Laser doping apparatus and laser doping method

Patent metadata

Field	Value
Publication number	US-2019252190-A1
Application number	US-201916393609-A
Country	US
Kind code	A1
Filing date	Apr 24, 2019
Priority date	Mar 23, 2015
Publication date	Aug 15, 2019
Grant date	—

Abstract

The laser doping apparatus may irradiate a predetermined region of a semiconductor material with a pulse laser beam to perform doping. The laser doping apparatus may include: a solution supplying system configured to supply dopant-containing solution to the predetermined region, and a laser system including at least one laser device configured to output the pulse laser beam to be transmitted by the dopant-containing solution, and a time-domain pulse waveform changing apparatus configured to control a time-domain pulse waveform of the pulse laser beam.

First claim

1 . A laser doping apparatus that irradiates a semiconductor substrate with a pulse laser beam to perform doping to the semiconductor substrate, the laser doping apparatus comprising:
a laser device configured to output first and second pulse laser beams; and a controlling device configured to control a time-domain pulse waveform, a fluence, and an irradiated region of each of the first and second pulse laser beams such that
a first irradiated region of the semiconductor substrate is irradiated with the first pulse laser beam that has a first time-domain pulse waveform and a first fluence, and
a second irradiated region of the semiconductor substrate, the second irradiated region being different from the first irradiated region, is irradiated with the second pulse laser beam that has a second time-domain pulse waveform and a second fluence, the second time-domain pulse waveform being different from the first time-domain pulse waveform and the second fluence being different from the first fluence.

2 . The laser doping apparatus according to claim 1 , wherein the controlling device includes an optical pulse stretcher configured to control the time-domain pulse waveform of the first pulse laser beam by
branching the first pulse laser beam to third and fourth pulse laser beams, delaying the fourth pulse laser beam from the third pulse laser beam, and outputting the third and fourth pulse laser beams.

3 . The laser doping apparatus according to claim 2 , wherein
a maximum optical intensity of the third pulse laser beam outputted from the optical pulse stretcher is higher than a maximum optical intensity of the fourth pulse laser beam outputted from the optical pulse stretcher.

4 . The laser doping apparatus according to claim 3 , wherein
time-domain pulse waveforms of the third and fourth pulse laser beams outputted from the optical pulse stretcher overlap with each other.

5 . The laser doping apparatus according to claim 2 , wherein the optical pulse stretcher further controls the time-domain pulse waveform of the second pulse laser beam by
branching the second pulse laser beam to fifth and sixth pulse laser beams, delaying the sixth pulse laser beam from the fifth pulse laser beam, and outputting the fifth and sixth pulse laser beams.

6 . The laser doping apparatus according to claim 5 , wherein
a maximum optical intensity of the third pulse laser beam outputted from the optical pulse stretcher is higher than a maximum optical intensity of the fourth pulse laser beam outputted from the optical pulse stretcher, and a maximum optical intensity of the fifth pulse laser beam outputted from the optical pulse stretcher is higher than a maximum optical intensity of the sixth pulse laser beam outputted from the optical pulse stretcher.

7 . The laser doping apparatus according to claim 6 , wherein
time-domain pulse waveforms of the third and fourth pulse laser beams outputted from the optical pulse stretcher overlap with each other, and time-domain pulse waveforms of the fifth and sixth pulse laser beams outputted from the optical pulse stretcher overlap with each other.

8 . The laser doping apparatus according to claim 1 , wherein the laser device includes:
a first laser unit configured to output seventh and eighth pulse laser beams; a second laser unit configured to output ninth and tenth pulse laser beams; and an optical system configured to combine the seventh and ninth pulse laser beams to output the first pulse laser beam, and combine the eighth and tenth pulse laser beams to output the second pulse laser beam.

9 . The laser doping apparatus according to claim 8 , wherein the controlling device includes a delay circuit configured to control the time-domain pulse waveform of the first pulse laser beam by
outputting a first trigger signal to the first laser unit such that the first laser unit outputs the seventh pulse laser beam at a first timing, and outputting a second trigger signal to the second laser unit such that the second laser unit outputs the ninth pulse laser beam at a second timing after the first timing.

10 . The laser doping apparatus according to claim 9 , wherein
the controlling device sets target values of pulse energy of the first and second laser units such that a maximum optical intensity of the seventh pulse laser beam outputted from the optical system is higher than a maximum optical intensity of the ninth pulse laser beam outputted from the optical system.

11 . The laser doping apparatus according to claim 10 , wherein
time-domain pulse waveforms of the seventh and ninth pulse laser beams outputted from the optical system overlap with each other.

12 . The laser doping apparatus according to claim 9 , wherein the delay circuit further controls the time-domain pulse waveform of the second pulse laser beam by
outputting a third trigger signal to the first laser unit such that the first laser unit outputs the eighth pulse laser beam at a third timing, and outputting a fourth trigger signal to the second laser unit such that the second laser unit outputs the tenth pulse laser beam at a fourth timing after the third timing.

13 . The laser doping apparatus according to claim 12 , wherein
the controlling device sets target values of pulse energy of the first and second laser units such that a maximum optical intensity of the seventh pulse laser beam outputted from the optical system is higher than a maximum optical intensity of the ninth pulse laser beam outputted from the optical system and a maximum optical intensity of the eighth pulse laser beam outputted from the optical system is higher than a maximum optical intensity of the tenth pulse laser beam outputted from the optical system.

14 . The laser doping apparatus according to claim 13 , wherein
time-domain pulse waveforms of the seventh and ninth pulse laser beams outputted from the optical system overlap with each other, and time-domain pulse waveforms of the eighth and tenth pulse laser beams outputted from the optical system overlap with each other.

15 . The laser doping apparatus according to claim 1 , wherein the controlling device includes an attenuator configured to control the fluence of each of the first and second pulse laser beams.

16 . The laser doping apparatus according to claim 1 , wherein the controlling device includes a variable slit configured to control the irradiated region of each of the first and second pulse laser beams.

17 . The laser doping apparatus according to claim 1 , wherein the controlling device controls the time-domain pulse waveform, the fluence, and the irradiated region of each of the first and second pulse laser beams such that
dopant concentration in the first irradiated region is higher than dopant concentration in the second irradiated region, and doping depth in the first irradiated region is smaller than doping depth in the second irradiated region.

18 . The laser doping apparatus according to claim 1 , wherein the controlling device controls the time-domain pulse waveform, the fluence, and the irradiated region of each of the first and second pulse laser beams such that
the first fluence is higher than the second fluence, and a first pulse width shown in the first time-domain pulse waveform is smaller than a second pulse width shown in the second time-domain pulse waveform.

19 . The laser doping apparatus according to claim 1 , wherein the pulse laser beam has a wavelength of 248 nm or more and 308 nm or less.

20 . A laser doping me

Assignees

• Univ Kyushu
• Gigaphoton Inc

Inventors

• OHKUBO Tomoyuki
• Ikenoue Hiroshi
• Ikeda Akihiro
• Asano Tanemasa
• Wakabayashi Osamu

Classifications

• H10P34/42

  with electromagnetic radiation, e.g. laser annealing (laser cutting H10P54/20) · CPC title

• H10P32/172 Primary

  being crystalline silicon carbide · CPC title

• H01S3/10046

  Pulse repetition rate control (H01S3/11 takes precedence) · CPC title

• H01S3/10038

  Amplitude control · CPC title

• H01S3/005

  Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping (shaping laser beam for working metal or other materials B23K26/06; optical elements, systems or apparatus in general G02B) · CPC title