Resist composition and patterning process
US-2017108775-A1 · Apr 20, 2017 · US
US2018118671A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2018118671-A1 |
| Application number | US-201615575828-A |
| Country | US |
| Kind code | A1 |
| Filing date | May 18, 2016 |
| Priority date | May 22, 2015 |
| Publication date | May 3, 2018 |
| Grant date | — |
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The present invention relates to beta-naphthol ether sulfonic acids or salts thereof having the general formula (I) R—O-(AO) n —CH 2 —CH 2 —S(O) 3 M (I), where R, AO, n and M have the definitions stated in the claims and in the description, to mixtures thereof, to aqueous solutions and to electrolytes comprising them, to processes for preparing them and to the use of these.
Opening claim text (preview).
1 : A beta-naphthol ether sulfonic acid or salt thereof having the formula (I) R—O-(AO) n -CH 2 —CH 2 —S(O) 3 M (I), where R is a naphth-2-yl radical which is unsubstituted or substituted by one or more radicals R 1 ; R 1 is C 1-4 alkyl; n is an integer from 3 to 25; each AO independently of any other is selected from the rou consisting of CH 2 —CH 2 —O, CH(CH 3 )—CH 2 —O and CH 2 —CH(CH 3 )—O, and M is H, Li, Na, K, ½ Mg, ½ Ca, ½ Sr, ½ Ba or N(R 2 ) 4 , where each R 2 independently of any other is H, C 1-4 alkyl, phenyl or benzyl. 2 : The sulfonic acid or salt thereof according to claim 1 , wherein R is an unsubstituted naphth-2-yl radical. 3 : The sulfonic acid or salt thereof according to claim 1 , wherein n is an integer from 6 to 20. 4 : The sulfonic acid or salt thereof according to claim 1 , wherein n is the sum of k+l, where k is the number of CH 2 —CH 2 —O groups and l is the number of both groups CH(CH 3 )—CH 2 —O and CH 2 —CH(CH 3 )—O, and where k>0 and l>0. 5 : The sulfonic acid or salt thereof according to claim 4 , wherein k>l. 6 : The sulfonic acid or salt thereof according to claim 1 , wherein AO is exclusively CH 2 —CH 2 —O. 7 : The sulfonic acid or salt thereof according to claim 1 , wherein M is Na or K. 8 : A salt of a sulfonic acid according to claim 1 , of the formula: where n=11. 9 : A mixture of a plurality of sulfonic acids or salts thereof according to claim 1 . 10 : The mixture according to claim 9 , the sulfonic acids or salts thereof differing only in the number n of AO groups. 11 : An aqueous solution comprising a salt of the sulfonic acid according to claim 1 or a mixture of salts thereof. 12 : An electrolyte comprising (A) a sulfonic acid salt according to claim 1 , (B) at least one metal salt, and (C) optionally at least one metal deposition component other than (A) and (B). 13 : A process for preparing a sulfonic acid or salt thereof according to claim 1 , comprising: (a) reacting a compound of the formula R—O-(AO) n+1 —H with phosgene to give a compound R—O-(AO) n —CH 2 —CH 2 —Cl, and (b) reacting the compound R—O-(AO) n —CH 2 —CH 2 —Cl with MHSO 3 to give a compound of the formula (I). 14 : A method of using a salt of sulfonic acid according to claim 1 or a mixture of salts thereof in electrochemical deposition of metal. 15 : A method of using a salt of sulfonic acid according to claim 1 or a mixture of salts thereof as a brightness improver.
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