Substrate Processing Method, Apparatus, and System
US-2024363405-A1 · Oct 31, 2024 · US
US2018090300A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2018090300-A1 |
| Application number | US-201615277774-A |
| Country | US |
| Kind code | A1 |
| Filing date | Sep 27, 2016 |
| Priority date | Sep 27, 2016 |
| Publication date | Mar 29, 2018 |
| Grant date | — |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
The present disclosure generally relates to a gas distribution plate for ensuring deposition uniformity. The gas distribution plate has multiple concave portions on the downstream side to ensure uniform deposition in corner regions of the processing chamber.
Opening claim text (preview).
What is claimed is: 1 . A gas distribution plate, comprising: a diffuser body having an upstream surface, a downstream surface, four sides and four corners, the diffuser body having a plurality of gas passages extending from the upstream surface to the downstream surface, each gas passage includes a hollow cathode cavity: a center hollow cathode cavity is disposed near the center of the diffuser body; a corner hollow cathode cavity is disposed near the corner of the diffuser body, the corner hollow cathode cavity is larger than the center hollow cathode cavity; a first hollow cathode cavity is disposed at a location between the center hollow cathode cavity and the corner hollow cathode cavity, the first hollow cathode cavity is greater in size than the center hollow cathode cavity and less in size than the corner hollow cathode cavity; and a second hollow cathode cavity is disposed at a location between the corner hollow cathode cavity and the first hollow cathode cavity, the second hollow cathode cavity is less in size than the corner hollow cathode cavity and less in size than the first hollow cathode cavity. 2 . The gas distribution plate of claim 1 , wherein the diffuser body is anodized. 3 . The gas distribution plate of claim 1 , wherein: a second corner hollow cathode cavity is disposed near another corner, the second corner hollow cathode cavity is larger than the center hollow cathode cavity; a third hollow cathode cavity is disposed at a location between the center hollow cathode cavity and the second corner hollow cathode cavity, the third hollow cathode cavity is greater in size than the center hollow cathode cavity and less in size than the second corner hollow cathode cavity; and a fourth hollow cathode cavity is disposed at a location between the second corner hollow cathode cavity and the third hollow cathode cavity, the fourth hollow cathode cavity is less in size than the second corner hollow cathode cavity and less in size than the third hollow cathode cavity. 4 . The gas distribution plate of claim 1 , wherein the downstream surface has a plurality of concave portions. 5 . The gas distribution plate of claim 4 , wherein there are three concave portions. 6 . A gas distribution plate, comprising: a diffuser body having an upstream surface, a downstream surface, four sides and four corners, the diffuser body having a plurality of gas passages extending from the upstream surface to the downstream surface, each gas passage includes a hollow cathode cavity: a center hollow cathode cavity is disposed near the center of the diffuser body; a side hollow cathode cavity is disposed near the side of the diffuser body, the side hollow cathode cavity is larger than the center hollow cathode cavity; a first hollow cathode cavity is disposed at a location between the center hollow cathode cavity and the side hollow cathode cavity, the first hollow cathode cavity is greater in size than the center hollow cathode cavity and less in size than the side hollow cathode cavity; and a second hollow cathode cavity is disposed at a location between the side hollow cathode cavity and the first hollow cathode cavity, the second hollow cathode cavity is less in size than the side hollow cathode cavity and less in size than the first hollow cathode cavity. 7 . The gas distribution plate of claim 6 , wherein the diffuser body is anodized. 8 . The gas distribution plate of claim 6 , wherein: a second side hollow cathode cavity is disposed near another side, the second side hollow cathode cavity is larger than the center hollow cathode cavity; a third hollow cathode cavity is disposed at a location between the center hollow cathode cavity and the second side hollow cathode cavity, the third hollow cathode cavity is greater in size than the center hollow cathode cavity and less in size than the second side hollow cathode cavity; and a fourth hollow cathode cavity is disposed at a location between the second side hollow cathode cavity and the third hollow cathode cavity, the fourth hollow cathode cavity is less in size than the second side hollow cathode cavity and less in size than the third hollow cathode cavity. 9 . The gas distribution plate of claim 8 , wherein: a corner hollow cathode cavity is disposed near the corner of the diffuser body, the corner hollow cathode cavity is larger than the center hollow cathode cavity; a fifth hollow cathode cavity is disposed at a location between the center hollow cathode cavity and the corner hollow cathode cavity, the fifth hollow cathode cavity is greater in size than the center hollow cathode cavity and less in size than the corner hollow cathode cavity; and a sixth hollow cathode cavity is disposed at a location between the corner hollow cathode cavity and the fifth hollow cathode cavity, the sixth hollow cathode cavity is less in size than the corner hollow cathode cavity and less in size than the fifth hollow cathode cavity. 10 . The gas distribution plate of claim 9 , wherein: a second corner hollow cathode cavity is disposed near another corner, the second corner hollow cathode cavity is larger than the center hollow cathode cavity; a seventh hollow cathode cavity is disposed at a location between the center hollow cathode cavity and the second corner hollow cathode cavity, the seventh hollow cathode cavity is greater in size than the center hollow cathode cavity and less in size than the second corner hollow cathode cavity; and an eighth hollow cathode cavity is disposed at a location between the second corner hollow cathode cavity and the seventh hollow cathode cavity, the eighth hollow cathode cavity is less in size than the second corner hollow cathode cavity and less in size than the seventh hollow cathode cavity. 11 . The gas distribution plate of claim 6 , wherein the downstream surface has a plurality of concave portions. 12 . The gas distribution plate of claim 11 , wherein there are three concave portions. 13 . The gas distribution plate of claim 6 , wherein: a corner hollow cathode cavity is disposed near the corner of the diffuser body, the corner hollow cathode cavity is larger than the center hollow cathode cavity; a third hollow cathode cavity is disposed at a location between the center hollow cathode cavity and the corner hollow cathode cavity, the third hollow cathode cavity is greater in size than the center hollow cathode cavity and less in size than the corner hollow cathode cavity; and a fourth hollow cathode cavity is disposed at a location between the corner hollow cathode cavity and the third hollow cathode cavity, the fourth hollow cathode cavity is less in size than the corner hollow cathode cavity and less in size than the third hollow cathode cavity. 14 . A plasma processing chamber, comprising: a chamber body; a substrate support disposed within the chamber body; and a gas distribution plate disposed within the chamber body and facing the substrate support, the gas distribution plate comprising: a diffuser body having an upstream surface, a downstream surface, four sides and four corners, the diffuser body having a plurality of gas passages extending from the upstream surface to the downstream surface, each gas passage includes a hollow cathode cavity: a center hollow cathode cavity is disposed near the center of the diffuser body; a comet hollow cathode cavity is disposed near the corner of the diffuser body, the corner hollow cathode cavity is larger than the center hollow cathode cavity; a first hollow cathode cavity is disposed at a location between the center hollow cathode cavity and the corner hollo
Gas nozzles · CPC title
Hollow cathodes · CPC title
uniformity · CPC title
CVD [Chemical Vapor Deposition] · CPC title
Gas supply means · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.