Method of Manufacturing Module Having Multiple Pattern Areas, Module Having Multiple Pattern Areas According to the Method, and Method of Manufacturing Diffraction Grating Module or Mold for Diffraction Grating Module

US2020271836A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2020271836-A1
Application numberUS-201816636469-A
CountryUS
Kind codeA1
Filing dateAug 1, 2018
Priority dateAug 18, 2017
Publication dateAug 27, 2020
Grant date

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

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Exemplary embodiments of the present invention provide a method of manufacturing a module having multiple pattern areas, a module having multiple pattern areas according to the method, and a method of manufacturing a diffraction grating module or a mold for a diffraction grating module.

First claim

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1 . A method of manufacturing a module having multiple pattern areas to manufacture a diffraction grating module including a first diffraction grating element and a second diffraction grating element having different diffraction grating patterns, the method comprising: (a) disposing a first substrate having a first pattern on a first base substrate; (b) forming a first cutting line on the first substrate, wherein a first layout of the first cutting line corresponds to a first diffraction grating element; (c) forming a second cutting line on the first substrate, wherein a second layout of the second cutting line corresponds to a second diffraction grating element; (d) removing any one of a first area defined by the first cutting line and a second area defined by the second cutting line from the first substrate to form a removed area on the first substrate; (e) disposing a second base substrate having a second pattern different from the first pattern in the removed area, the second base pattern having a layout corresponding to the removed area of the first substrate; and (f) removing the first substrate from the base substrate without removing the first area and the second area. 2 . The method of claim 1 , wherein an alignment relationship between the first diffraction grating element and the second diffraction grating element is set in a diffraction grating module, and wherein the first cutting line or the second cutting line corresponds to the alignment relationship. 3 . The method of claim 1 , wherein the first layout of the first cutting line is an image corresponding to the first diffraction grating element, and the second layout of the second cutting line is an image corresponding to the second diffraction grating element. 4 . The method of claim 1 , wherein the first layout of the first cutting line is a reverse image of the first diffraction grating element, and the second layout of the second cutting line is a reverse image of the second diffraction grating element. 5 . The method of claim 1 , wherein the diffraction grating module includes a third diffraction grating element having a different diffraction grating pattern from the diffraction grating pattern of at least one of the first diffraction grating element and the second diffraction grating element, and the method further includes (g) forming a third cutting line having a third layout corresponding to the third diffraction grating element on the first substrate, and a third area is defined by the third cutting line, and the first substrate is removed from the base substrate without removing the first area, the second area, and the third area. 6 . The method of claim 5 , wherein an alignment relationship between the first diffraction grating element, the second diffraction grating element, and the third diffraction grating element is set within a diffraction grating module, and wherein the first cutting line, the second cutting line, or the third cutting line corresponds to the alignment relationship. 7 . The method of claim 5 , wherein the first layout of the first cutting line is an image corresponding to the first diffraction grating element, the second layout of the second cutting line is an image corresponding to the second diffraction grating element, and the third layout of the third cutting line is an image corresponding to the third diffraction grating element. 8 . The method of claim 5 , wherein the first layout of the first cutting line is a reverse image of the first diffraction grating element, the second layout of the second cutting line is a reverse image of the second diffraction grating element, and the third layout of the third cutting line is a reverse image of the third diffraction grating element. 9 . A module having multiple pattern areas manufactured by the manufacturing method of claim 1 . 10 . The module of claim 9 , wherein the module having multiple pattern areas is a mold for manufacturing a diffraction grating module including a first diffraction grating element and a second diffraction grating element having different diffraction grating patterns. 11 . A method of manufacturing a diffraction grating module or a mold for a diffraction grating module, the method comprising: preparing the module of claim 9 ; applying a resin composition on the module; curing the resin composition to form pattern areas corresponding to the multiple pattern areas of the module; and separating the module areas and the corresponding pattern areas.

Assignees

Inventors

Classifications

  • G02B5/1857Primary

    using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams · CPC title

  • Field-of-view increase by wavefront division · CPC title

  • characterised by optical features · CPC title

  • comprising details concerning the making of holograms · CPC title

  • G02B5/1847Primary

    Manufacturing methods · CPC title

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What does patent US2020271836A1 cover?
Exemplary embodiments of the present invention provide a method of manufacturing a module having multiple pattern areas, a module having multiple pattern areas according to the method, and a method of manufacturing a diffraction grating module or a mold for a diffraction grating module.
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification G02B5/1857. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Aug 27 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).