Plasma processing apparatus and plasma processing method

Patent metadata

Field	Value
Publication number	US-2018366305-A1
Application number	US-201816003954-A
Country	US
Kind code	A1
Filing date	Jun 8, 2018
Priority date	Jun 14, 2017
Publication date	Dec 20, 2018
Grant date	—

Abstract

In a plasma processing apparatus, a controller controls one or both of a first high frequency power supply and a second high frequency power supply to periodically stop the supply of one or both of the first high frequency power and the second high frequency power. The controller also controls a switching unit to apply a DC voltage to a focus ring from a first time after a predetermined period of time in which a self-bias voltage of a lower electrode is decreased from a start point of each period in which one or both of the first high frequency power and the second high frequency power are supplied and to stop the application of the DC voltage to the focus ring during each period in which the supply of one or both of the first high frequency power and the second high frequency power is stopped.

First claim

What is claimed is:

1 . A plasma processing apparatus comprising:
a chamber main body defining a chamber; a stage, provided in the chamber, including a lower electrode and an electrostatic chuck provided on the lower electrode, on which a focus ring is arranged to surround a substrate mounted on the electrostatic chuck; a first high frequency power supply configured to supply a first high frequency power for generating plasma of a gas in the chamber; a second high frequency power supply configured to supply a second high frequency bias power to the lower electrode; a DC power supply configured to generate a negative DC voltage to be applied to the focus ring in order to correct inclination of an incident direction of ions to an edge region of the substrate mounted on the electrostatic chuck with respect to a vertical direction; a switching unit configured to stop the application of the DC voltage to the focus ring; and a controller configured to control one or both of the high frequency power supply and the second high frequency power supply and control the switching unit, wherein the controller controls one or both of the first high frequency power supply and the second high frequency power supply to periodically stop the supply of one or both of the first high frequency power and the second high frequency power, and the controller also controls the switching unit to apply the DC voltage to the focus ring from a first time after a predetermined period of time in which a self-bias voltage of the lower electrode is decreased from a start point of each period in which one or both of the first high frequency power and the second high frequency power are supplied and to stop the application of the DC voltage to the focus ring during each period in which the supply of one or both of the first high frequency power and the second high frequency power is stopped.

2 . The plasma processing apparatus of claim 1 , wherein the controller controls the switching unit to stop the application of the DC voltage to the focus ring at a second time earlier than an end point of each period in which one or both of the first high frequency power and the second high frequency power are supplied.

3 . The plasma processing apparatus of claim 2 , further comprising:
a main control unit; and a measuring device configured to measure a self-bias voltage of the lower electrode; wherein the DC power supply is configured to generate the DC voltage whose absolute value is a sum of an absolute value of the self-bias voltage measured by the measuring device and a set value designated by the main control unit, and the main control unit is configured to determine the set value from a self-bias voltage of the lower electrode specified from a processing condition and the amount of consumption of the focus ring by using a predetermined function or table.

4 . The plasma processing apparatus of claim 3 , wherein the DC power supply is configured to obtain the self-bias voltage measured by the measuring device between the second time and the end point in each period in which one or both of the first high frequency power and the second high frequency power are supplied and to generate the DC voltage whose absolute value is the sum of the set value and an absolute value of the measured self-bias voltage in a next period in which one or both of the first high frequency power and the second high frequency power are supplied.

5 . The plasma processing apparatus of claim 1 , wherein the controller is configured to control a duration of applying the DC voltage to the focus ring in each period in which one or both of the first high frequency power and the second high frequency power are supplied in order to correct the inclination.

6 . A plasma processing method performed by using the plasma processing apparatus described in claim 1 in a state where a substrate is mounted on the electrostatic chuck and a processing gas is supplied into the chamber, the method comprising:
supplying one or both of the first high frequency power and the second high frequency power; and
stopping the supply of one or both of the first high frequency power and the second high frequency power,
wherein said supplying one or both of the first high frequency power and the second high frequency power and said stopping the supply of one or both of the first high frequency power and the second high frequency power are alternately executed,
the method further comprising:
applying the DC voltage to the focus ring from a first time after a predetermined period of time in which a self-bias voltage of the lower electrode is decreased from a start point of each period in which one or both of the first high frequency power and the second high frequency power are supplied; and
stopping the application of the DC voltage to the focus ring during each period in which the supply of one or both of the first high frequency power and the second high frequency power is stopped.

7 . The plasma processing method of claim 6 , wherein said stopping the application of the DC voltage starts at a second time earlier than an end point of each period in which one or both of the first high frequency power and the second high frequency power are supplied.

8 . The plasma processing method of claim 7 , wherein the plasma processing apparatus further includes:
a main control unit; and a measuring device configured to measure a self-bias voltage of the lower electrode, wherein the main control unit is configured to determine a set value from a self-bias voltage of the lower electrode specified from a process condition and the amount of consumption of the focus ring by using a predetermined function or table, and wherein in said applying the DC voltage, the DC voltage whose absolute value is a sum of the set value determined by the main control unit and an absolute value of the self-bias voltage measured by the measuring device is applied to the focus ring.

9 . The plasma processing method of claim 8 , wherein the self-bias voltage measured by the measuring device between the second time and the end point in each period in which one or both of the first high frequency power and the second high frequency power are supplied is obtained, and the DC voltage whose absolute value is the sum of the set value and an absolute value of the measured self-bias voltage is applied to the focus ring in a next period in which one or both of the first high frequency power and the second high frequency power are supplied.

Assignees

• Tokyo Electron Ltd

Inventors

• Nagami Koichi
• Torii Natsumi

Classifications

• H01J37/32091 Primary

  the radio frequency energy being capacitively coupled to the plasma · CPC title

• H01J2237/24564

  Measurements of electric or magnetic variables, e.g. voltage, current, frequency · CPC title

• H01J37/32385

  Treating the edge of the workpieces · CPC title

• H01J37/32697

  Electrostatic control · CPC title

• H01J37/32642 Primary

  Focus rings · CPC title