Method for extracting metal compound particles, method for analyzing the metal compound particles, and electrolytic solution used therefor

US2020141023A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2020141023-A1
Application numberUS-201715999826-A
CountryUS
Kind codeA1
Filing dateFeb 17, 2017
Priority dateFeb 18, 2016
Publication dateMay 7, 2020
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

The object of the present invention is such that a surface exchange of metal fine particles by Cu ions, or the like is inhibited in order to prevent formation of Artificial CuS or the like, in extraction and analysis of the metal fine particles (inclusions and precipitates) in a metal material by electrolytic corrosion in a solvent-based electrolytic solution, without significantly changing conventional extraction and analysis methods. A method for extracting metal compound particles in a metal material by etching the metal material in an electrolytic solution, characterized by using the following electrolytic solution, wherein it comprises a chemical agent that forms a complex containing metal M′ wherein Δ defined by the following formula is 10 or more, Δ =  pKsp  [ M ′  x ′  Ay ′ ] - pKsp  [ MxAy ] =  ( - log 10  Ksp  [ M ′  x ′  Ay ′ ] ) - ( - log 10  Ksp  [ MxAy ] ) wherein a solubility product of metal compound M′x′Ay′ is defined as Ksp[M′x′Ay′], and a solubility product of metal compound to be extracted MxAy, which is contained in the metal material, is defined as Ksp└MxAy┘, as well as the electrolytic solution therefor.

First claim

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1 . A method for extracting metal compound particles in a metal material by etching the metal material in an electrolytic solution, characterized by using the following, electrolytic solution, wherein it comprises a chemical agent that forms a complex containing metal M′ wherein Δ defined by the following formula is 10 or more, Δ= pKsp [ M′x′Ay ′]− pKsp [ MxAy ]=(−log 10 Ksp [ M′x′Ay ′])−(−log 10 Ksp [ MxAy ]) wherein a solubility product of metal compound M′x′Ay′ is defined as Ksp[M′x′Ay′], and a solubility product of metal compound to be extracted MxAy, which is contained in the metal material, is defined as Ksp[MxAy], and wherein M and M′ are different metal elements, A is a single atom or atomic group forming a compound with M or M′, and x, x′, y and y′ represent a composition ratio of the compound determined according to the valences of M, M′ and A, and the solubility product Ksp is a value in an aqueous solution at 25° C. 2 . The method for extracting metal compound particles according to claim 1 , wherein the electrolytic solution is a nonaqueous solvent-based electrolytic solution. 3 . The method for extracting metal compound particles according to claim 1 or 2 , wherein the metal compound to be extracted MxAy is one or two of MnS and FeS. 4 . The method for extracting metal compound particles according to any one of claims 1 to 3 , wherein the metal M′ of the metal compound M′x′Ay′ whose pKsp is greater, is at least one of Hg, Ag, Cu, Pb, Cd, Co, Zn and Ni. 5 . The method for extracting metal compound particles according to any one of claims 1 to 4 , wherein the chemical agent comprises a crown ether. 6 . The method for extracting metal compound particles according to any one of claims 1 to 5 , wherein the chemical agent comprises any one kind or two or more kinds of polyethylene amines, ethylenediamine tetraacetic acid, cyclohexanediamine tetraacetic acid. 7 . The method for extracting metal compound particles according to claim 6 , wherein the chemical agent comprises triethylenetetramine. 8 . The method for extracting metal compound particles according to any one of claims 1 to 7 , wherein the metal material is a steel material. 9 . The method for extracting metal compound particles according to any one of claims 1 to 8 , wherein, when passing the electrolytic solution after etching through a filter and extracting metal compound particles as a collected residue, the filter is a tetrafluoroethylene resin filter. 10 . A method for analyzing metal compound particles characterized by analyzing the metal compound particles extracted by the method for extracting metal compound particles according to any one of claims 1 to 9 . 11 . An electrolytic solution used for extracting metal compound particles in a metal material by etching the metal material, wherein the electrolytic solution comprises a chemical agent that forms a complex containing metal M′ wherein Δ defined by the following formula is 10 or more, Δ= pKsp [ M′x′Ay ′]− pKsp [ MxAy ]=(−log 10 Ksp [ M′x′Ay ′])−(−log 10 Ksp [ MxAy ]) wherein a solubility product of metal compound M′x′Ay′ is defined as Ksp[M′x′Ay′], and a solubility product of metal compound to be extracted MxAy contained in the metal material is defined as Ksp[MxAy], and wherein M and M′ are different metal elements, A is a single atom or atomic group forming a compound with M or M′, and x, x′, y and y′ represent a composition ratio of the compound determined according to the valence of M, M′ and A, and the solubility product Ksp is a value in an aqueous solution at 25° C. 12 . The electrolytic solution according to claim 11 , wherein it is a nonaqueous solvent system. 13 . The electrolytic solution according to claim 11 or 12 , wherein the metal compound to be extracted MxAy is one or two of MnS or FeS. 14 . The electrolytic solution according to any one of claims 11 to 13 , wherein the metal M′ of the metal compound M′x′Ay′ whose solubility product Ksp is smaller, is at least one of Hg, Ag, Cu, Pb, Cd, Co, Zn and Ni. 15 . The electrolytic solution according to any one of claims 11 to 14 , wherein the chemical agent comprises a crown ether. 16 . The electrolytic solution according to any one of claims 11 to 15 , wherein the chemical agent comprises any one kind or two or more kinds of polyethylene amines, ethylenediamine tetraacetic acid, cyclohexanediamine tetraacetic acid. 17 . The electrolytic solution according to claim 16 , wherein the chemical agent comprises triethylenetetramine. 18 . The electrolytic solution according to any one of claims 11 to 17 , wherein the metal material is a steel material. 19 . The electrolytic solution according to any one of claims 11 to 18 , wherein the nonaqueous solvent contains at least one of methanol and ethanol.

Assignees

Inventors

Classifications

  • Electrolytic stripping of metallic layers or coatings · CPC title

  • C25F3/02Primary

    Etching · CPC title

  • G01N1/32Primary

    Polishing; Etching · CPC title

  • Constituents thereof · CPC title

  • Etching, surface-brightening or pickling compositions (for glass C03C15/00, {C03C25/66; for mortars, concrete, artificial or natural stone or ceramics C04B41/5338}; for metallic material C23F, C23G1/00, C25F1/00; {for semi-conductors H10P52/40}) · CPC title

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What does patent US2020141023A1 cover?
The object of the present invention is such that a surface exchange of metal fine particles by Cu ions, or the like is inhibited in order to prevent formation of Artificial CuS or the like, in extraction and analysis of the metal fine particles (inclusions and precipitates) in a metal material by electrolytic corrosion in a solvent-based electrolytic solution, without significantly changing con…
Who is the assignee on this patent?
Nippon Steel & Sumitomo Metal Corp
What technology area does this patent fall under?
Primary CPC classification C25F3/02. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu May 07 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).