Method of producing a substrate and system for producing a substrate

US2020251431A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2020251431-A1
Application numberUS-202016751937-A
CountryUS
Kind codeA1
Filing dateJan 24, 2020
Priority dateFeb 5, 2019
Publication dateAug 6, 2020
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The invention relates to a method of producing a substrate with a functional layer. The method comprises providing a workpiece having a first surface and a second surface opposite the first surface, and forming a modified layer inside the workpiece, the modified layer comprising a plurality of modified regions. Further, the method comprises, after forming the modified layer inside the workpiece, forming the functional layer on the first surface of the workpiece and, after forming the functional layer on the first surface of the workpiece, dividing the workpiece along the modified layer, thereby obtaining the substrate with the functional layer. Dividing the workpiece along the modified layer comprises applying an external stimulus to the workpiece. Moreover, the invention relates to a substrate producing system for performing this method.

First claim

Opening claim text (preview).

1 . A method of producing a substrate with a functional layer, the method comprising: providing a workpiece having a first surface and a second surface opposite the first surface; forming a modified layer inside the workpiece, the modified layer comprising a plurality of modified regions; after forming the modified layer inside the workpiece, forming the functional layer on the first surface of the workpiece; and after forming the functional layer on the first surface of the workpiece, dividing the workpiece along the modified layer, thereby obtaining the substrate with the functional layer, wherein dividing the workpiece along the modified layer comprises applying an external stimulus to the workpiece. 2 . The method according to claim 1 , wherein forming the modified layer inside the workpiece comprises applying a laser beam to the workpiece, wherein the workpiece is made of a material which is transparent to the laser beam and the laser beam is applied to the workpiece at least in a plurality of positions along the first surface, in a condition where a focal point of the laser beam is located at a distance from the first surface in the direction from the first surface towards the second surface. 3 . The method according to claim 2 , wherein the laser beam is applied to the workpiece from the side of the first surface of the workpiece. 4 . The method according to claim 1 , wherein the modified layer is formed so as to be substantially parallel to the first surface. 5 . The method according to claim 1 , wherein the modified layer is formed so as to be surrounded by a peripheral workpiece portion in which no modified regions are formed. 6 . The method according to claim 5 , wherein dividing the workpiece along the modified layer further comprises separating the workpiece at the peripheral workpiece portion. 7 . The method according to claim 1 , further comprising, after dividing the workpiece along the modified layer, grinding and/or polishing a surface of the substrate opposite the first surface where the functional layer is formed. 8 . The method according to claim 1 , further comprising, after dividing the workpiece along the modified layer, grinding and/or polishing a surface of a remainder of the workpiece, the surface being opposite the second surface, of the workpiece. 9 . The method according to claim 1 , wherein, after dividing the workpiece along the modified layer, the steps of forming a modified layer, forming a functional layer and dividing the workpiece are repeated one or more times on a remainder of the workpiece, so as to obtain a plurality of substrates with functional layers. 10 . The method according to claim 1 , wherein the modified regions comprise amorphous regions or regions in which cracks are formed, or the modified regions are amorphous regions or regions in which cracks are formed. 11 . The method according to claim 1 , wherein applying the external stimulus to the workpiece comprises or consists of applying an ultrasonic wave to the workpiece and/or applying pressure to the workpiece and/or applying a mechanical force to the workpiece and/or heating the workpiece and/or cooling the workpiece and/or applying a vacuum to the workpiece. 12 . A system for producing a substrate with a functional layer, the system comprising: a support member for supporting a workpiece, the workpiece having a first surface and a second surface opposite the first surface; a modified layer forming means configured to form a modified layer inside the workpiece, the modified layer comprising a plurality of modified regions; a functional layer forming means configured to form the functional layer on the first surface of the workpiece, after forming the modified layer inside the workpiece; and a dividing means configured to divide the workpiece along the modified layer, thereby obtaining the substrate with the functional layer, after forming the functional layer on the first surface of the workpiece, wherein the dividing means comprises an external stimulus applying means configured to apply an external stimulus to the workpiece.

Assignees

Inventors

Classifications

  • comprising polymers · CPC title

  • Bond pads, in general · CPC title

  • the bond interface between the auxiliary support and the wafer comprising two or more, e.g. multilayer adhesive or adhesive and release layer · CPC title

  • using temporary auxiliary members, e.g. using sacrificial coatings or handle substrates · CPC title

  • comprising solid metals or solid metalloids, e.g. PbSn, Ag or Cu · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2020251431A1 cover?
The invention relates to a method of producing a substrate with a functional layer. The method comprises providing a workpiece having a first surface and a second surface opposite the first surface, and forming a modified layer inside the workpiece, the modified layer comprising a plurality of modified regions. Further, the method comprises, after forming the modified layer inside the workpiece…
Who is the assignee on this patent?
Disco Corp
What technology area does this patent fall under?
Primary CPC classification H10W72/019. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Aug 06 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).