Polycrystalline silicon rod and method for producing single crystal silicon

US2019119829A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2019119829-A1
Application numberUS-201816161526-A
CountryUS
Kind codeA1
Filing dateOct 16, 2018
Priority dateOct 20, 2017
Publication dateApr 25, 2019
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides polycrystalline silicon suitably used as a raw material for producing single crystal silicon. The polycrystalline silicon rod of the present invention is a polycrystalline silicon rod grown by chemical vapor deposition performed under a pressure of 0.3 MPaG or more, wherein when a plate-shaped sample piece collected from an arbitrary portion of the polycrystalline silicon rod is observed with a microscope with a temperature increased from a temperature lower than a melting point of silicon up to a temperature exceeding the melting point of silicon, a heterogeneous crystal region, which is a crystal region including a plurality of crystal grains heterogeneously assembled and including no needle-like crystal, having a diameter exceeding 10 μm is not observed.

First claim

Opening claim text (preview).

What is claimed is: 1 . A polycrystalline silicon rod grown by chemical vapor deposition performed under a pressure of 0.3 MPaG or more, wherein when a plate-shaped sample piece collected from an arbitrary portion of the polycrystalline silicon rod is observed with a microscope with a temperature increased from a temperature lower than a melting point of silicon up to a temperature exceeding the melting point of silicon, a heterogeneous crystal region, which is a crystal region including a plurality of crystal grains heterogeneously assembled and including no needle-like crystal, having a diameter exceeding 10 μm is not observed. 2 . A polycrystalline silicon rod grown by chemical vapor deposition performed under a pressure of 0.1 MPaG or less, wherein when a plate-shaped sample piece collected from an arbitrary portion of the polycrystalline silicon rod is observed with a microscope with a temperature increased from a temperature lower than a melting point of silicon up to a temperature exceeding the melting point of silicon, a heterogeneous crystal region, which is a crystal region including a plurality of crystal grains heterogeneously assembled and including no needle-like crystal, having a diameter exceeding 100 μm is not observed. 3 . A method for producing single crystal silicon, using the polycrystalline silicon rod according to claim 1 as a raw material. 4 . A method for producing single crystal silicon, using the polycrystalline silicon rod according to claim 2 as a raw material.

Assignees

Inventors

Classifications

  • Products containing multiple oriented crystallites, e.g. columnar crystallites · CPC title

  • C30B29/06Primary

    Silicon · CPC title

  • characterised by the seed, e.g. its crystallographic orientation · CPC title

  • Apparatus for preparing, pre-treating the source material to be used for crystal growth · CPC title

  • Purification (by zone-melting C30B13/00) · CPC title

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What does patent US2019119829A1 cover?
The present invention provides polycrystalline silicon suitably used as a raw material for producing single crystal silicon. The polycrystalline silicon rod of the present invention is a polycrystalline silicon rod grown by chemical vapor deposition performed under a pressure of 0.3 MPaG or more, wherein when a plate-shaped sample piece collected from an arbitrary portion of the polycrystalline…
Who is the assignee on this patent?
Shinetsu Chemical Co
What technology area does this patent fall under?
Primary CPC classification C30B29/06. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Apr 25 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).