Chemical agent for forming water repellent protective film and surface treatment method for wafers

Patent metadata

Field	Value
Publication number	US-2020350176-A1
Application number	US-201816957331-A
Country	US
Kind code	A1
Filing date	Dec 26, 2018
Priority date	Jan 15, 2018
Publication date	Nov 5, 2020
Grant date	—

Abstract

According to the present disclosure, there is provided a water-repellent protective film-forming liquid chemical capable of achieving an improved water repellency imparting effect. The water-repellent protective film-forming liquid chemical according to the present disclosure contains the following compositions: (I) an aminosilane composition of the following general formula [1]; (II) a silicon compound of the following general formula [2]; and (III) an aprotic solvent, wherein the amount of the component (I) contained is 0.02 to 0.5 mass % based on the total amount of the components (I) to (III).
(R 1 ) a Si(H) b (NH 2 ) 4-a-b   [1]

(R 2 ) c Si(H) d X 4-c-d   [2]

First claim

1 . A water-repellent protective film-forming liquid chemical, comprising the following components:
(I) an aminosilane compound of the following general formula [1]; (II) a silicon compound of the following general formula [2]; and (III) an aprotic solvent, wherein the amount of the component (I) contained in the liquid chemical is 0.02 to 0.5 mass % based on the total amount of the components (I) to (III),
(R 1 ) a Si(H) b (NH 2 ) 4-a-b   [1]

where R 1 is each independently a monovalent organic group having a monovalent hydrocarbon structure of 1 to 18 carbon atoms in which a part or all of hydrogen atoms may be substituted with a fluorine atom; a is an integer of 1 to 3; b is an integer of 0 to 2; and the sum of a and b is 1 to 3,
(R 2 ) c Si(H) d X 4-c-d   [2]

where R 2 is each independently a monovalent organic group having a monovalent hydrocarbon structure of 1 to 18 carbon atoms in which a part or all of hydrogen atoms may be substituted with a fluorine atom; X is at least one group selected from the group consisting of a halogen atom, a —OC(═O)R 3 group, a —OS(═O) 2 —R 3 group, a —N(S(═O) 2 —R 3 ) 2 group and a —C(S(═O) 2 —R 3 ) 3 group; R 3 is a monovalent perfluoroalkyl group of 1 to 6 carbon atoms; c is an integer of 1 to 3; d is an integer of 0 to 2; and the sum of c and d is 1 to 3.

2 . The water-repellent protective film-forming liquid chemical according to claim 1 , wherein the component (I) is a compound of the following general formula [3]
(R 1 ) e Si(H) f NH 2   [3]

where R 1 is each independently a monovalent organic group having a monovalent hydrocarbon structure of 1 to 18 carbon atoms in which a part or all of hydrogen atoms may be substituted with a fluorine atom; e is an integer of 1 to 3; f is an integer of 0 to 2; and the sum of e and f is 3.

3 . The water-repellent protective film-forming liquid chemical according to claim 1 , further comprising: the following component: (IV) a silazane compound of the following general formula [4]
[(R 1 ) e Si(H) f ] 2 NH  [4]

where R 1 is each independently a monovalent organic group having a monovalent hydrocarbon structure of 1 to 18 carbon atoms in which a part or all of hydrogen atoms may be substituted with a fluorine atom; e is an integer of 1 to 3; f is an integer of 0 to 2; and the sum of e and f is 3.

4 . The water-repellent protective film-forming liquid chemical according to claim 1 , wherein the amount of the component (II) contained in the liquid chemical is 0.05 to 20 mass % based on the total amount of the components (I) to (III).

5 . The water-repellent protective film-forming liquid chemical according to claim 1 , wherein the component (II) is at least one kind of compound selected from the group consisting of those of the following general formula [5]
(R 2 ) g Si(OC(═O)R 3 ) 4-g   [5]

where R 2 is each independently a monovalent organic group having a monovalent hydrocarbon structure of 1 to 18 carbon atoms in which a part or all of hydrogen atoms may be substituted with a fluorine atom; R 3 is a monovalent perfluoroalkyl group of 1 to 6 carbon atoms; and g is an integer of 1 to 3.

6 . A surface treatment method for a wafer, comprising: a water-repellent protective film-forming step of, in a state that at least one kind of liquid selected from the group consisting of a cleaning liquid and a rinse liquid is retained on a surface of the wafer, replacing the liquid with a water-repellent protective film-forming liquid chemical and retaining the water-repellent protective film-forming liquid chemical on the surface of the wafer; and a drying step,
wherein the water-repellent protective film-forming liquid chemical comprises the following components: (I) an aminosilane compound of the following general formula [1]; (II) a silicon compound of the following general formula [2]; and (III) an aprotic solvent, and wherein the amount of the component (I) contained in the liquid chemical is 0.02 to 0.5 mass % based on the total amount of the components (I) to (III),
(R 1 ) a Si(H) b (NH 2 ) 4-a-b   [1]

where R 1 is each independently a monovalent organic group having a monovalent hydrocarbon structure of 1 to 18 carbon atoms in which a part or all of hydrogen atoms may be substituted with a fluorine atom; a is an integer of 1 to 3; b is an integer of 0 to 2; and the sum of a and b is 1 to 3,
(R 2 ) c Si(H) d X 4-c-d   [2]

where R 2 is each independently a monovalent organic group having a monovalent hydrocarbon structure of 1 to 18 carbon atoms in which a part or all of hydrogen atoms may be substituted with a fluorine atom; X is at least one group selected from the group consisting of a halogen atom, a —OC(═O)R 3 group, a —OS(═O) 2 —R 3 group, a —N(S(═O) 2 —R 3 ) 2 group and a —C(S(═O) 2 —R 3 ) 3 group; R 3 is a monovalent perfluoroalkyl group of 1 to 6 carbon atoms; c is an integer of 1 to 3; d is an integer of 0 to 2; and the sum of c and d is 1 to 3.

7 . The surface treatment method for the wafer according to claim 6 , wherein the component (I) is a compound of the following general formula [3]
(R 1 ) e Si(H) f NH 2   [3]

where R 1 is each independently a monovalent organic group having a monovalent hydrocarbon structure of 1 to 18 carbon atoms in which a part or all of hydrogen atoms may be substituted with a fluorine atom; e is an integer of 1 to 3; f is an integer of 0 to 2; and the sum of e and f is 3.

8 . The surface treatment method for the wafer according to claim 6 , wherein the water-repellent protective film-forming liquid chemical further comprises the following component: (IV) a silazane compound of the following general formula [4]
[(R 1 ) e Si(H) f ] 2 NH  [4]

where R 1 is each independently a monovalent organic group having a monovalent hydrocarbon structure of 1 to 18 carbon atoms in which a part or all of hydrogen atoms may be substituted with a fluorine atom; e is an integer of 1 to 3; f is an integer of 0 to 2; and the sum of e and f is 3.

9 . The surface treatment method for the wafer according to claim 6 , further comprising, before the water-repellent protective film-forming step, a liquid chemical preparation step of bringing, into contact with a raw chemical containing the following components: (II) the silicon compound of the general formula [2]; (IV) a silazane compound of the following general formula [4]; and (III) the aprotic solvent, a protic compound in an amount of 0.001 to 0.3 mol relative to 1 kg of the total amount of the components (II), (III) and (IV), thereby preparing the water-repellent protective film-forming liquid chemical containing the components (I) to (III) wherein the amount of the component (I) contained in the liquid chemical is 0.02 to 0.5 mass % based on the total amount of the components (I) to (III),
[(R 1 ) e Si(H) f ] 2 NH  [4]

where R 1 is each independently a monovalent organic group having a monovalent hydrocarbon structure of 1 to 18 carbon atoms in which a part or all of hydrogen atoms may be substituted with a fluorine atom; e is an integer of 1 to 3; f is an integer of 0 to 2; and the sum of e and f is 3.

10 . The surface treatment method for the wafer according to claim 8 , further comprising, before the water-repellent protective film-forming step, a liquid chemical preparation step of bringing, into contact with a raw chemical containing the following components: (II) the silicon compound of the general formula [2]; (IV) a silazane compound of the following general formula [4]; and (III) the aprotic solvent, a protic compound in an amount of 0.001 to 0.3 mol relative to 1 kg of the total amount of the components (II), (III) and (IV)

Assignees

• Central Glass Co Ltd

Inventors

• Fukui Yuki
• Terui Yoshiharu
• Yamada Shuhei
• Okumura Yuzo
• Kumon Soichi
• Shiota Saori
• Kondo Katsuya

Classifications

• H10P70/20 Primary

  Cleaning during device manufacture · CPC title

• H10P50/00 Primary

  Etching of wafers, substrates or parts of devices · CPC title

• C07F7/1896

  Compounds having one or more Si-O-acyl linkages · CPC title

• C07F7/10

  containing nitrogen {having a Si-N linkage} · CPC title

• C09D7/20

  Diluents or solvents · CPC title