Film having plated-layer precursor layer, film having patterned plated layer, electroconductive film, and touch panel

US2018371618A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2018371618-A1
Application numberUS-201816115886-A
CountryUS
Kind codeA1
Filing dateAug 29, 2018
Priority dateMar 11, 2016
Publication dateDec 27, 2018
Grant date

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  1. Title

    What the patent document calls the invention.

  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The film having a plated-layer precursor layer of the present invention is a film having a plated-layer precursor layer including a substrate, and an undercoat and a plated-layer precursor layer disposed on the substrate in this order from the substrate side, in which the undercoat has a hardness on the surface thereof of 10 N/mm2 or less and a friction coefficient with release paper of 5 or less.

First claim

Opening claim text (preview).

What is claimed is: 1 . A film having a plated-layer precursor layer, comprising: a substrate; an undercoat disposed on the substrate; and a plated-layer precursor layer disposed on the undercoat, wherein the undercoat has a hardness on the surface thereof of 10 N/mm 2 or less and a friction coefficient with release paper of 5 or less. 2 . The film having a plated-layer precursor layer according to claim 1 , wherein the plated-layer precursor layer contains a polymerization initiator and Compound X or Composition Y below. Compound X: a compound having a functional group capable of interacting with a plating catalyst or a precursor thereof, and a polymerizable group Composition Y: a composition containing a compound having a functional group capable of interacting with a plating catalyst or a precursor thereof, and a compound having a polymerizable group 3 . A film having a patterned plated layer, comprising: a substrate; an undercoat disposed on the substrate; and a patterned plated layer disposed on the undercoat, wherein the undercoat has a hardness on the surface thereof of 10 N/mm 2 or less and a friction coefficient with release paper of 5 or less. 4 . An electroconductive film comprising: the film having a patterned plated layer according to claim 3 ; and a metal layer disposed on the patterned plated layer in the film having a patterned plated layer. 5 . An electroconductive film comprising: the film having a patterned plated layer according to claim 3 , and a metal layer disposed on the patterned plated layer in the film having a patterned plated layer, wherein the metal layer is formed by an electroless plating treatment. 6 . A touch panel comprising: the electroconductive film according to claim 4 . 7 . A touch panel comprising: the electroconductive film according to claim 5 .

Assignees

Inventors

Classifications

  • by capacitive means · CPC title

  • C23C18/18Primary

    Pretreatment of the material to be coated · CPC title

  • Electroless plating, e.g. finish plating or initial plating · CPC title

  • Conductive pattern lay-out details not covered by sub groups H05K1/02 - H05K1/0295 (H05K1/11 takes precedence; lay-out adapted to mounted component configuration H05K1/18) · CPC title

  • Coating with metals · CPC title

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Frequently asked questions

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What does patent US2018371618A1 cover?
The film having a plated-layer precursor layer of the present invention is a film having a plated-layer precursor layer including a substrate, and an undercoat and a plated-layer precursor layer disposed on the substrate in this order from the substrate side, in which the undercoat has a hardness on the surface thereof of 10 N/mm2 or less and a friction coefficient with release paper of 5 or less.
Who is the assignee on this patent?
Fujifilm Corp
What technology area does this patent fall under?
Primary CPC classification C23C18/18. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Dec 27 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).