Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance
US-11267943-B2 · Mar 8, 2022 · US
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Patent family 58772332
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 58772332 |
| Family type | — |
| Earliest priority | May 9, 2017 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US11267943B2 — Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance |
Representative publication
Best representative member for this family based on priority and filing country.
US11267943B2 — Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance (published Mar 8, 2022)
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