Method of reducing bacterial activity in the oral cavity of a patient
US-2024041702-A1 · Feb 8, 2024 · US
US2018353268A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2018353268-A1 |
| Application number | US-201515535890-A |
| Country | US |
| Kind code | A1 |
| Filing date | Dec 14, 2015 |
| Priority date | Dec 16, 2014 |
| Publication date | Dec 13, 2018 |
| Grant date | — |
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The present invention discloses a dental implant configured to be inserted in a hole in jaw bone and to be at least partially situated in the bone tissue when implanted and comprises: a coronal region, an apical region, a longitudinal axis extending from the coronal region of the dental implant to the apical region of the dental implant; an implant surface configured to form an interface between an implant material and the oral environment/surrounding tissue and a surface layer formed on at least part of said implant surface, said surface layer comprising crystalline titanium oxide in the anatase phase and wherein the surface area roughness Sa and the pore size of the implant surface on which said surface layer is formed increase from the coronal region toward the apical region of the dental implant along the longitudinal axis.
Opening claim text (preview).
1 . A dental implant configured to be inserted in a hole in jaw bone and to be at least partially situated in the bone tissue when implanted, comprising: a coronal region; an apical region; a longitudinal axis extending from the coronal region of the dental implant to the apical region of the dental implant; an implant surface configured to form an interface between an implant material and the oral environment; and a surface layer formed on at least part of said implant surface, said surface layer comprising crystalline titanium oxide in the anatase phase; wherein the surface area roughness Sa and the pore size of the implant surface on which said surface layer is formed, increase from the coronal region toward the apical region of the dental implant along the longitudinal axis. 2 . The dental implant according to claim 1 , wherein said surface area roughness Sa of said implant surface on which said surface layer is formed increases along the longitudinal axis from a value of 0.1 μm in the coronal region of the dental implant to a value of at least 1 μm in the apical region of the dental implant, and an average pore size of pores intersecting the implant surface on which said surface layer is formed increases along the longitudinal axis from a value of <0.1 μm in the coronal region of the dental implant to a value of at least 1 μm in the apical region of the dental implant. 3 . The dental implant according to claim 1 , wherein the surface area roughness Sa and/or the pore size of the implant surface on which said surface layer is formed increase continuously along the longitudinal axis from the coronal region to the apical region. 4 . The dental implant according to claim 1 , wherein the implant surface on which said surface layer is formed further comprises a transitional region between the coronal region and the apical region of the dental implant, the surface area roughness Sa of the implant surface on which said surface layer is formed in the coronal region of the dental implant is in the range of 0.1 μm to 0.5 μm and an average pore size of pores intersecting the implant surface on which said surface layer is formed is minimal with respect to the overall implant surface on which said surface layer is formed, the surface area roughness Sa of the implant surface on which said surface layer is formed at said transitional region is in the range of 0.5 to 1.0 μm, and the surface area roughness Sa of the implant surface on which said surface layer is formed in the apical region of the dental implant is in the range of 1.0 to 5 μm and an average pore size of pores intersecting the implant surface on which said surface layer is formed is maximal with respect to the overall implant surface. 5 . The dental implant according to claim 1 , wherein the crystalline titanium oxide comprised in said surface layer comprises anatase in the range of 70-100% and wherein the remaining of the layer comprises rutile and amorphous titanium oxide; and/or said implant surface on which said surface layer is formed comprises phosphorus; and/or said implant surface on which said surface layer is formed comprises at least one of a bone-growth-initiating substance and a bone-growth-stimulating substance; and/or said implant surface on which said surface layer is formed has an anti-bacterial effect. 6 . The dental implant according to claim 1 , wherein said surface layer at least partially formed on said implant surface has a thickness between 50 and 500 nm in the coronal region, and between 1 and 20 μm in the apical region. 7 . The dental implant according to claim 1 , wherein the implant surface of the dental implant is fully covered with said surface layer from the coronal to the apical region and vice versa, such that none of the implant material remains uncovered. 8 . The dental implant according to claim 1 , wherein the implant surface is at least partially a machined surface; and/or a region of the implant surface in the coronal region of the dental implant is machined and at least partially so configured that the characteristics of the implant surface as-formed by said machining are maintained when the surface layer is superimposed. 9 . The dental implant according to claim 8 , wherein in said machined region, the surface area roughness Sa of the implant surface on which said surface layer is formed in the coronal region of the dental implant is in the range of 0.1 to 0.5 μm, and an average pore size of pores intersecting the implant surface on which said surface layer is formed is <0.1 μm. 10 . The dental implant according to claim 1 , wherein the implant surface is at least partially a rolled surface. 11 . The dental implant according to claim 1 , wherein the implant material comprises or consists of titanium or a titanium alloy. 12 . The dental implant according to claim 11 , wherein the surface layer is generated by an anodic oxidation process. 13 . The dental implant according to claim 1 , wherein the surface area roughness Sa and the pore size of the implant surface on which said surface layer is formed are minimal in the coronal region and maximal in the apical region with respect to the all of the implant surface on which the surface layer is formed. 14 . The dental implant according to claim 1 , wherein said surface area roughness Sa of said implant surface on which said surface layer is formed increases along the longitudinal axis from a value of 0.2 μm in the coronal region of the dental implant to a value of at least 1 μm in the apical region of the dental implant. 15 . The dental implant according to claim 4 , wherein the surface area roughness Sa of the implant surface on which said surface layer is formed in the coronal region of the dental implant is in the range of 0.2 μm to 0.5 μm. 16 . The dental implant according to claim 5 , wherein said implant surface on which said surface layer is formed comprises phosphorus in the form of phosphates. 17 . The dental implant according to claim 5 , wherein said implant surface on which said surface layer is formed comprises at least one of a bone-growth-initiating substance and a bone-growth-stimulating substance of the superfamily TGF-beta.
comprising titanium oxide · CPC title
Medicaments · CPC title
comprising metals or alloys · CPC title
with a surface layer, coating · CPC title
being a conversion layer, e.g. oxide layer · CPC title
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