Click-chemistry compatible structures, click-chemistry functionalized structures, and materials and methods for making the same

US2018059540A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2018059540-A1
Application numberUS-201615253640-A
CountryUS
Kind codeA1
Filing dateAug 31, 2016
Priority dateAug 31, 2016
Publication dateMar 1, 2018
Grant date

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

According to several embodiments, a composition of matter includes: a three-dimensional structure comprising photo polymerized molecules. At least some of the photo polymerized molecules further comprise one or more protected click-chemistry compatible functional groups; and at least portions of one or more surfaces of the three-dimensional structure are functionalized with one or more of the protected click-chemistry compatible functional groups. An additive manufacturing resin suitable for fabricating a click-chemistry compatible composition of matter includes: a photo polymerizable compound; and a click-chemistry compatible compound. A method of forming an additive manufacturing resin suitable for fabricating a click-chemistry compatible composition of matter includes: reacting a compound comprising a terminal alkyne group or a terminal azide group with a protecting reagent to form a protected reactive diluent precursor, reacting the precursor with a compound to form a protected reactive diluent; and mixing the protected reactive diluent with a photo polymerizable compound.

First claim

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What is claimed is: 1 . A composition of matter, comprising: a three-dimensional structure comprising photo polymerized molecules; wherein at least some of the photo polymerized molecules further comprise one or more protected click-chemistry compatible functional groups; and wherein at least portions of one or more surfaces of the three-dimensional structure are functionalized with one or more of the protected click-chemistry compatible functional groups. 2 . The composition of matter as recited in claim 1 , wherein the one or more protected click-chemistry compatible functional groups are selected from a group consisting of: an alkyne coupled to a protecting group and an azide coupled to the protecting group; and wherein the protecting group is selected from a group consisting of: a trimethylsilyl, a triethylsilyl, a t-butyl dimethylsilyl, a triisopropylsilyl, and a 2-(2-hydroxypropyl)alkyne. 3 . The composition of matter as recited in claim 1 , wherein the one or more click-chemistry compatible functional groups are deprotected. 4 . The composition of matter as recited in claim 1 , wherein the three-dimensional structure is structurally characterized by features having a feature size on a scale of several hundred nanometers to several millimeters. 5 . An additive manufacturing resin suitable for fabricating a click-chemistry compatible composition of matter, the resin comprising: a photo polymerizable compound; and a click-chemistry compatible compound. 6 . The additive manufacturing resin as recited in claim 5 , the photo polymerizable compound comprising a functional group selected from a group consisting of: acrylates, epoxides, and thiol-enes. 7 . The additive manufacturing resin as recited in claim 5 , the click-chemistry compatible compound comprising a functional group selected from a group consisting of: acrylates, epoxides, and thiol-enes. 8 . The additive manufacturing resin as recited in claim 5 , the click-chemistry compatible compound comprising a terminal alkyne group or a terminal azide group. 9 . The additive manufacturing resin as recited in claim 8 , wherein the click-chemistry compatible compound comprises a protecting group functionalized to the terminal alkyne group or the terminal azide group; and wherein the protecting group is selected from a group consisting of: a trimethylsilyl, a triethylsilyl, a t-butyl dimethylsilyl, a triisopropylsilyl, and a 2-(2-hydroxypropyl)alkyne. 10 . The additive manufacturing resin as recited in claim 5 , wherein the click-chemistry compatible compound is a monomer. 11 . A method of forming an additive manufacturing resin suitable for fabricating a click-chemistry compatible composition of matter, the method comprising: reacting a compound comprising a terminal alkyne group or a terminal azide group with a protecting reagent to form a protected reactive diluent precursor, the precursor comprising the terminal alkyne group or the terminal azide group; reacting the precursor with a compound comprising a photo polymerizable group to form a protected reactive diluent; and mixing the protected reactive diluent with a photo polymerizable compound to form the additive manufacturing resin. 12 . The method as recited in claim 11 , wherein the photo polymerizable compound comprises a polyethylene-glycol backbone functionalized with at least one photo polymerizable moiety selected from a group consisting of: acrylates, epoxides, and thiol-enes. 13 . The method as recited in claim 11 , wherein the photo polymerizable compound comprises a hexanediol backbone functionalized with at least one photo polymerizable moiety selected from a group consisting of: acrylates, epoxides, and thiol-enes. 14 . The method as recited in claim 11 , wherein the protecting reagent comprises a protecting group selected from a group consisting of: a trimethylsilyl, a triethylsilyl, a t-butyl dimethylsilyl, a triisopropylsilyl, and a 2-(2-hydroxypropyl)alkyne. 15 . The method as recited in claim 11 , wherein reacting the compound comprising the terminal alkyne group or a terminal azide group with the protecting reagent attaches a protecting group to the terminal alkyne group or the terminal azide group. 16 . The method as recited in claim 11 , wherein reacting the compound comprising the terminal alkyne group or the terminal azide group with the protecting reagent comprises: reacting the compound comprising the terminal alkyne group or the terminal azide group with an organolithium reagent; and treating, with an acid, a product of reacting the compound comprising the terminal alkyne group or the terminal azide group with the organolithium reagent. 17 . The method as recited in claim 16 , wherein the organolithium reagent comprises n-butyllithium; and wherein the acid comprises hydrochloric acid. 18 . The method as recited in claim 11 , wherein the compound comprising the photo polymerizable group is an acryloyl halide reagent. 19 . The method as recited in claim 11 , wherein the compound comprising the photo polymerizable group is selected from a group consisting of acryloyl chloride and 2-methyl-2-propenoyl chloride. 20 . The method as recited in claim 11 , wherein reacting the precursor with the compound comprising the photo polymerizable group is performed in the presence of a base.

Assignees

Inventors

Classifications

  • Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

  • Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) · CPC title

  • Azides (G03F7/075 takes precedence) · CPC title

  • Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds (G03F7/075 takes precedence) · CPC title

  • Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds (G03F7/0752 takes precedence) · CPC title

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What does patent US2018059540A1 cover?
According to several embodiments, a composition of matter includes: a three-dimensional structure comprising photo polymerized molecules. At least some of the photo polymerized molecules further comprise one or more protected click-chemistry compatible functional groups; and at least portions of one or more surfaces of the three-dimensional structure are functionalized with one or more of the p…
Who is the assignee on this patent?
L Livermore Nat Security Llc
What technology area does this patent fall under?
Primary CPC classification G03F7/0037. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Mar 01 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).