Atomic layer deposition chamber with counter-flow multi inject

Patent metadata

Field	Value
Publication number	US-2020087784-A1
Application number	US-201916693631-A
Country	US
Kind code	A1
Filing date	Nov 25, 2019
Priority date	Jun 26, 2014
Publication date	Mar 19, 2020
Grant date	—

Abstract

A chamber lid assembly includes: a central channel having an upper portion and a lower portion and extending along a central axis; a housing at least partially defining a first and a second annular channel, each fluidly coupled to the central channel; a first plurality of apertures disposed along a horizontal plane through the housing to provide a multi-aperture inlet between the first annular channel and the central channel; a second plurality of apertures disposed along a horizontal plane through the housing to provide a multi-aperture inlet between the second annular channel and the central channel, wherein the first and the second plurality of apertures are angled differently with respect to the central axis so as to induce opposing rotational flow of gases about the central axis; and a tapered bottom surface extending from the lower portion of the central channel to a peripheral portion of the chamber lid assembly.

First claim

What is claimed is:

1 . A chamber lid assembly for chemical deposition, comprising:
a housing having an inner region; an insert disposed within the inner region; a central channel disposed through the housing and insert, the central channel having a circular cross-section and an upper portion and a lower portion extending along a central axis; a first annular channel and a second annular channel defined between the housing and the insert; a first plurality of apertures disposed through the insert along a first horizontal plane to provide a multi-aperture inlet between the first annular channel and the central channel, wherein each aperture of the first plurality of apertures is angled with respect to the central axis so as to induce a rotational flow of a gas about the central axis in a first rotational direction; and a second plurality of apertures disposed through the insert along a second horizontal plane to provide a multi-aperture inlet between the second annular channel and the central channel, wherein each aperture of the second plurality of apertures is angled with respect to the central axis so as to induce a rotational flow of a gas about the central axis in a second rotational direction opposite the first rotational direction.

2 . The chamber lid assembly of claim 1 , wherein the first and second annular channels are each coupled to a fluid delivery line and each fluid delivery line is coupled to one or more fluid sources.

3 . The chamber lid assembly of claim 1 wherein the first and second pluralities of apertures each comprise between 2 and 10 apertures.

4 . The chamber lid assembly of claim 1 , wherein each aperture in the first plurality of apertures is disposed at an angle of up to about 60° in the first horizontal plane with respect to the central, channel and is disposed at an angle of about 0° to about 60° from the first horizontal plane, and wherein each aperture in the second plurality of apertures is disposed at an angle of up to about 60° in the second horizontal plane with respect to the central channel and is disposed at an angle of about 0° to about 60° from the second horizontal plane.

5 . The chamber lid assembly of claim 1 , wherein each aperture of the first and second pluralities of apertures comprises a rectangular shape, a cylindrical tube, or a tear drop shape.

6 . The chamber lid assembly of claim 1 , wherein the housing at least partially defines a third annular channel fluidly coupled to the central channel, further comprising:
a third plurality of apertures disposed along a third horizontal plane through the insert to provide a multi-aperture inlet between the third annular channel and the central channel, wherein each aperture of the third plurality of apertures is angled with respect to the central axis so as to induce a rotational flow of a gas about the central axis in a third rotational direction.

7 . The chamber lid assembly of claim 6 , wherein the second plurality of apertures is disposed between the first plurality of apertures and the third plurality of apertures, and wherein the second rotational direction is opposite the first rotational direction and the third rotational direction.

8 . The chamber lid assembly of claim 1 , wherein the insert is formed of quartz.

9 . The chamber lid assembly of claim 1 , wherein the central channel has an outer diameter defined by the insert.

10 . The chamber lid assembly of claim 9 , wherein the central channel is cylindrical in an upper portion of the insert and conical in a lower portion of the insert with the outer diameter of the central channel expanding in a direction moving away from the upper portion.

11 . The chamber lid assembly of claim 10 , wherein the first and second pluralities of apertures are all coupled to the central channel in the conical portion of the central channel.

12 . The chamber lid assembly of claim 9 , wherein the insert further comprises a cap covering the upper portion of the cylindrical channel.

13 . A process chamber, comprising:
a chamber body; a substrate support disposed within the chamber body; and a chamber lid assembly disposed on the chamber body above the substrate support defining a reaction zone between the chamber lid assembly and the substrate support, the chamber lid assembly as described in claim 1 and further comprising:
a tapered bottom surface extending from the lower portion of the central channel to a peripheral portion of the chamber lid assembly.

14 . The process chamber of claim 13 , wherein a lower surface of the chamber lid assembly is sized and shaped to cover a substrate disposed on the substrate support.

15 . The process chamber of claim 13 , wherein the chamber lid assembly comprises a choke disposed at a peripheral portion of the chamber lid assembly adjacent to a substrate disposed on the substrate support.

Assignees

• Applied Materials Inc

Inventors

• Wu Dien-Yeh
• Ma Paul
• Wei Guodan
• Kao Chun-Teh

Classifications

• C23C16/45582

  Expansion of gas before it reaches the substrate · CPC title

• C23C16/4404

  Coatings or surface treatment on the inside of the reaction chamber or on parts thereof · CPC title

• C23C16/45544

  characterized by the apparatus · CPC title

• C23C16/45574

  Nozzles for more than one gas · CPC title

• C23C16/45508 Primary

  Radial flow · CPC title