Angled lift jetting

Patent metadata

Field	Value
Publication number	US-2017306495-A1
Application number	US-201715644857-A
Country	US
Kind code	A1
Filing date	Jul 10, 2017
Priority date	Jan 21, 2015
Publication date	Oct 26, 2017
Grant date	—

Abstract

An apparatus for material deposition on an acceptor surface includes a transparent donor substrate having opposing first and second surfaces, such that at least a part of the second surface is not parallel to the acceptor surface, and including a donor film on the second surface. The apparatus additionally includes an optical assembly, which is configured to direct a beam of radiation to pass through the first surface of the donor substrate and impinge on the donor film at a location on the part of the second surface that is not parallel to the acceptor surface, so as to induce ejection of droplets of molten material from the donor film onto the acceptor surface.

First claim

1 . Apparatus for material deposition on an acceptor surface, comprising:
a transparent donor substrate having opposing first and second surfaces, such that at least a part of the second surface is not parallel to the acceptor surface, and comprising a donor film on the second surface; and an optical assembly, which is configured to direct a beam of radiation to pass through the first surface of the donor substrate and impinge on the donor film at a location on the part of the second surface that is not parallel to the acceptor surface, so as to induce ejection of droplets of molten material from the donor film onto the acceptor surface.

2 . The apparatus according to claim 1 , wherein the second surface comprises a periodic structure.

3 . The apparatus according to claim 1 , wherein the second surface comprises a multi-faceted structure.

4 . The apparatus according to claim 3 , wherein the second surface comprises first and second facets oriented at opposing angles and coated with different respective donor films.

5 . The apparatus according to claim 3 , wherein the second surface comprises first and second facets and wherein only the first facet is coated with the donor film.

6 . Apparatus for material deposition, comprising:
a transparent donor substrate having opposing first and second surfaces, such that at least a part of the second surface is non-planar, and comprising a donor film on the non-planar part of the second surface; and an optical assembly, which is configured to direct a beam of radiation to pass through the first surface of the donor substrate and impinge on the donor film at a location on the non-planar part of the second surface, so as to induce ejection of droplets of molten material from the donor film onto an acceptor surface.

7 . The apparatus according to claim 6 , wherein the second surface comprises a periodic structure.

8 . The apparatus according to claim 6 , wherein the second surface comprises a curved structure.

9 . The apparatus according to claim 6 , wherein the second surface comprises a multi-faceted structure.

10 . The apparatus according to claim 9 , wherein the second surface comprises first and second facets oriented at opposing angles and coated with different respective donor films.

11 . The apparatus according to claim 9 , wherein the second surface comprises first and second facets and wherein only the first facet is coated with the donor film.

12 . A method for material deposition, comprising:
providing a transparent donor substrate having opposing first and second surfaces and having first and second facets oriented at opposing angles on the second surface, and comprising a donor film on the first and second facets; positioning the donor substrate in proximity to an acceptor substrate, with the second surface facing toward the acceptor substrate; and directing a beam of radiation to pass through the first surface of the donor substrate and impinge on the donor film at a location selected responsively to the first and second facets of the second surface, so as to induce ejection of droplets of molten material from the donor film on the first and second facets onto the acceptor substrate.

13 . The method according to claim 12 , wherein the ejection of droplets of molten material from the donor film on the first and second facets is performed simultaneously.

14 . The method according to claim 12 , wherein the ejection of droplets of molten material from the donor film on the first and second facets is performed sequentially.

15 . A method for material deposition, comprising:
providing a transparent donor substrate, which has opposing first and second surfaces and has a donor film on the second surface; positioning the donor substrate in proximity to an acceptor surface of an acceptor substrate, with the second surface facing toward the acceptor substrate and oriented at an oblique angle relative to the acceptor surface; and directing a beam of radiation to pass through the first surface of the donor substrate and impinge on the donor film while the second surface is oriented at the oblique angle so as to induce ejection of droplets of molten material from the donor film onto the acceptor surface.

16 . The method according to claim 15 , wherein positioning the donor substrate comprises identifying a three-dimensional (3D) shape of a topographical feature on the acceptor surface, and orienting the donor substrate responsively to the 3D shape.

17 . The method according to claim 15 , wherein the second surface comprises a curved structure.

18 . The method according to claim 15 , wherein the second surface of the donor substrate comprises a multi-faceted structure.

19 . The method according to claim 18 , wherein the multi-faceted structure comprises first and second facets oriented at opposing angles and coated with the donor film.

20 . The method according to claim 19 , and comprising ejecting the droplets from the donor film of the first and second facets, onto the 3D shape, simultaneously.

21 . The method according to claim 19 , and comprising ejecting the droplets from the donor film of the first and second facets, onto the 3D shape, sequentially.

22 . The method according to claim 15 , wherein the second surface of the donor substrate comprises a periodic structure.

Assignees

• Orbotech Ltd

Inventors

• Kotler Zvi
• Zenou Michael

Classifications

• C23C14/225

  Oblique incidence of vaporised material on substrate · CPC title

• B23K2103/42

  Plastics other than composite materials · CPC title

• C23C14/048

  using irradiation by energy or particles · CPC title

• B23K26/0648 Primary

  comprising lenses · CPC title

• B23K2103/00

  Materials to be soldered, welded or cut · CPC title