Charged particle beam device

Patent metadata

Field	Value
Publication number	US-2019272973-A1
Application number	US-201616320525-A
Country	US
Kind code	A1
Filing date	Aug 9, 2016
Priority date	Aug 9, 2016
Publication date	Sep 5, 2019
Grant date	—

Abstract

A charged particle beam device that can improve machining position precision in section processing using a shielding plate is provided. The invention is directed to a charged particle beam device including: an ion source (101); a sample stand (106) on which a sample (107) is mounted; a shielding plate (108) placed so that a portion of the sample (107) is exposed when seen from the ion source (101); and tilt units (123, 124) that tilt the sample (107) and the shielding plate (108) relative to the irradiation direction of an ion beam (102) from the ion source (101) to the sample (107).

First claim

1 .- 12 . (canceled)

13 . A charged particle beam device comprising:
an ion source; a sample stand on which a sample is placed; a shielding plate that is disposed such that a portion of the sample is exposed, when seen from the ion source; and a tilt unit that tilts the sample and the shielding plate by a tilt angle θ, around a tilt axis which intersects an ion beam from the ion source and is set in a direction in which an end portion of the shielding plate on a side on which a part of the sample is exposed extends, in a direction in which the sample is shielded by the shielding plate with respect to the ion beam.

14 . The charged particle beam device according to claim 13 , further comprising:
a swing unit that swings the sample and the shielding plate around a swing axis which is orthogonal to the tilt axis and intersects the ion beam.

15 . The charged particle beam device according to claim 13 , wherein
the tilt unit includes a mechanical mechanism that varies the tilt angle θ relative to the irradiation direction of the ion beam to the sample.

16 . The charged particle beam device according to claim 15 , wherein
the tilt angle is variable on a side of the shielding plate with respect to the irradiation direction of the ion beam to the sample in a range of greater than 0° to 10° or less.

17 . The charged particle beam device according to claim 15 , wherein
the mechanical mechanism includes a tilt mechanism that tilts the ion source.

18 . The charged particle beam device according to claim 15 , wherein
the mechanical mechanism includes a tilt mechanism that tilts a sample stage on which the sample stand is installed.

19 . The charged particle beam device according to claim 13 , wherein
the tilt unit includes an ion beam deflecting plate that varies a tilt angle θ relative to the irradiation direction of the ion beam to the sample.

20 . The charged particle beam device according to claim 19 , wherein
the tilt angle θ is variable on a side of the shielding plate with respect to the irradiation direction of the ion beam to the sample in a range of greater than 0° to 10° or less.

21 . The charged particle beam device according to claim 13 , further comprising:
a fine movement mechanism that finely moves the shielding plate relative to the sample stand such that the exposure amount of the sample can be finely adjusted as viewed from the ion source, according to the energy of the ion beam.

22 . The charged particle beam device according to claim 21 , wherein
the fine movement mechanism is controlled using a relationship between an energy of the ion beam and a position of the sample stand with respect to the shielding plate, which are stored in advance.

23 . The charged particle beam device according to claim 21 , wherein
the fine movement mechanism is manually adjusted based on information obtained by a camera, a microscope, a monitor, or a combination thereof.

24 . A charged particle beam device comprising:
an ion source; a sample stand on which a sample is placed; a shielding plate disposed such that a portion of the sample is exposed when seen from the ion source; a swing unit that swings the sample and the shielding plate around a swing axis which is orthogonal to a direction in which an end portion of the shielding plate on a side on which a part of the sample is exposed extends and intersects an ion beam from the ion source; and a tilt unit that tilts the sample and the shielding plate by a tilt angle θ, around a tilt axis which is set in a direction in which the end portion of the shielding plate extends so as to be orthogonal to the swing axis and to intersect the ion beam, in a direction in which the sample is shielded by the shielding plate with respect to an irradiation direction of the ion beam to the sample.

25 . The charged particle beam device according to claim 24 , wherein
the tilt angle θ is variable in a range of greater than 0° and 10° or less.

Assignees

• Hitachi High Tech Corp

Inventors

• Kaneko Asako
• Takasu Hisayuki
• Iwaya Toru

Classifications

• H01J2237/20207

  Tilt · CPC title

• H01J37/3056

  for microworking, e. g. etching of gratings or trimming of electrical components · CPC title

• H01J2237/31749

  Focused ion beam · CPC title

• H01J2237/026

  Shields · CPC title

• H01J37/09

  Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields · CPC title