Substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-9464353-B2
Application number	US-201314086959-A
Country	US
Kind code	B2
Filing date	Nov 21, 2013
Priority date	Nov 21, 2013
Publication date	Oct 11, 2016
Grant date	Oct 11, 2016

Abstract

The present invention relates to a substrate processing apparatus: including a chamber comprising a body having an inner space and a top lid provided on an upper part of the body, the top lid having at least one gas input port; a substrate supporting unit rotatably installed inside the chamber to support a plurality of substrates; and a gas injection device comprising a central injection unit provided on an upper part of the substrate supporting unit to inject a gas into a central region of the substrate supporting unit, a source gas injection unit provided around the central injection unit to inject a source gas into the substrate supporting unit, a reaction gas injection unit provided around the central injection unit to inject a reaction gas into the substrate supporting unit and a purge gas injection unit disposed between the source gas injection unit and the reaction gas injection unit; wherein at least one of the source gas injection unit and the reaction gas injection unit comprises a main injection unit to inject a gas into the substrate supporting unit and a gas-injecting projection projecting in a intersectional direction to the main injection unit between the central injection unit and the main injection unit, the main injection unit and the projection are divided into a plurality of regions along a circumference, and the main injection unit or the projection in at least one region inject an amount of gas different than those of the other regions. The substrate processing apparatus according to the present invention can enhance uniformity and reliability of a thin film.

First claim

The invention claimed is:

1. A substrate processing apparatus including:
a chamber comprising a body having an inner space and a top lid provided on an upper part of the body, the top lid having at least one gas input port;
a substrate supporting unit rotatably installed inside the chamber to support a plurality of substrates; and
a gas injection device comprising a central injection unit provided on an upper part of the substrate supporting unit to inject a gas into a central region of the substrate supporting unit, a source gas injection unit provided around the central injection unit to inject a source gas into the substrate supporting unit, a reaction gas injection unit provided around the central injection unit to inject a reaction gas into the substrate supporting unit and a purge gas injection unit disposed between the source gas injection unit and the reaction gas injection unit;
wherein at least one of the source gas injection unit and the reaction gas injection unit comprises a main injection unit to inject a gas into the substrate supporting unit and a gas-injecting projection projecting in a intersectional direction to the main injection unit between the central injection unit and the main injection unit, the main injection unit and the projection are divided into a plurality of regions along a circumference, and the main injection unit or the projection in at least one region inject an amount of gas different than those of the other regions.

2. The substrate processing apparatus of claim 1 ,
wherein the central injection unit is coupled to a lower central part of the top lid,
a plurality of gas injection holes are formed on a lower surface of the central injection unit, the source gas injection unit and the reaction gas injection unit are provided along a circumference of the central injection unit partially in a lower part of the top lid, and
a plurality of gas injection holes may be formed on a side surface of the projection and a lower surface of the main injection unit.

3. The substrate processing apparatus of claim 1 ,
wherein the projection and the main injection unit are connected to a gas supplier that controls gas supply, and
the projection and the main injection unit may be connected to different gas suppliers.

4. The substrate processing apparatus of claim 1 ,
wherein the projection and the main injection unit are connected to a gas supplier that controls gas supply, and
the projection and the main injection unit may be connected to the same gas supplier.

5. The substrate processing apparatus of claim 3 ,
wherein the gas supplier comprises a controller to control supply of the source gas or the reaction gas to the projection and the main injection unit and a controller to control a carrier gas, and the carrier gas may be an inert gas or N2 gas.

6. The substrate processing apparatus of claim 2 ,
wherein at least one region among the plurality of regions of the projection may have gas injection holes more than those of the other regions.

7. The substrate processing apparatus of claim 2 ,
wherein at least one region among the plurality of regions of the projection may have gas injection holes larger than those of the other regions.

8. The substrate processing apparatus of claim 2 ,
wherein the projection has a flow path therein which is communicated with at least one of a plurality of the gas input ports, and a plurality of gas injection holes may be formed on a side surface of the projection to communicate with the flow path.

9. The substrate processing apparatus of claim 2 ,
wherein the gas injection holes formed in the projection may be inclined toward the substrate supporting unit.

10. The substrate processing apparatus of claim 9 ,
wherein the gas injection holes formed in the projection may have larger cross-sectional area in one side that gas is discharged relative to another side that is connected to the flow path.

11. The substrate processing apparatus of claim 10 ,
wherein the gas injection holes of the projection may be formed in a region of 10 to 80° in an angle between the lower surface of the main injection unit and a central axis of the gas injection holes.

12. The substrate processing apparatus of claim 4 , wherein the gas supplier comprises a controller to control supply of the source gas or the reaction gas to the projection and the main injection unit and a controller to control a carrier gas, and the carrier gas may be an inert gas or N2 gas.

Assignees

• Wonik Ips Co Ltd

Inventors

• Park Young Hoon
• Ryu Dong Ho
• Yoon Won Jun

Classifications

• C23C16/45565 Primary

  Shower nozzles · CPC title

• C23C16/45519

  Inert gas curtains · CPC title

• C23C16/45548

  having arrangements for gas injection at different locations of the reactor for each ALD half-reaction · CPC title

• C23C16/45551

  for relative movement of the substrate and the gas injectors or half-reaction reactor compartments · CPC title

• C23C16/45508

  Radial flow · CPC title