Glass substrate with reduced internal reflectance and method for manufacturing the same

Patent metadata

Field	Value
Publication number	US-2019119154-A1
Application number	US-201716092533-A
Country	US
Kind code	A1
Filing date	Mar 13, 2017
Priority date	Apr 12, 2016
Publication date	Apr 25, 2019
Grant date	—

Abstract

The invention concerns a method for manufacturing glass substrates with reduced internal reflectance by ion implantation, comprising ionizing a source gas of N2, O2, Ar, and/or He so as to form a mixture of single charge and multicharge ions of N, O, Ar, and/or He forming a beam of single charge and multicharge ions of N, O, Ar, and/or He, by accelerating with an acceleration voltage comprised between 15 kV and 60 kV and an ion dosage comprised between 1017 ions/cm2 and 1018 ions/cm2. The invention further concerns glass substrates having reduced internal reflectance, comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.

First claim

1 : A method for producing a glass substrate with reduced internal reflectance, the method comprising:
a) ionizing at least one source gas selected from the group consisting of N 2 , O 2 , Ar, and He, so as to form a mixture of single charge ions and multicharge ions of N, O, Ar, and/or He, b) accelerating the mixture of single charge ions and multicharge ions with an acceleration voltage so as to form a beam of single charge ions and multicharge ions, wherein the acceleration voltage is 15 kV to 60 kV and the ion dosage is 10 17 ions/cm 2 to 10 18 ions/cm 2 , and c) positioning a glass substrate in the trajectory of the beam of single charge and multicharge ions.

2 : The method according to claim 1 , wherein the acceleration voltage is 20 kV to 40 kV and the ion dosage is 2.5×10 17 ions/cm 2 to 7.5×10 17 ions/cm 2 .

3 : The method according to claim 2 , wherein the acceleration voltage is 30 kV to 40 kV and the ion dosage is 2.5×10 17 ions/cm 2 to 5×10 17 ions/cm 2 .

4 : The method according to claim 1 , wherein the glass substrate in c) comprises the following components, expressed as weight percentage of a total weight of the glass:

SiO 2
35-85%,

Al 2 O 3
 0-30%,

P 2 O 5
 0-20%

B 2 O 3
 0-20%,

Na 2 O
 0-25%,

CaO
 0-20%,

MgO
 0-20%,

K 2 O
 0-20%, and

BaO
 0-20%.

5 : The method according to claim 4 wherein the glass substrate is selected from the group consisting of a soda-lime glass sheet, a borosilicate glass sheet and an aluminosilicate glass sheet.

6 : The method according to claim 1 , which produces a double porous surface layer in the glass substrate, the mixture of single charge and multicharge ions being implanted in the glass substrate with a dosage and acceleration voltage effective to form the double porous surface layer in the glass substrate.

7 : The method according to claim 6 , wherein the mixture of single charge and multicharge ions is being implanted in the glass substrate with a dosage and acceleration voltage effective to form a double porous surface layer comprising an upper porous surface layer with a first porosity and contiguously a lower porous surface layer with a second porosity,
a) wherein the upper porous surface layer starts at the substrate surface and descends down to a depth D 2 , and b) wherein the lower porous surface layer starts at a depth D 2 and descends down to a depth D 1 .

8 : The method according to claim 6 , wherein the mixture of single charge and multicharge ions is implanted in the glass substrate with a dosage and acceleration voltage effective to form a double porous surface layer,
a) wherein the upper porous layer comprises pores having a cross-sectional equivalent circular diameter of 21 nm to 200 nm, and b) wherein the lower porous layer comprises only pores having a cross-section equivalent circular diameter of 3 nm to 10 nm.

9 : A glass substrate with reduced internal reflectance produced by the method according to claim 1 .

10 : An electro-optical device comprising the glass substrate according to claim 9 .

11 : The electro-optical device according to claim 10 , wherein the electro-optical device is an OLED device or a photovoltaic device.

12 : The method according to claim 8 , wherein the mixture of single charge and multicharge ions is implanted in the glass substrate with a dosage and acceleration voltage effective to form a double porous surface layer and wherein 10 to 40% of the cross-sectional area of the upper porous layer is occupied by pores having a cross-sectional equivalent circular diameter of 21 nm to 200 nm.

Assignees

• Agc Glass Europe
• Agc Glass Company North America
• Asahi Glass Co Ltd
• Quertech Ingenierie

Inventors

• Navet Benjamine
• Boulanger Pierre

Classifications

• C03C3/097

  containing phosphorus, niobium or tantalum · CPC title

• C03C23/0055 Primary

  by ion implantation · CPC title

• C03C3/091

  containing aluminium · CPC title

• C03C3/087

  containing calcium oxide, e.g. common sheet or container glass · CPC title

• H10K50/00

  Organic light-emitting devices (integrated devices or assemblies of multiple devices H10K59/00, H10K65/00; organic semiconductor lasers H01S5/36) · CPC title