Wet Etching Method and Etching Solution

Patent metadata

Field	Value
Publication number	US-2018138053-A1
Application number	US-201615573302-A
Country	US
Kind code	A1
Filing date	Jun 22, 2016
Priority date	Jul 23, 2015
Publication date	May 17, 2018
Grant date	—

Abstract

Disclosed is a wet etching method for etching a metal-containing film on a substrate with the use of an etching solution, wherein the etching solution contains an organic solvent and a β-diketone having a trifluoromethyl group and a carbonyl group bonded to each other, and wherein the metal-containing film contains a metal element capable of forming a complex with the β-diketone.

First claim

1 . A wet etching method comprising: etching a metal-containing film on a substrate with the use of an etching solution,
wherein the etching solution contains a β-diketone having a trifluoromethyl group and a carbonyl group bonded to each other and an organic solvent, and wherein the metal-containing film contains a metal element capable of forming a complex with the β-diketone.

2 . The wet etching method according to claim 1 ,
wherein the metal element is at least one kind of metal element selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Sn, Pb and As.

3 . The wet etching method according to claim 1 ,
wherein the metal-containing film is a film made of a simple substance of the metal element, a film made of an alloy containing the metal element or a film made of a compound containing the metal element.

4 . The wet etching method according to claim 1 ,
wherein the organic solvent is at least one kind of organic solvent selected from the group consisting of primary alcohols, secondary alcohols, tertiary alcohols, benzyl alcohols, ethers, esters, ketones, amines, amides, glycols, glycol ethers and halogenated alkanes.

5 . The wet etching method according to claim 4 ,
wherein the organic solvent is at least one kind of organic solvent selected from the group consisting of isopropyl alcohol, methanol, ethanol, propylene glycol monomethyl ether acetate, methyl ethyl ketone and acetone.

6 . The wet etching method according to claim 1 ,
wherein the amount of water contained in the etching solution is 1 mass % or less.

7 . The wet etching method according to claim 1 ,
wherein the concentration of the β-diketone in the etching solution is 1 to 80 vol %.

8 . The wet etching method according to claim 1 ,
wherein the β-diketone is at least one kind selected from the group consisting of hexafluoroacetylacetone, trifluoroacetylacetone, 1,1,1,6,6,6-hexafluoro-2,4-hexanedione, 4,4,4-trifluoro-1-(2-thienyl)-1,3-butanedione, 4,4,4-trifluoro-1-phenyl-1,3-butanedione, 1,1,1,5,5,5-hexafluoro-3-methyl-2,4-pentanedione, 1,1,1,3,5,5,5-heptafluoro-2,3-pentanedione and 1,1,1-trifluoro-5,5-dimethyl-2,4-hexanedione.

9 . The wet etching method according to claim 1 ,
wherein the etching solution further contains a peroxide as an additive.

10 . The wet etching method according to claim 9 ,
wherein the peroxide is at least one selected from the group consisting of hydrogen peroxide, peracetic acid, potassium percarbonate, ammonium persulfate, sodium persulfate, potassium persulfate and potassium peroxysulfate.

11 . The wet etching method according to claim 1 ,
wherein the substrate is made of a silicon semiconductor material or a silicate glass material.

12 . An etching solution comprising:
at least one kind of organic solvent selected from the group consisting of isopropyl alcohol, methanol, ethanol, propylene glycol monomethyl ether acetate, methyl ethyl ketone and acetone; and a β-diketone having a trifluoromethyl group and a carbonyl group bonded to each other.

13 . The etching solution according to claim 12 wherein the β-diketone is at least one kind selected from the group consisting of hexafluoroacetylacetone, trifluoroacetylacetone, 1,1,1,6,6,6-hexafluoro-2,4-hexanedione, 4,4,4-trifluoro-1-(2-thienyl)-1,3-butanedione, 4,4,4-trifluoro-1-phenyl-1,3-butanedione, 1,1,1,5,5,5-hexafluoro-3-methyl-2,4-pentanedione, 1,1,1,3,5,5,5-heptafluoro-2,3-pentanedione and 1,1,1-trifluoro-5,5-dimethyl-2,4-hexanedione.

14 . The etching solution according to claim 12 ,
wherein the concentration of the β-diketone in the etching solution is 1 to 80 vol %.

15 . The etching solution according to claim 12 ,
wherein the etching solution consists essentially of the organic solvent and the β-diketone.

16 . The etching solution according to claim 12 , further comprising a peroxide as an additive,
wherein the etching solution consists essentially of the organic solvent, the β-diketone and the additive.

17 . A method for manufacturing a device, comprising etching a metal-containing film on a substrate by the wet etching method according to claim 1 .

Assignees

• Central Glass Co Ltd

Inventors

• Yao Akifumi
• Yamauchi Kunihiro
• Fujiwara Masaki
• Miyazaki Tatsuo

Classifications

• H10P50/646

  of Group III-V materials · CPC title

• H10P50/283

  by chemical means · CPC title

• H10P50/667 Primary

  by liquid etching only · CPC title

• H10P50/642

  Chemical etching · CPC title

• C23F1/10 Primary

  Etching compositions (C23F1/44 takes precedence) · CPC title