Force detection device

Patent metadata

Field	Value
Publication number	US-2018024014-A1
Application number	US-201615546729-A
Country	US
Kind code	A1
Filing date	Apr 4, 2016
Priority date	Apr 6, 2015
Publication date	Jan 25, 2018
Grant date	—

Abstract

A force detection device includes: a substrate; and a force transmission block. The substrate includes: a mesa gauge arranged on a principal plane of the substrate and providing a bridge circuit; a connection region arranged on the principal plane; and a sealing portion surrounding all around the mesa gauge and connected to the force transmission block. The mesa gauge includes: a first mesa gauge extending in a first direction; and a second mesa gauge extending in a second direction and spaced apart from the first mesa gauge. The connection region electrically connects the one end of the first mesa gauge and the one end of the second mesa gauge.

First claim

1 . A force detection device comprising:
a substrate; and a force transmission block, wherein: the substrate includes: a mesa gauge arranged on a principal plane of the substrate and providing a bridge circuit; a connection region arranged on the principal plane and doped with an impurity; and a sealing portion arranged on the principal plane, surrounding all around the mesa gauge, and connected to the force transmission block; the mesa gauge includes: a first mesa gauge extending in a first direction; and a second mesa gauge extending in a second direction different from the first direction and spaced apart from the first mesa gauge; and the connection region is disposed between one end of the first mesa gauge and one end of the second mesa gauge, and electrically connects the one end of the first mesa gauge and the one end of the second mesa gauge.

2 . The force detection device according to claim 1 , wherein:
the substrate further includes a wiring arranged on the principal plane and doped with an impurity; the connection region includes a narrow portion narrowed between the one end of the first mesa gauge and the one end of the second mesa gauge; and the wiring is connected to the narrow portion.

3 . The force detection device according to claim 1 , wherein:
the first direction of the substrate is a direction in which an electric resistance varies largely with stress; the second direction of the substrate is a direction orthogonal to the first direction, in which the electrical resistance varies slightly with stress; the first mesa gauge has a first high-sensitive mesa gauge and a second high-sensitive mesa gauge; the second mesa gauge has a first low-sensitive mesa gauge and a second low-sensitive mesa gauge; and the first high-sensitive mesa gauge and the second high-sensitive mesa gauge are arranged point-symmetric with respect to a center of an inner region inside of the sealing portion.

4 . The force detection device according to claim 3 , wherein:
the inner region has a rectangular shape; the inner region has a pair of opposing sides extending in the first direction and another pair of opposing sides extending in the second direction; and the first high-sensitive mesa gauge and the second high-sensitive mesa gauge are arranged at positions of the inner region, at which the inner region is divided into three equal segments in the second direction, and arranged in a center of the inner region in the first direction.

5 . The force detection device according to claim 1 , wherein:
the force transmission block is connected to the principal plane of the substrate.

6 . The force detection device according to claim 3 , wherein:
the electric resistance is an electric resistance of the mesa gauge; an electric resistance of the first mesa gauge varies largely with stress; and an electric resistance of the second mesa gauges varies slightly with stress.

7 . A force detection device comprising:
a mesa gauge; and a fixed resistor connected in parallel to the mesa gauge, wherein: a force is detected by using a variation of a combined resistance of the mesa gauge and the fixed resistor.

8 . The force detection device according to claim 7 , wherein:
an electric resistance of the fixed resistor is greater than an initial electric resistance of the mesa gauge under no stress.

9 . The force detection device according to claim , wherein:
the mesa gauge is arranged on a principal plane of a semiconductor substrate in a stepped-mesa shape; and the fixed resistor is also provided to the principal plane of the semiconductor substrate in a mesa-stepwise shape.

10 . The force detection device according to claim 9 , further comprising:
a force transmission block, wherein: the force transmission block contacts with a top surface of the mesa gauge and does not contact with a top surface of the fixed resistor.

11 . The force detection device according to claim 9 , wherein:
the mesa gauge extends linearly along one direction; and the fixed resistor includes a portion that extends and folds back along the one direction.

12 . The force detection device according to claim 8 , wherein:
the initial electric resistance is an initial electric resistance of the mesa gauge.

Assignees

• Denso Corp

Inventors

• Taguchi Rie
• Mizuno Kentaro
• Katsumata Takashi

Classifications

• H01C10/10 Primary

  adjustable by mechanical pressure or force · CPC title

• G01L9/0052

  of piezoresistive elements (circuits therefor G01L9/06) · CPC title

• G01L1/2275

  for non linearity · CPC title

• G01L1/205

  using distributed sensing elements · CPC title

• G01L1/18 Primary

  using properties of piezo-resistive materials, i.e. materials of which the ohmic resistance varies according to changes in magnitude or direction of force applied to the material · CPC title