Processing of anisotropic permanent magnet without magnetic field
US-11948733-B2 · Apr 2, 2024 · US
US2017330657A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2017330657-A1 |
| Application number | US-201715664647-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jul 31, 2017 |
| Priority date | Jul 26, 2013 |
| Publication date | Nov 16, 2017 |
| Grant date | — |
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Nanocomposite magnetic materials, methods of manufacturing nanocomposite magnetic materials, and magnetic devices and systems using these nanocomposite magnetic materials are described. A nanocomposite magnetic material can be formed using an electro-infiltration process where nanomaterials (synthesized with tailored size, shape, magnetic properties, and surface chemistries) are infiltrated by electroplated magnetic metals after consolidating the nanomaterials into porous microstructures on planar substrates. The nanomaterials may be considered the inclusion phase, and the magnetic metals may be considered the matrix phase of the multi-phase nanocomposite.
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What is claimed is: 1 . A method of forming a nanocomposite magnetic material, comprising: consolidating synthesized nanomaterials of at least one inclusion phase into a porous microstructure; and performing an electro-infiltration process to fill voids of the porous microstructure with a magnetic metal matrix phase. 2 . The method of claim 1 , wherein performing the electro-infiltration process comprises electroplating the magnetic metal matrix phase within the voids of the porous microstructure. 3 . The method of claim 1 , wherein consolidating synthesized nanomaterials comprises using at least one magnet or at least one external magnetic field to direct the synthesized particles. 4 . The method of claim 1 , wherein consolidating synthesized nanomaterials comprises using an applied electric bias to generate an electric field to direct the synthesized particles. 5 . The method of claim 1 , further comprising: selecting the synthesized nanomaterials according to at least one of size, shape, surface coating and magnetic properties; forming a mold on a planar substrate, wherein the synthesized nanomaterials are consolidated in the mold; removing the mold after performing the electro-infiltration process leaving bound consolidated nanomaterials on the planar substrate; and removing the bound consolidated nanomaterials from the planar substrate, wherein the synthesized nanomaterials comprise at least one shape selected from a group consisting of spherical, nanoflake, nanodisc, nanorod, and nanowire. 6 . The method of claim 1 , wherein performing the electro-infiltration process comprises electroplating the metal magnetic matrix phase within the voids of the porous microstructure from a bottom surface to a top surface of the porous microstructure. 7 . The method of claim 1 , wherein performing the electro-infiltration process comprises electroless plating of the metal magnetic matrix phase within the voids of the porous microstructure. 8 . A method comprising: performing semiconductor processing to fabricate at least one semiconductor device on a semiconductor wafer; and forming a structure comprising magnetic material on the semiconductor wafer using a nanocomposite magnetic material, the nanocomposite magnetic material formed by consolidating synthesized nanomaterials of at least one inclusion phase into a porous microstructure; and performing an electro-infiltration process to fill voids of the porous microstructure with a magnetic metal matrix phase, wherein the nanocomposite magnetic material comprises a plurality of bound consolidated nanomaterials of the at least one inclusion phase and the magnetic metal matrix phase. 9 . The method of claim 8 , wherein performing the electro-infiltration process comprises electroplating the magnetic metal matrix phase within the voids of the porous microstructure. 10 . The method of claim 8 , wherein performing the electro-infiltration process comprises electroplating the metal magnetic matrix phase within the voids of the porous microstructure from a bottom surface to a top surface of the porous microstructure. 11 . The method of claim 8 , wherein performing the electro-infiltration process comprises electroless plating of the metal magnetic matrix phase within the voids of the porous microstructure. 12 . The method of claim 8 , wherein the plurality of bound consolidated nanomaterials are a heterogeneous mixture of different sizes, different shapes, or both. 13 . The method of claim 8 , wherein the plurality of bound consolidated nanomaterials have a same size and/or shape. 14 . The method of claim 8 , wherein the plurality of bound consolidated nanomaterials comprises: a first plurality of bound consolidated nanomaterials of a first inclusion phase and a first magnetic metal matrix phase; and a second plurality of bound consolidated nanomaterials of a second inclusion phase and a second magnetic metal matrix phase, wherein at least one of the first inclusion phase and the first magnetic metal phase of the first plurality of bound consolidated nanomaterials is different than the second inclusion phase and the second magnetic metal phase of the second plurality of bound consolidated nanomaterials.
Electrolytic deposition, i.e. electroplating; Electroless plating · CPC title
metallic substrate · CPC title
Impregnating or encapsulating (insulating of windings H01F41/12) · CPC title
by powder metallurgy · CPC title
Coated nanoparticles, e.g. nanoparticles coated with organic surfactant · CPC title
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