Method for manufacturing non-aqueous secondary battery electrode
US-2024332484-A1 · Oct 3, 2024 · US
US2020253061A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2020253061-A1 |
| Application number | US-201916694434-A |
| Country | US |
| Kind code | A1 |
| Filing date | Nov 25, 2019 |
| Priority date | Feb 1, 2019 |
| Publication date | Aug 6, 2020 |
| Grant date | — |
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Surface-treated copper foils that exhibit a material volume (Vm) in a range of 0.05 to 0.6 μm 3 /μm 2 and a yellowness index (YI) in a range of 17 to 52 are reported. Where the surface-treated copper foil is treated on the deposited side and includes a treatment layer comprising a nodule layer. Such surface-treated copper foils can be used as a conductive material having low transmission loss, for example in circuit boards.
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We claim: 1 . A surface-treated copper foil comprising: an electrodeposited copper foil including a drum side and a deposited side, and a treatment layer disposed on the deposited side providing a surface-treated side, wherein the treatment layer comprises a nodule layer and wherein the surface-treated side exhibits a material volume (Vm) in a range of 0.05 to 0.6 μm 3 /μm 2 and a yellowness index (YI) in a range of 17 to 52. 2 . The surface-treated copper foil of claim 1 , wherein the surface-treated side exhibits a material volume (Vm) in a range of 0.05 to 0.5 μm 3 /μm 2 . 3 . The surface-treated copper foil of claim 2 , wherein the surface-treated side exhibits a material volume (Vm) in a range of 0.05 to 0.3 μm 3 /μm 2 . 4 . The surface-treated copper foil of claim 1 , wherein the surface-treated side exhibits a void volume (Vv) in a range of 0.10 to 0.85 μm 3 /μm 2 . 5 . The surface-treated copper foil of claim 4 , wherein the surface-treated side exhibits a void volume (Vv) in a range of 0.39 to 0.85 μm 3 /μm 2 . 6 . The surface-treated copper foil of claim 4 , wherein the surface-treated side exhibits a void volume (Vv) in a range of 0.50 to 0.85 μm 3 /μm 2 . 7 . The surface-treated copper foil of claim 1 , which exhibits a yield strength in a range of 8.5 kg/mm 2 to 26 kg/mm 2 based on extension under load method at 0.5% strain. 8 . The surface-treated copper foil of claim 7 , which exhibits a yield strength in a range of 8.5 kg/mm 2 to 20 kg/mm 2 based on extension under load method at 0.5% strain. 9 . The surface-treated copper foil of claim 7 , which exhibits a yield strength in a range of 8.5 kg/mm 2 to 17 kg/mm 2 based on extension under load method at 0.5% strain. 10 . The surface-treated copper foil of claim 1 , wherein the treatment layer further comprises at least one of a barrier layer, an anti-tarnish layer, and a coupling layer. 11 . The surface-treated copper foil of claim 10 , wherein the barrier layer is made of metal or alloy containing the metal, and the metal is selected from at least one of Ni, Zn, Cr, Co, Mo, Fe, Sn, and V. 12 . The surface-treated copper foil of claim 10 , wherein the coupling layer includes silicon. 13 . The surface-treated copper foil of claim 1 , wherein the nodule layer comprises copper nodules. 14 . A laminate comprising, a resin layer, and a surface-treated copper foil comprising, an electrodeposited copper foil including a drum side and a deposited side, a treatment layer disposed on the deposited side providing a surface-treated side in contact with the resin layer, and wherein the treatment layer comprises a nodule layer, wherein the surface-treated side exhibits a material volume (Vm) in a range of 0.05 to 0.6 μm 3 /μm 2 , a yellowness index (YI) in a range of 17 to 52, a void volume (Vv) in a range of 0.10 to 0.85 μm 3 /μm 2 , and wherein the surface-treated copper foil exhibits a yield strength in a range of 8.5 kg/mm 2 to 26 kg/mm 2 based on extension under load method at 0.5% strain. 15 . A device comprising, a circuit board comprising the surface-treated copper foil of claim 1 and a plurality of components mounted on the circuit board, wherein at least a first component and a second component of the plurality of components are electrically connected to each other through the surface-treated copper foil of the circuit board.
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