Tungsten hexafluoride manufacturing method, tungsten hexafluoride purification method, and tungsten hexafluoride
US-2022348477-A1 · Nov 3, 2022 · US
US2020031684A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2020031684-A1 |
| Application number | US-201816477264-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jan 24, 2018 |
| Priority date | Jan 25, 2017 |
| Publication date | Jan 30, 2020 |
| Grant date | — |
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The invention relates to a method for producing a compound of formula MXn from a precursor compound of formula MXm, where M is a metal, X is a halide selected from F, Cl, Br, J, m is a number selected from the range 2 to 8, and n is a number selected from the range 1 to 7, with the condition that n<m, comprising a method step in which the precursor compound is reduced with a silane compound to the compound of formula MXn.
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1 .- 15 . (canceled) 16 . A method for production of a compound of formula MX n comprising providing a precursor compound of formula MX m , wherein M is a metal, X is a halide, selected from F, Cl, Br, J, m is selected from a number from 2 to 8, and n is selected from a number from 1 to 7, with the specification that n<m, and reducing the precursor compound with a silane compound to form a compound of formula MX n . 17 . The method according to claim 16 , wherein m−n=1 or 2, and/or wherein m=4, 5, or 6 and n=3, 4, or 5. 18 . The method according to claim 16 , wherein the metal M is selected from a transition metal, a lanthanide, an actinide, In, Tl, Sn, Pb, Sb, and Bi. 19 . The method according to claim 16 , wherein X=Cl. 20 . The method according to claim 16 , for the production of WCl 5 from WCl 6 . 21 . The method according to claim 16 , wherein the silane compound selected from the group consisting of organosilanes, silanes, halosilanes, and organohalosilanes. 22 . The method according to claim 16 , wherein the silane compound is an organosilane that has at least one methyl group that is bound to a silicon atom. 23 . The method according to claim 16 , wherein the silane compound is an oligosilane or a disilane. 24 . The method according to claim 16 , wherein the reduction is performed in a solvent that has aromatic hydrocarbons. 25 . The method according to claim 16 , wherein the molar substance amount ratio of the precursor compound to the reducing agent is between 2:1 and 1:2 with respect to the ratio of metal atoms to silicon atoms/metal oxidation number difference and/or wherein the reduction is performed at a temperature of 10° C. to 50° C. 26 . The method according to claim 16 , wherein at least 10 kg of the precursor compound of formula MX m are used. 27 . The method according to claim 16 , wherein the metal halide of formula MX n is purified via sublimation after the reduction. 28 . The method according to claim 16 , wherein, after the reduction and/or after the sublimation, the metal halide of formula MX n is obtained in a yield of >90% relative to the molar quantity of precursor compound that was used. 29 . A composition comprising the compound of formula MX n obtained by the method according to claim 16 in a purity >80 wt. %. 30 . A method compriding utilizing silane compounds to reduce a compound of formula MX n from a precursor compound of formula MX m , wherein M is a metal, X is a halide, selected from F, Cl, Br, J, m is selected from a number from 2 to 8, and n is selected from a number from 1 to 7, with the specification that n<m.
Halides · CPC title
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