Method for manufacturing polycrystalline silicon bar and polycrystalline silicon bar
US-2017210630-A1 · Jul 27, 2017 · US
US2019119829A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2019119829-A1 |
| Application number | US-201816161526-A |
| Country | US |
| Kind code | A1 |
| Filing date | Oct 16, 2018 |
| Priority date | Oct 20, 2017 |
| Publication date | Apr 25, 2019 |
| Grant date | — |
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The present invention provides polycrystalline silicon suitably used as a raw material for producing single crystal silicon. The polycrystalline silicon rod of the present invention is a polycrystalline silicon rod grown by chemical vapor deposition performed under a pressure of 0.3 MPaG or more, wherein when a plate-shaped sample piece collected from an arbitrary portion of the polycrystalline silicon rod is observed with a microscope with a temperature increased from a temperature lower than a melting point of silicon up to a temperature exceeding the melting point of silicon, a heterogeneous crystal region, which is a crystal region including a plurality of crystal grains heterogeneously assembled and including no needle-like crystal, having a diameter exceeding 10 μm is not observed.
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What is claimed is: 1 . A polycrystalline silicon rod grown by chemical vapor deposition performed under a pressure of 0.3 MPaG or more, wherein when a plate-shaped sample piece collected from an arbitrary portion of the polycrystalline silicon rod is observed with a microscope with a temperature increased from a temperature lower than a melting point of silicon up to a temperature exceeding the melting point of silicon, a heterogeneous crystal region, which is a crystal region including a plurality of crystal grains heterogeneously assembled and including no needle-like crystal, having a diameter exceeding 10 μm is not observed. 2 . A polycrystalline silicon rod grown by chemical vapor deposition performed under a pressure of 0.1 MPaG or less, wherein when a plate-shaped sample piece collected from an arbitrary portion of the polycrystalline silicon rod is observed with a microscope with a temperature increased from a temperature lower than a melting point of silicon up to a temperature exceeding the melting point of silicon, a heterogeneous crystal region, which is a crystal region including a plurality of crystal grains heterogeneously assembled and including no needle-like crystal, having a diameter exceeding 100 μm is not observed. 3 . A method for producing single crystal silicon, using the polycrystalline silicon rod according to claim 1 as a raw material. 4 . A method for producing single crystal silicon, using the polycrystalline silicon rod according to claim 2 as a raw material.
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