Method For Adjusting A Projection Objective

Patent metadata

Field	Value
Publication number	US-2018024440-A1
Application number	US-201715648852-A
Country	US
Kind code	A1
Filing date	Jul 13, 2017
Priority date	Apr 9, 2004
Publication date	Jan 25, 2018
Grant date	—

Abstract

A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an absolute value at each of a plurality of field points in an image plane of the projection objective. At least one of the optical elements is adjusted such that for each of the parameters in the set, the field maximum of its absolute value is minimized.

First claim

What is claimed is:

1 - 19 . (canceled)

20 . A method for adjusting a projection exposure machine used for microlithography comprising an illumination device for providing illumination and a projection objective comprising a plurality of optical elements for projecting an image of a reticle onto a substrate at an image plane, said method comprising:
specifying a field maximum value for a parameter indicative of the performance of the projection exposure machine, the parameter being a lithographic process parameter or an image-forming parameter of the projection objective; determining initial values for the parameter at each of a plurality of different points in a field at the image plane, wherein an absolute value of the initial value for at least one of the field points exceeds the specified field maximum value; and adjusting the reticle and/or at least one of the optical elements of the projection objective such that the largest absolute value for every one of the different points in the field is less than the specified field maximum value.

21 . The method of claim 20 , wherein the field at the image plane is defined by a scanner slit.

22 . The method of claim 21 , wherein the plurality of points lie along a line oriented in a scanning direction of the projection exposure machine.

23 . The method of claim 20 , wherein field maximum values are specified for more than one parameter indicative of the performance of the projection exposure machine.

24 . The method of claim 20 , wherein the lithographic process parameter is related to the image-forming parameter.

25 . The method of claim 20 , wherein the image-forming parameter of the projection objective is selected from the group consisting of: individual Zernike coefficients describing wave aberrations of an objective pupil of the projection objective; a linear combinations of Zernike coefficients; and an average of Zernike coefficients over a plurality of the different points.

26 . The method of claim 20 , wherein the lithographic process parameter is selected from the group consisting of a horizontal offset of a structure from its ideal position and a deviation from an ideal line width.

27 . The method of claim 20 wherein parameter describes a centrable aberration, and the adjusting comprises tilting the reticle of the projection objective to adjust for the centrable aberration.

28 . The method of claim 27 , wherein the adjusting comprises at least one of the following steps:
(i) displacing at least one of the optical elements in a direction perpendicular to an optical axis of the projection objective, and (ii) tilting at least one of the optical elements in a direction perpendicular to said optical axis of the projection objective.

29 . The method of claim 27 , wherein the parameter describes a tunable aberration, and the adjusting comprises adjusting at least one of the optical elements to adjust for the tunable aberration and the centrable aberration jointly.

30 . The method of claim 29 , wherein the adjusting comprises at least one of the following steps:
(i) displacing at least one of the optical elements in a direction along the optical axis of the projection objective; (ii) changing a wavelength of illumination of the projection exposure machine; (iii) changing a temperature within the projection exposure machine; (iv) changing an air pressure within the projection exposure machine, and (v) changing a composition of a purge gas surrounding the optical elements.

31 . The method of claim 20 , further comprising applying a distortion optimization dependent upon an illumination setting of the projection exposure machine.

32 . The method of claim 20 , wherein the adjusting is performed according to a nonlinear method.

33 . The method of claim 32 , wherein the nonlinear method comprises a nonlinear optimization of the parameter values.

34 . The method of claim 33 , wherein the nonlinear optimization comprises a nonlinear min-max optimization.

35 . A method for adjusting a projection objective used for microlithography comprising a plurality of optical elements for projecting an image of a reticle onto a substrate at an image plane, said method comprising:
specifying a field maximum value for a parameter indicative of the performance of the projection objective, the parameter being a lithographic process parameter or an image-forming parameter of the projection objective; determining initial values for the parameter at each of a plurality of different points in a field at the image plane, wherein an absolute value of the initial value for at least one of the field points exceeds the specified field maximum value; and adjusting at least one of the optical elements of the projection objective such that the largest absolute value for every one of the different points in the field is less than the specified field maximum value.

36 . The method of claim 35 , wherein the lithographic process parameter is related to the image-forming parameter.

37 . The method of claim 35 , wherein the image-forming parameter of the projection objective is selected from the group consisting of: individual Zernike coefficients describing wave aberrations of an objective pupil of the projection objective; a linear combinations of Zernike coefficients; and an average of Zernike coefficients over a plurality of the different points.

38 . The method of claim 35 , wherein the lithographic process parameter is selected from the group consisting of a horizontal offset of a structure from its ideal position and a deviation from an ideal line width.

39 . The method of claim 35 , wherein the adjusting is performed according to a nonlinear method.

40 . The method of claim 39 , wherein the nonlinear method comprises a nonlinear optimization of the parameter values.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Emer Wolfgang

Classifications

• G03F7/70191 Primary

  Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like · CPC title

• G03F7/70216

  Mask projection systems · CPC title

• G03B27/52 Primary

  Details · CPC title