Method for Forming an Extreme Ultraviolet Lithography Pellicle

Patent metadata

Field	Value
Publication number	US-2021191255-A1
Application number	US-202017131297-A
Country	US
Kind code	A1
Filing date	Dec 22, 2020
Priority date	Dec 23, 2019
Publication date	Jun 24, 2021
Grant date	—

Abstract

According to an aspect of the present disclosure there is provided a method for forming an EUVL pellicle, the method comprising: coating a carbon nanotube, CNT, membrane, and mounting the CNT membrane to a pellicle frame, wherein coating the CNT membrane comprises: pre-coating CNTs of the membrane with a seed material, and forming an outer coating on the pre-coated CNTs, the outer coating covering the pre-coated CNTs, the forming of the outer coating comprising depositing a coating material on the pre-coated CNTs by atomic layer deposition.

First claim

What is claimed is:

1 . A method for forming an Extreme Ultraviolet Lithography (EUVL) pellicle, the method comprising:
coating a carbon nanotube (CNT) membrane; and mounting the CNT membrane to a pellicle frame;
wherein coating the CNT membrane comprises:
pre-coating CNTs of the membrane with a seed material; and
forming an outer coating on the pre-coated CNTs, the outer coating covering the pre-coated CNTs, the forming of the outer coating comprising depositing a coating material on the pre-coated CNTs by atomic layer deposition.

2 . The method according to claim 1 , wherein the seed material is deposited to form a seed layer with an average thickness in a range of 0.5 to 4 nm.

3 . The method according to claim 1 , wherein the seed material is deposited to form a seed layer with an average thickness in a range of 0.5 to 3 nm.

4 . The method according to claim 1 , wherein the seed material is deposited to form a seed layer with an average thickness in a range of 1 to 2 nm.

5 . The method according to claim 1 , wherein the seed material is deposited at a rate of 0.7 angstroms/s or lower.

6 . The method according to claim 1 , wherein the coating material is deposited to form an outer coating with an average thickness in the range of 0.5 to 4 nm.

7 . The method according to claim 1 , wherein the coating material is deposited to form an outer coating with an average thickness in the range of 1 to 2 nm.

8 . The method according to claim 1 , wherein the seed material is selected from the group of: C, Zr, ZrN, Hf, HfN, B, B 4 C, BN, Y, YN, La, LaN, SiC, SiN, Ti, TiN, W, Be, Au, Ru, Al, Mo, MoN, Sr, Nb, Sc, Ca, Ni, Ni—P, Ni—B, Cu, and Ag.

9 . The method according to claim 1 , wherein the coating material is Zr, Al, B, C, Hf, La, Nb, Mo, Ru, Si, Ti, or Y, or carbides, nitrides, or oxides thereof.

10 . The method according to claim 1 , wherein the seed material and the coating material are selected from the group of: Zr seed material and ZrO 2 coating material; B seed material and ZrO 2 coating material, HfO 2 coating material or Al 2 O 3 coating material; B 4 C seed material and ZrO 2 coating material, HfO 2 coating material or Al 2 O 3 coating material; Zr seed material and Al 2 O 3 coating material or ZrAlOx coating material; Mo seed material and ZrO 2 coating material.

11 . The method according to claim 1 , wherein pre-coating the CNTs with seed material comprises depositing seed material by physical vapor deposition.

12 . The method according to claim 11 , wherein the seed material is deposited by thermal evaporation, e-beam evaporation or remote plasma sputtering.

13 . The method according to claim 11 , wherein pre-coating the CNTs with seed material comprises depositing seed material from a first side of the membrane and then depositing seed material from a second opposite side of the membrane.

14 . A method according to claim 13 , wherein pre-coating is performed in a deposition tool comprising a substrate holder supporting the membrane, and wherein the deposition of seed material is performed during continuous rotation of the substrate holder.

15 . The method according to claim 1 , wherein pre-coating the CNTs with seed material comprises depositing seed material by electrochemical deposition or electroplating.

16 . The method according to claim 1 , wherein the coating material is deposited by thermal atomic layer deposition.

17 . The method according to claim 1 , wherein the CNT membrane is coated prior to being mounted to the pellicle frame.

18 . A method for forming an Extreme Ultraviolet Lithography (EUVL) pellicle, the method comprising:
coating a carbon nanotube (CNT) membrane; and
mounting the CNT membrane to a pellicle frame;
wherein coating the CNT membrane comprises:
pre-coating CNTs of the membrane with a seed material by physical vapor deposition; and
forming an outer coating on the pre-coated CNTs, the outer coating covering the pre-coated CNTs, the forming of the outer coating comprising depositing a coating material on the pre-coated CNTs by atomic layer deposition.

Assignees

• Imec Vzw

Inventors

• Timmermans Marina
• Huyghebaert Cedric
• Pollentier Ivan
• Schapmans Elie
• Gallagher Emily

Classifications

• G03F1/62 Primary

  Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof · CPC title

• G03F1/22

  Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof · CPC title

• G03F7/70983

  Optical system protection, e.g. pellicles or removable covers for protection of mask · CPC title

• G03F1/64 Primary

  characterised by the frames, e.g. structure or material, including bonding means therefor · CPC title