Apparatus for treating substrate

Patent metadata

Field	Value
Publication number	US-2019221455-A1
Application number	US-201916245706-A
Country	US
Kind code	A1
Filing date	Jan 11, 2019
Priority date	Jan 15, 2018
Publication date	Jul 18, 2019
Grant date	—

Abstract

An apparatus for treating a substrate are provided. The apparatus includes a chamber having a treatment space therein, a substrate support unit to support the substrate in the treatment space, and a heater unit to heat the substrate supported by the substrate support unit. The substrate support unit includes a support plate having a seating surface, a support protrusion provided to protrude from the seating plate and to directly support the substrate, and a sensor provided to the support protrusion to measure a temperature of the substrate.

First claim

What is claimed is:

1 . An apparatus for treating a substrate, the apparatus comprising:
a chamber having a treatment space therein; a substrate support unit to support the substrate in the treatment space; and a heater unit to heat the substrate supported by the substrate support unit, wherein the substrate support unit includes: a support plate having a seating surface; a support protrusion provided to protrude from the seating plate and to directly support the substrate; and a sensor provided to the support protrusion to measure a temperature of the substrate.

2 . The apparatus of claim 1 , further comprising:
an elastic member to apply elastic force to the support protrusion in a direction that the support protrusion faces the substrate.

3 . The apparatus of claim 2 , wherein an insertion hole is formed in the seating surface,
wherein the insertion hole includes a first hole extending downward from the seating surface and a second hole extending downward from the first hole, wherein the first hole has a width greater than a width of the second hole, wherein a protrusion region of the support protrusion protruding from the seating surface has a width greater than the width of the second hole, and wherein the elastic member is positioned in the first hole.

4 . The apparatus of claim 3 , wherein a plurality of insertion holes and a plurality of support protrusions are provided, and
wherein the apparatus further includes: a pressure reducing unit to reduce pressure of space between the substrate and the seating surface.

5 . The apparatus of claim 4 , wherein some of the support protrusions are positioned in a first region of the seating surface, and others of the supporting protrusions are positioned in a second region of the seating surface,
wherein the first region includes a central region of the seating surface, and wherein the second region includes an edge of the seating surface, which surrounds the first region.

6 . The apparatus of claim 2 , wherein the support protrusion includes a body to directly support the substrate, and
wherein the sensor is positioned in the body, and positioned adjacent to an inner surface opposite to an outer surface of the body in contact with the substrate.

7 . The apparatus of claim 2 , wherein the support protrusion includes the body, and
wherein the sensor is positioned through the body to directly support the substrate.

Assignees

• Semes Co Ltd

Inventors

• Seo Jong Seok

Classifications

• H10P72/7614

  characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

• H10P72/0602

  Temperature monitoring · CPC title

• H10P72/0474

  comprising at least one lithography chamber · CPC title

• H10P72/0458

  vertical arrangement · CPC title

• H10P72/0432 Primary

  mainly by conduction · CPC title