Crosslinkable compound-containing photocurable stepped substrate-coating composition

Patent metadata

Field	Value
Publication number	US-2020225585-A1
Application number	US-201816637974-A
Country	US
Kind code	A1
Filing date	Aug 8, 2018
Priority date	Aug 9, 2017
Publication date	Jul 16, 2020
Grant date	—

Abstract

A stepped substrate-coating composition for forming a coating film having filling property of a pattern and flattening property including a compound (E) having a partial structure (I) and a partial structure (II) having a hydroxy group formed by a reaction of an epoxy group with a proton-generating compound, a solvent (F), and a crosslinkable compound (H), wherein the partial structure (I) is from Formulae (1-1) to (1-5) or including a partial structure of Formula (1-6) combined with a partial structure of Formula (1-7) or (1-8), and the partial structure (II) is of the following Formula (2-1) or (2-2), wherein the compound (E) contains the epoxy and hydroxy group at a molar ratio (epoxy group)/(hydroxy group) of 0 or more and 0.5 or less, and contains the partial structure (II) so the molar ratio (partial structure (II))/(partial structure (I)+partial structure (II)) is 0.01 or more and 0.8 or less.

First claim

1 . A photocurable stepped substrate-coating composition comprising:
a compound (E) containing a partial structure (I) and a partial structure (II) that contains a hydroxy group formed by a reaction of an epoxy group with a proton-generating compound; a solvent (F); and a crosslinkable compound (H), wherein the partial structure (I) is at least one partial structure selected from the group consisting of partial structures of Formulae (1-1) to (1-5) described below, or a partial structure including a partial structure of Formula (1-6) in a combination with a partial structure of Formula (1-7) or (1-8), and the partial structure (II) is a partial structure of Formula (2-1) or (2-2) described below

(wherein R 1 , R 1a , R 3 , R 5 , R 5a , and R 6a are each independently a saturated C 1-10 hydrocarbon group, an aromatic C 6-40 hydrocarbon group, an oxygen atom, a carbonyl group, a sulfur atom, a nitrogen atom, an amide group, an amino group, or a group selected from combinations thereof, R 2 , R 2a , R 4 , and R 6 are each independently a hydrogen atom, a saturated C 1-10 hydrocarbon group, an unsaturated C 2-10 hydrocarbon group, an oxygen atom, a carbonyl group, an amide group, an amino group, or a group selected from combinations thereof, and are a monovalent group, R 1 , R 1a , R 3 , R 5a , and R 6a are a divalent group, R 5 is a trivalent group, R 7 , R 8 , R 9 , R 10 , and R 11 are each independently a hydrogen atom or a saturated C 1-10 hydrocarbon group, n is the number of repeating units and is 1 to 10, and a dotted line is a chemical bond between adjacent atoms).

2 . The photocurable stepped substrate-coating composition according to claim 1 , further comprising an acid catalyst.

3 . The photocurable stepped substrate-coating composition according to claim 1 , wherein the compound (E) contains the epoxy group and the hydroxy group at a molar ratio (epoxy group)/(hydroxy group) of 0 or more and 0.5 or less, and contains the partial structure (II) so that a molar ratio (partial structure (II))/(partial structure (I)+partial structure (II)) is 0.01 or more and 0.8 or less.

4 . The photocurable stepped substrate-coating composition according to claim 1 , wherein the compound (E) is a compound having at least one of the partial structure (I) and at least one of the partial structure (II).

5 . The photocurable stepped substrate-coating composition according to claim 1 , wherein the R 5a and R 6a are each a divalent group selected from a C 1-10 alkylene group, a C 6-40 arylene group, an oxygen atom, a carbonyl group, a sulfur atom, or combinations thereof.

6 . The photocurable stepped substrate-coating composition according to claim 1 , wherein the compound (E) is a compound (1) obtained by a reaction of a proton-generating compound (A) having an unsaturated bond between carbon atoms with an epoxy compound (B), a compound (2) obtained by a reaction of an epoxy compound (C) having an unsaturated bond between carbon atoms with a proton-generating compound (D), a compound (3) obtained by a reaction of a proton-generating compound (A) having an unsaturated bond between carbon atoms and a proton-generating compound (A′) having a photodegradable group with an epoxy compound (B), or a compound (4) obtained by a reaction of a hydroxy group formed by a reaction of an epoxy compound (B) or an epoxy compound (C) having an unsaturated bond between carbon atoms with a proton-generating compound (A) having an unsaturated bond between carbon atoms, a proton-generating compound (A) having an unsaturated bond between carbon atoms and a proton-generating compound (A′) having a photodegradable group, or a proton-generating compound (D), with a compound (G) having an unsaturated bond and capable of being reacted with the hydroxy group.

7 . The photocurable stepped substrate-coating composition according to claim 6 , wherein, when the compound (E) is the compound (1), the compound (3), or the compound (4), the compound (E) is obtained by a reaction of a proton generated from the proton-generating compound (A) having an unsaturated bond between carbon atoms or the proton-generating compound (A) having an unsaturated bond between carbon atoms and the proton-generating compound (A′) having a photodegradable group with an epoxy group of the epoxy compound (B) at a molar ratio of 1:1 to 1:1.5.

8 . The photocurable stepped substrate-coating composition according to claim 6 , wherein, when the compound (E) is the compound (2) or the compound (4), the compound (E) is obtained by a reaction of an epoxy group of the epoxy compound (C) having an unsaturated bond between carbon atoms with a proton generated from the proton-generating compound (D) at a molar ratio of 1:1 to 1.5:1.

9 . The photocurable stepped substrate-coating composition according to claim 6 , wherein the proton-generating compound (A) having an unsaturated bond between carbon atoms is a carboxylic acid compound having an unsaturated bond between carbon atoms, an acid anhydride having an unsaturated bond between carbon atoms, an amine compound having an unsaturated bond between carbon atoms, an amide compound having an unsaturated bond between carbon atoms, an isocyanurate compound having an unsaturated bond between carbon atoms, a phenol compound having an unsaturated bond between carbon atoms, or a thiol compound having an unsaturated bond between carbon atoms.

10 . The photocurable stepped substrate-coating composition according to claim 6 , wherein the epoxy compound (B) is a glycidyl group-containing ether compound, a reaction product of a phenolic hydroxy group-containing compound and epichlorohydrin, a reaction product of a phenolic hydroxy group-containing resin and epichlorohydrin, a glycidyl group-containing isocyanurate compound, an epoxycyclohexyl group-containing compound, an epoxy group-substituted cyclohexyl compound, or a glycidyl ester compound.

11 . The photocurable stepped substrate-coating composition according to claim 6 , wherein the proton-generating compound (A′) having a photodegradable group is an azide group-containing compound.

12 . The photocurable stepped substrate-coating composition according to claim 6 , wherein the epoxy compound (C) having an unsaturated bond between carbon atoms is a glycidyl ester compound having an unsaturated bond between carbon atoms, a reaction product of a phenolic hydroxy group-containing compound having an unsaturated bond between carbon atoms and epichlorohydrin, or a reaction product of a phenolic hydroxy group-containing resin having an unsaturated bond between carbon atoms and epichlorohydrin.

13 . The photocurable stepped substrate-coating composition according to claim 6 , wherein the proton-generating compound (D) is a phenolic hydroxy group-containing compound, a carboxylic acid-containing compound, an amine-containing compound, a thiol-containing compound, or an imide-containing compound.

14 . The photocurable stepped substrate-coating composition according to claim 6 , wherein the compound (G) is an acid halide, an acid anhydride, an isocyanate compound, or a halogenated alkyl compound that has an unsaturated bond between carbon atoms, or the proton-generating compound (A) having an unsaturated bond between carbon atoms.

15 . The photocurable stepped substrate-coating composition according to claim 1 , wherein the compound (E) has the partial structure (I) and the partial structure (II) in a proportion of each of the partial structures (I) and (II) of 1 to 1,000 structures.

Assignees

• Nissan Chemical Corp

Inventors

• Endo Takafumi
• Tokunaga Hikaru

Classifications

• H10P76/2041

  Photolithographic processes · CPC title

• H10P76/408

  characterised by their sizes, orientations, dispositions, behaviours or shapes · CPC title

• H10P14/6342

  Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating · CPC title

• H10P14/668

  the materials being characterised by the deposition precursor materials · CPC title

• H10P14/683

  carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC · CPC title