Charged particle beam apparatus

Patent metadata

Field	Value
Publication number	US-2018277333-A1
Application number	US-201815936140-A
Country	US
Kind code	A1
Filing date	Mar 26, 2018
Priority date	Mar 27, 2017
Publication date	Sep 27, 2018
Grant date	—

Abstract

Disclosed herein is a charged particle beam apparatus ( 10 ) including: a sample chamber ( 11 ); a sample stage ( 31 ); an electron beam column ( 13 ) irradiating a sample S using an electron beam; and a focused ion beam column ( 14 ) irradiating the sample S using a focused ion beam. The apparatus ( 10 ) includes an electrode member ( 45 ) provided to be displaced between an insertion position between a beam emitting end portion of the electron beam column ( 13 ) and the sample stage ( 31 ) and a withdrawal position distant from the insertion position, the electrode member being provided with an electrode penetrating hole passing the electron beam therethrough. The apparatus ( 10 ) includes: a driving unit ( 42 ) displacing the electrode member ( 45 ); a power source ( 20 ) applying a negative voltage to the electrode member ( 45 ); and an insulation member ( 43 ) electrically insulating the sample chamber ( 11 )and the driving unit ( 42 ) from the electrode member ( 45 ).

First claim

What is claimed is:

1 . A charged particle beam apparatus, comprising:
a sample stage on which a sample is placed; a sample chamber receiving the sample stage therein; a charged particle beam column irradiating the sample with a charged particle beam; an electrode member provided to be displaceable between an insertion position, the insertion position being between a beam emitting end portion of the charged particle beam column and the sample stage, and a withdrawal position distant from the insertion position, the electrode member being provided with a penetrating hole through which the charged particle beam passes at the insertion position; a driving means displacing the electrode member; a power source applying negative voltage to the electrode member from outside the sample chamber to decelerate the charged particle beam with respect to the sample, the power source; and an electrical insulation member electrically insulating the sample chamber and the driving means form the electrode member.

2 . The apparatus of claim 1 , wherein the driving means includes an actuator displacing the electrode member in a shift direction parallel to an optical axis of the charged particle beam column.

3 . The apparatus of claim 1 , wherein the driving means includes an actuator displacing the electrode member within a range that does not interfere with a tilt of the sample stage.

4 . The apparatus of claim 1 , wherein an inner surface of the penetrating hole is formed in a shape of a convex surface that is smoothly continuous to a surface of the electrode member.

5 . The apparatus of claim 1 , wherein the power source applies negative voltage to the electrode member and the sample such that the electrode member and the sample have a same electric potential.

6 . The apparatus of claim 5 , further comprising:
a first end being in contact with the sample; a second end provided at a position distant from the sample; and an electrical connection member electrically connecting the first end and the second end, wherein the power source applies negative voltage to the second end and the electrode member.

7 . The apparatus of claim 1 , wherein the charged particle beam column includes an electron beam column irradiating the sample with an electron beam, and a focused ion beam column irradiating the sample with a focused ion beam.

Assignees

• Hitachi High Tech Science Corp

Inventors

• Iwahori Toshiyuki

Classifications

• H01J2237/202

  Movement · CPC title

• H01J37/04 Primary

  Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement {(H01J37/32009, H01J37/32623, H01J37/3266, H01J37/32697 take precedence; electron or ion-optical systems for localised treatment of objects H01J37/3007)} · CPC title

• H01J37/09 Primary

  Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields · CPC title

• H01J2237/31749

  Focused ion beam · CPC title

• H01J2237/20207

  Tilt · CPC title