Block Copolymer

Patent metadata

Field	Value
Publication number	US-2020131296-A1
Application number	US-201716463616-A
Country	US
Kind code	A1
Filing date	Nov 29, 2017
Priority date	Nov 30, 2016
Publication date	Apr 30, 2020
Grant date	—

Abstract

The present application can provide a block copolymer and a use thereof. The block copolymer of the present application can have excellent self-assembly properties or phase separation characteristics and excellent etching selectivity, and various other functions as required can be freely imparted thereto.

First claim

1 . A block copolymer comprising a polymer segment A having a unit represented by Formula 1 below and a polymer segment B different from the polymer segment A:

wherein, R is hydrogen or an alkyl group having 1 to 4 carbon atoms, X is a single bond, an oxygen atom, —C(═O)—X 1 — or —X 1 —C(═O)—, where X 1 is an oxygen atom or —SiH 2 —, and Y is a monovalent substituent comprising a ring structure to which a chain having 8 or more chain-forming atoms is linked, where the chain is substituted with a hydrocarbon functional group containing one or more silicon atoms or iron atoms.

2 . The block copolymer according to claim 1 , wherein X is a single bond, an oxygen atom, —C(═O)—O— or —O—C(═O)—.

3 . The block copolymer according to claim 1 , wherein X is —C(═O)—O—.

4 . The block copolymer according to claim 1 , wherein the chain comprises 8 to 20 chain-forming atoms.

5 . The block copolymer according to claim 1 , wherein the chain-forming atom is carbon, oxygen, nitrogen or sulfur.

6 . The block copolymer according to claim 1 , wherein the chain-forming atom is carbon or oxygen.

7 . The block copolymer according to claim 1 , wherein the chain is a hydrocarbon chain.

8 . The block copolymer according to claim 1 , wherein the ring structure is an aromatic ring structure or an alicyclic ring structure.

9 . The block copolymer according to claim 1 , wherein Y is represented by Formula 2 below:
-P-Q-Z  [Formula 2]
wherein, P is an arylene group, Q is a single bond, an oxygen atom or —NR 3 —, where R 3 is hydrogen, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or an aryl group, and Z is a chain having 8 or more chain-forming atoms and substituted with a hydrocarbon functional group comprising one or more silicon atoms or iron atoms.

10 . The block copolymer according to claim 1 , wherein the hydrocarbon functional group is a functional group represented by Formula 4 below or a silsesquioxanyl group:

wherein, each of R is independently a hydrogen atom or an alkyl group, L is a single bond or an oxygen atom, and n is a number in a range of 0 to 10.

11 . The block copolymer according to claim 1 , wherein the polymer segment B comprises a unit of Formula 5 below

wherein, B is a monovalent substituent having an aromatic structure containing one or more halogen atoms.

12 . The block copolymer according to claim 1 , wherein the polymer segment B comprises a unit of Formula 6 below:

wherein, X 2 is a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 1 — or —X 1 —C(═O)—, where X 1 is a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group or an alkynylene group, and W is an aryl group containing at least one halogen atom.

13 . The block copolymer according to claim 1 , wherein the polymer segment B comprises a unit of Formula 7 below:

wherein, X 2 is a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 1 — or —X 1 —C(═O)—, where X 1 is a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group or an alkynylene group, and R 1 to R 5 are each independently hydrogen, an alkyl group, a haloalkyl group or a halogen atom, where the number of halogen atoms contained in R 1 to R 5 is 1 or more.

14 . A polymer film comprising the self-assembled block copolymer of claim 1 .

15 . A method for forming a polymer film, which comprises forming on a substrate a polymer film comprising the self-assembled block copolymer of claim 1 .

16 . A patterning method comprising a process of selectively removing, from a laminate having a substrate, and the polymer film formed on the substrate and comprising the self-assembled block copolymer of claim 1 , any one of polymer segments in the block copolymer.

Assignees

• Lg Chemical Ltd

Inventors

• Lee Je Gwon
• Park No Jin
• Kim Jung Keun
• Choi Eun Young
• Ku Se Jin
• Lee Mi Sook
• Ryu Hyung Ju
• Yoon Sung Soo

Classifications

• C08F212/20

  Fluorine · CPC title

• C08F293/005 Primary

  using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent · CPC title

• C08F220/301

  and one oxygen in the alcohol moiety · CPC title

• C08J5/18

  Manufacture of films or sheets · CPC title

• C08F2438/03

  Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX] · CPC title