Prevent and remove organics from reservoir wells

US2018355506A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2018355506-A1
Application numberUS-201816108528-A
CountryUS
Kind codeA1
Filing dateAug 22, 2018
Priority dateOct 24, 2014
Publication dateDec 13, 2018
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Plating bath and well structures and methods are described to stop the organic compounds present in plating reservoir wells or bath solution from rising, i.e., climbing up the reservoir wall. An electroplating apparatus includes a vessel holding a liquid solution including metal plating material and an organic species, and a method of operating an electroplating apparatus. The apparatus is designed with plating bath and structures and methods to stop the organic compounds present in plating reservoir wells or bath solution from rising, i.e., climbing or wicking up the inner surfaces of reservoir walls, and to wash them back down on a continuous or cyclical basis in order to maintain a concentration of organic compounds in the plating solution within upper and lower specification limits.

First claim

Opening claim text (preview).

What is claimed is: 1 . An electroplating apparatus comprising: a vessel having walls configured to hold a liquid solution of a metal plating material and including an organic species, the liquid solution contained within the vessel at a first level below a top rim of the vessel; and means for preventing an organic species of the solution from wicking up inner wall surfaces of the vessel toward the top rim, wherein the vessel top rim defines a vessel perimeter, the preventing means comprising: a source of the metal plating solution; a conveying apparatus for providing the liquid solution from the source to a height at or above the top rim, the conveyance apparatus having a portion aligned with the vessel perimeter at the height, and an opening formed in the aligned conveyance portion to create a flow of the metal plating solution over the top rim and on an inner wall surface, the solution flow of a force suitable to rinse the organics back into the tank, wherein a relative concentration of organic species in the liquid solution is maintained, and wherein the conveyance apparatus is a pipe including a nozzle bar portion at a height above or aligned with the vessel top rim and inwardly offset therefrom, the nozzle bar portion including a plurality of nozzle openings; and a pump connected to the pipe for pumping liquid solution through the plurality of nozzle openings, the plurality of nozzle openings directed to create a downward flow of the liquid solution at or below the top rim on each inner wall surface. 2 . The electroplating apparatus of claim 1 , wherein a workpiece is immersed in the liquid solution to displace a volume of the liquid solution resulting in the liquid solution level rising within the vessel to a second level above the first level, the preventing means comprising: a groove formed in the vessel walls, the groove located about a perimeter of the vessel at a height corresponding to the second level; and a material formed in the groove to prevent wicking of the organic species at or above the second level. 3 . The electroplating apparatus of claim 2 , wherein the material formed in the groove comprises glass, glassy carbon or a ceramic material. 4 . The electroplating apparatus of claim 1 , wherein a workpiece immersed in the liquid solution displaces a volume of the liquid solution resulting in the liquid solution level rising within the vessel to a second level above the first level, the preventing means comprising: a removable liner of flexible glass for lining each inner surface wall of the vessel about a perimeter of the vessel at a height corresponding to the second level to prevent organics from rising. 5 . The electroplating apparatus of claim 1 , wherein a workpiece is immersed in the liquid solution to displace a volume of the liquid solution resulting in the liquid solution level rising within the vessel to a second level above the first level, the preventing means comprising: a removable object configured for immersion in the liquid solution contained in the vessel; the removable object when immersed causing displacement of a volume of the liquid solution resulting in the liquid solution level rising within the vessel to the second level, wherein when the removable object is removed, the liquid level is lowered to the first level while simultaneously washing the organics back into the solution. 6 . The electroplating apparatus of claim 5 , wherein the removable object is a bladder, the bladder configured to expand in a manner response to an amount of input air. 7 . The electroplating apparatus of claim 5 , wherein the removable object is solid having a fixed volume displacement. 8 . The electroplating apparatus of claim 5 , further comprising: a control device for controlling repeating of the immersing and removal of the workpiece in the liquid solution and afterward the immersing and removing the removable object in the liquid solution in alternating fashion. 9 . An electroplating apparatus comprising: a vessel having an inner wall and an outer wall defining a space therebetween, the inner wall configured to hold a liquid solution of a metal plating material and including an organic species, the liquid solution contained within the vessel at a first level below a top rim of the vessel; an opening formed in the inner wall surface below a top rim of the vessel; and a source for providing liquid solution in the defined space, wherein the liquid solution from the source exits the formed opening to create a flow of the liquid solution over the inner wall and on each inner wall surface, the solution flow of a force suitable to rinse the organics back into the tank, wherein a relative concentration of organic species in the liquid solution is maintained. 10 . The electroplating apparatus of claim 9 , wherein the conveyance apparatus comprises: a pipe connected at one side to an opening formed in the outer wall, the pipe receiving liquid solution from a source for input to the formed space. 11 . An electroplating apparatus comprising: a vessel having walls configured to hold a liquid solution of a metal plating material and including an organic species, wherein a workpiece immersed in the liquid solution displaces a volume of the liquid solution resulting in a liquid solution level rising within the vessel below a top rim thereof; a barrier material lining formed on an inner surface of each wall around a perimeter of the vessel below a top rim of the vessel, barrier material lining provided at an inner wall surface level corresponding to a level that the liquid solution level rises to in the vessel when a workpiece is immersed, the barrier material preventing the organic species from rising above the level on an inner wall surface of the vessel. 12 . The electroplating apparatus of claim 11 , further comprising: a groove formed in each inner wall surface around a perimeter of the vessel in which the barrier material lining is formed, wherein the barrier material lining has a surface contiguous with the inner wall surface. 13 . The electroplating apparatus of claim 12 , wherein the barrier material layer is configured for insertion into the groove and is removable therefrom. 14 . The electroplating apparatus of claim 11 , wherein the barrier material is one of: a glass material, flexible glass, a glassy carbon, or a ceramic material.

Assignees

Inventors

Classifications

  • Agitating of electrolytes; Moving of racks · CPC title

  • C25D21/18Primary

    of electrolytes (C25D21/22 takes precedence) · CPC title

  • Tanks; Installations therefor · CPC title

  • Rinsing · CPC title

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Frequently asked questions

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What does patent US2018355506A1 cover?
Plating bath and well structures and methods are described to stop the organic compounds present in plating reservoir wells or bath solution from rising, i.e., climbing up the reservoir wall. An electroplating apparatus includes a vessel holding a liquid solution including metal plating material and an organic species, and a method of operating an electroplating apparatus. The apparatus is desi…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification C25D21/18. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Dec 13 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).