol triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, compound of formula (Ia)

compound of formula (Ib)

compound of formula (Ic)

wherein in formulae (Ia) to (Ic)
R 1 is independently at each occurrence a radiation-curable group and
X is independently at each occurrence a single bond between R 1 and C═O or a linear, branched or cyclic optionally heteroatom-containing and/or optionally functional-group-substituted hydrocarbon radical,
compound of formula (II)

wherein in formula (II)
R 1 and X are as defined in formula (Ia)-(Ic),
R 11 is a linear or branched, optionally heteroatom-substituted aliphatic, aromatic or araliphatic radical,
R 12 is independently at each occurrence up to four substituents selected from methyl, ethyl, propyl, n-butyl, tert-butyl, chlorine, bromine, iodine, methylthio, phenyl and/or phenylthio,
R 13 is independently at each occurrence up to five substituents selected from methyl, ethyl, propyl, n-butyl, tert-butyl, chlorine, bromine, iodine, methylthio, phenyl and/or phenylthio,
compound of formula (III)

i) which is substituted at at least one of the carbon atoms 1, 2, 3, 4, 5, 6, 7, 8 with an R acryl radical of formula (IV),

wherein in formula (IV)
R 1 is as defined in formula (Ia)-(Ic),
R 21 is oxygen or sulfur,
R 22 is a carboxamide (—C(O)N—) or a carboxylic ester (—C(O)O—) or a sulfonamide (—SO 2 N—) group,
R 23 is a saturated or unsaturated or linear or branched optionally substituted radical comprising 2-10 carbon atoms or a polyether comprising up to five (—CH 2 —CH 2 —O—)— or (—C(CH 3 )H—CH 2 —O—)— groups or a polyamine comprising up to five nitrogen atoms, and

ii) the compound of formula (III) is at at least one further carbon atom 1, 2, 3, 4, 5, 6, 7, 8 substituted with a radical of formula (V),

wherein in formula (V)
the carbon atoms of the compound of formula (V) are each independently substituted with hydrogen, halogen, a cyano group, a nitro group or an optionally substituted alkyl, alkenyl, alkynyl, aralkyl, aryl or heteroaryl group or an optionally substituted alkoxy or alkylthio group or any substituted carbamoyl group, which also may be linked bridgingly to a radical of formula (III), or a trifluoromethyl group or a trifluoromethoxy group or an R acryl′ radical of formula (VI),

wherein in formula (VI)
R 1′ has the same definition as R 1 in formula (IV),
R 21′ is oxygen or sulfur,
R 22′ is a carboxamide (—C(O)N—) or a carboxylic ester (—C(O)O—) or a sulfonamide (—SO2N—) group,
R 23′ is a saturated or unsaturated or linear or branched optionally substituted radical comprising 2-10 carbon atoms or a polyether comprising up to five (—CH 2 —CH 2 —O—)— or (—C(CH 3 )H—CH 2 —O—)— groups or a polyamine comprising up to five nitrogen atoms,

iii) the remaining carbon atoms of the compound of formula (III) are each independently substituted with hydrogen, halogen, a cyano group, a nitro group or an optionally substituted alkyl, alkenyl, alkynyl, aralkyl, aryl or heteroaryl group or an optionally substituted alkoxy or alkylthio group or a trifluoromethyl group or a trifluoromethoxy group, and
compound of formula (VII)

wherein in formula (VII)
R 31 , R 32 , R 33 are each independently of one another OH, halogen or an organic radical, wherein at least one of the radicals is an organic radical comprising a radiation-curable group; and

III) comprises at least one photoinitiator.

17 . The layer construction according to claim 16 , wherein the photopolymer layer B is disposed on a substrate layer A, wherein the photopolymer layer B is on one side at least partly joined to the substrate layer A and the photopolymer layer B is on the other side at least partly joined to the protective layer C.

18 . The layer construction according to claim 16 , wherein the protective layer C is disposed on a substrate layer D, wherein the protective layer C is on one side at least partly joined to the substrate layer D and the protective layer C is on the other side at least partly joined to the photopolymer layer B.

19 . The layer construction according to claim 16 , wherein the layer construction consists of at least four layers at least partly joined to one another, wherein the layers are arranged directly atop one another in the sequence substrate layer A, photopolymer layer B, protective layer C and substrate layer D.

20 . A process for producing a layer construction according to claim 16 , wherein atop a photopolymer layer B a protective layer C is applied wherein the protective layer C comprises
I) at least one thermoplastic resin selected from the group consisting of polyvinylbutyral with M w ≥100 000 g/mol or amorphous polymethyl methacrylate with M w ≥100 000 g/mol; II) at least one reactive diluent selected from the group consisting of pentaerythritol triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, compound of formula (Ia)

compound of formula (Ib)

compound of formula (Ic)

wherein in formulae (Ia) to (Ic)
R 1 is independently at each occurrence a radiation-curable group and
X is independently at each occurrence a single bond between R 1 and C═O or a linear, branched or cyclic optionally heteroatom-containing and/or optionally functional-group-substituted hydrocarbon radical,
compound of formula (II)

Assignees

• Covestro Deutschland Ag

Inventors

• Kostromine Serguei
• Herzberg Benjamin
• Rölle Thomas
• Hönel Dennis
• Fäcke Thomas
• Auweiler Heinz-Guenter

Classifications

• C08L33/12

  Homopolymers or copolymers of methyl methacrylate · CPC title

• C08K5/5398

  Phosphorus bound to sulfur · CPC title

• G11B2007/25402

  consisting essentially of organic resins · CPC title

• C08J7/04 Primary

  Coating · CPC title

• C08L29/14

  Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols · CPC title