Substrate liquid processing method, substrate liquid processing apparatus, and computer-readable storage medium that stores substrate liquid processing program

Patent metadata

Field	Value
Publication number	US-2017316961-A1
Application number	US-201515518094-A
Country	US
Kind code	A1
Filing date	Oct 20, 2015
Priority date	Oct 21, 2014
Publication date	Nov 2, 2017
Grant date	—

Abstract

Disclosed is a substrate liquid processing method including: performing a liquid processing step of liquid-processing a substrate with a processing liquid, a rinse processing step of rinsing the liquid-processed substrate with a rinse liquid, and a water-repellency processing step of imparting water-repellency to the rinsed substrate with a water-repellent liquid; then, performing a cleaning processing step of cleaning the water-repellency-imparted substrate with a functional liquid; then, performing an alcohol processing step of bringing the cleaned substrate in contact with alcohol; and then, performing a drying processing step of drying the substrate.

First claim

1 . A substrate liquid processing method comprising:
performing a liquid processing step of liquid-processing a substrate with a processing liquid, a rinse processing step of rinsing the liquid-processed substrate with a rinse liquid, and a water-repellency processing step of imparting water-repellency to the rinsed substrate with a water-repellent liquid; then, performing a cleaning processing step of cleaning the water-repellency-imparted substrate with a functional liquid; then, performing an alcohol processing step of bringing the cleaned substrate in contact with alcohol; and then, performing a drying processing step of drying the substrate.

2 . The substrate liquid processing method of claim 1 , wherein a deionized water processing step of rinsing the substrate with deionized water is performed between the alcohol processing step and the drying processing step.

3 . The substrate liquid processing method of claim 1 , wherein the functional water is any one of alkaline electrolytic ionized water, ammonia water, hydrogen water, and ozone water.

4 . The substrate liquid processing method of claim 1 , wherein the functional water and the alcohol are supplied from the same nozzle.

5 . The substrate liquid processing method of claim 1 , wherein the functional water and the alcohol are supplied to the substrate by changing a mixing ratio thereof stepwise or continuously at a time of transition from the cleaning processing step to the alcohol processing step.

6 . The substrate liquid processing method of claim 1 , wherein the alcohol processing step includes steps of: forming a streak-like flow of the functional water; and supplying the alcohol to a position closer to a central side of the substrate than the streak-like flow.

7 . The substrate liquid processing method of claim 6 , wherein the step of forming the streak-like flow of the functional water includes a step of moving a supply position of the functional water from the central side of the substrate to an outer peripheral side.

8 . A substrate liquid processing apparatus comprising:
a substrate holding unit that holds a substrate; a processing liquid supply unit that supplies a processing liquid to the substrate; a rinse liquid supply unit that supplies a rinse liquid to the substrate liquid-processed with the processing liquid; a water-repellent liquid supply unit that supplies a water-repellent liquid to the substrate rinsed with the rinse liquid; a functional water supply unit that supplies a functional water to the substrate imparted with water-repellency with the water-repellent liquid; an alcohol supply unit that supplies alcohol to the substrate cleaned with the functional water; and a controller that performs a control to supply the water-repellent liquid from the water-repellent liquid supply unit to the substrate rinsed with the rinse liquid, supply the functional water from the functional water supply unit to the substrate, supply the alcohol from the alcohol supply unit to the substrate, and then, dry the substrate.

9 . The substrate liquid processing apparatus of claim 8 , wherein the controller performs a control to supply the rinse liquid to the substrate after supplying the alcohol from the alcohol supply unit to the substrate.

10 . The substrate liquid processing apparatus of claim 8 , wherein the functional water and the alcohol are supplied to the substrate from the same nozzle.

11 . The substrate liquid processing apparatus of claim 8 , wherein the functional water and the alcohol are supplied to the substrate by changing a mixing ratio thereof stepwise or continuously at a time of transition from the supply of the functional water to the supply of the alcohol.

12 . The substrate liquid processing apparatus of claim 8 , wherein, at the time of transition from supply of the functional water to supply of the alcohol, a streak-like flow of the functional water is formed on the substrate and the alcohol is supplied to a position closer to a central side of the substrate than the streak-like flow.

13 . The substrate liquid processing apparatus of claim 12 , wherein the supply position of the functional water forming the streak-like flow is moved from the central side of the substrate to an outer peripheral side.

14 . A non-transitory computer-readable storage medium that stores a substrate liquid processing program that, when executed, to cause a computer to perform a processing on a substrate using a substrate liquid processing apparatus including: a substrate holding unit that holds a substrate; a processing liquid supply unit that supplies a processing liquid to the substrate; a rinse liquid supply unit that supplies a rinse liquid to the substrate liquid-processed with the processing liquid; a water-repellent liquid supply unit that supplies a water-repellent liquid to the substrate rinsed with the rinse liquid; a functional water supply unit that supplies a functional water to the substrate imparted with water-repellency with the water-repellent liquid; an alcohol supply unit that supplies alcohol to the substrate cleaned with the functional water; and a controller that controls the units,
wherein a control is performed to supply the water-repellent liquid from the water-repellent liquid supply unit to the substrate rinsed with the rinse liquid, supply the functional water from the functional water supply unit to the substrate, supply the alcohol from the alcohol supply unit to the substrate, and then, dry the substrate.

Assignees

• Tokyo Electron Ltd

Inventors

• Nakamori Mitsunori
• Nonaka Jun

Classifications

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/0608

  of substrates stored in a container, a magazine, a carrier, a boat or the like · CPC title

• H10P52/00

  Grinding, lapping or polishing of wafers, substrates or parts of devices · CPC title

• H10P72/0414 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• B08B3/00

  Cleaning by methods involving the use or presence of liquid or steam (B08B9/00 takes precedence) · CPC title