Coating liquid for resist pattern coating

Patent metadata

Field	Value
Publication number	US-2017293227-A1
Application number	US-201515512802-A
Country	US
Kind code	A1
Filing date	Sep 18, 2015
Priority date	Sep 19, 2014
Publication date	Oct 12, 2017
Grant date	—

Abstract

There is provided a new coating liquid for resist pattern coating. A coating liquid for resist pattern coating comprising a component A that is a polymer including at least one hydroxy group or carboxy group; a component B that is a sulfonic acid of A-SO 3 H (where A is a linear or branched alkyl group or fluorinated alkyl group having a carbon atom number of 1 to 16, an aromatic group having at least one of the alkyl group or the fluorinated alkyl group as a substituent, or a C 4-16 alicyclic group optionally having a substituent); and a component C that is an organic solvent capable of dissolving the polymer and including ether or ketone compound of R 1 —O—R 2 and/or R 1 —C(═O)—R 2 (where R 1 is a linear, branched, or cyclic alkyl group or fluorinated alkyl group having a carbon atom number of 3 to 16; and R 2 is a linear, branched, or cyclic alkyl group or fluorinated alkyl group having a carbon atom number of 1 to 16), a method of forming a resist pattern using the coating liquid, and a method for forming a reverse pattern using the coating liquid.

First claim

1 . A coating liquid for resist pattern coating comprising:
a component A: a polymer including at least one hydroxy group or carboxy group; a component B: a sulfonic acid of A-SO 3 H (where A is a linear or branched alkyl group or fluorinated alkyl group having a carbon atom number of 1 to 16, an aromatic group having at least one of the alkyl group or the fluorinated alkyl group as a substituent, or a C 4-16 alicyclic group optionally having a substituent); and a component C: an organic solvent capable of dissolving the polymer and including a compound of R 1 —O—R 2 and/or R 1 —C(═O)—R 2 (where R 1 is a linear, branched, or cyclic alkyl group or fluorinated alkyl group having a carbon atom number of 3 to 16; and R 2 is a linear, branched, or cyclic alkyl group or fluorinated alkyl group having a carbon atom number of 1 to 16).

2 . The coating liquid for resist pattern coating according to claim 1 , wherein the polymer being the component A further includes a linear, branched, or cyclic alkyl group having a carbon atom number of 1 to 10 in which a halogen atom is optionally substituted for at least one hydrogen atom.

3 . The coating liquid for resist pattern coating according to claim 1 , wherein the polymer being the component A is a polymer having a structure unit of Formula (A) below with the proviso that the polymer having the structure unit of Formula (A) below includes at least one hydroxy group or carboxy group, or at least one hydroxy group or carboxy group and a linear or branched alkyl group having a carbon atom number of 1 to 10 in which a halogen atom is optionally substituted for at least one hydrogen atom:

(where R 0 is a hydrogen atom or methyl group;
L is a divalent aromatic group optionally having at least one substituent, —C(═O)—O— group or —C(═O)—NH— group, and a carbon atom of the —C(═O)—O— group or the —C(═O)—NH— group is bonded to the main chain of the polymer;
X is a hydrogen atom or a linear or branched alkyl group having a carbon atom number of 1 to 10 or an alkoxy group having a carbon atom number of 1 to 10, and a halogen atom or hydroxy group is optionally substituted for at least one hydrogen atom of the alkyl group).

4 . The coating liquid for resist pattern coating according to claim 3 , wherein
the polymer being the component A is a copolymer having at least two structure units of Formula (A), and the copolymer has: a structural unit of a divalent aromatic group optionally having at least one substituent as L; and a structure unit of —C(═O)—O— group and/or a structure unit of —C(═O)—NH— group as L.

5 . The coating liquid for resist pattern coating according to claim 3 , wherein the divalent aromatic group in L is phenylene group or naphthylene group.

6 . The coating liquid for resist pattern coating according to claim 1 , wherein the polymer being the component A is a polymer having a structure unit of any one of Formulas (1-1) to (1-4) below, or a polymer having a structure unit of any one of Formulas (1-1) to (1-4) below and optionally including a linear or branched alkyl group having a carbon atom number of 1 to 10 in which a halogen atom is optionally substituted for at least one hydrogen atom:

(where Ar 1 is a divalent, tetravalent, hexavalent, or octavalent organic group including at least one C 6-18 aromatic ring; Ar 2 is a divalent organic group including a C 6-18 aromatic ring bonded to Ar 1 through methylene group or a tertiary carbon atom, and at least one of the aromatic rings have hydroxy group and/or carboxy group as a substituent).

7 . The coating liquid for resist pattern coating according to claim 6 , wherein
the divalent, tetravalent, hexavalent, or octavalent organic group of Ar 1 is a group having bonded ends bonded to any two, four, six, or eight positions of aromatic rings in a compound of any one of Formulas (2-1) to (2-5) below, and Ar 2 is a divalent organic group of Formula (3-1) below, or a divalent organic group of Formula (3-2) below:

[where R 3 to R 14 , R 16 , and R 17 are each independently a linear, branched, or cyclic alkyl group having a carbon atom number of 1 to 10, a linear or branched alkoxy group having a carbon atom number of 1 to 9, a halogen atom, nitro group, cyano group, acetoxy group, methylthio group, or amino group; hydroxy group or a halogen atom is optionally substituted for at least one hydrogen atom of the alkyl group; a linear or branched alkyl group having a carbon atom number of 1 to 3 is optionally substituted for at least one hydrogen atom of the amino group; T 3 to T 14 , T 16 , and T 17 are each independently hydroxy group or carboxy group; T 15 is a hydrogen atom or methyl group; Q 1 and Q 2 are each independently a single bond, an oxygen atom, a sulfur atom, sulfonyl group, carbonyl group, imino group, a C 6-40 arylene group, or a linear, branched, or cyclic alkylene group having a carbon atom number of 1 to 10; a halogen atom is optionally substituted for at least one hydrogen atom of the alkylene group; m1 to m4 are each independently an integer of 0 to 2; r4, r5, and r8 to r14 are each independently an integer of 0 to 2; t4, t5, and t8 to t14 are each independently an integer of 0 to 2; r3, r6, r7, and r17 are each independently an integer of 0 to 8; t3, t6, t7, and t17 are each independently an integer of 0 to 8; r16 is an integer of 0 to 9; t16 is an integer of 0 to 9; and the sum of r3 and t3, the sum of r4 and t4, the sum of r5 and t5, the sum of r6 and t6, the sum of r7 and t7, the sum of r8 and t8, the sum of r9 and t9, the sum of r10 and t10, the sum of r11 and t11, the sum of r12 and t12, the sum of r13 and t13, the sum of r14 and t14, the sum of r16 and t16, and the sum of r17 and t17 are each independently an integer of 1 to 10].

8 . The coating liquid for resist pattern coating according to claim 6 , wherein the polymer being the component A has a weight average molecular weight of 1,000 to 20,000.

9 . The coating liquid for resist pattern coating according to claim 3 , wherein the polymer being the component A has a weight average molecular weight of 1,000 to 2,000.

10 . The coating liquid for resist pattern coating according to claim 1 , wherein the aromatic group of A in the formula of the sulfonic acid is phenyl group or naphthyl group.

11 . The coating liquid for resist pattern coating according to claim 10 , wherein
in the formula of the sulfonic acid, the group of A is a linear or branched alkyl group or fluorinated alkyl group having a carbon atom number of 4 to 12, or phenyl group having at least one of the alkyl group or the fluorinated alkyl group as a substituent, and the sulfonic acid has a content ratio of 0.5% by mass to 60% by mass relative to the polymer being the component A.

12 . The coating liquid for resist pattern coating according to claim 1 , including 1 ppm by mass to 1% by mass of water.

13 . A method for forming a resist pattern comprising the steps of:
forming a resist pattern on a substrate on which an underlayer film is formed; applying the coating liquid for resist pattern coating as claimed in claim 1 so that the resist pattern is coated with the coating liquid for resist pattern coating; heating the substrate onto which the coating liquid for resist pattern coating is applied at 50° C. to 130° C. to form a coated film on a surface of

Assignees

• Nissan Chemical Ind Ltd

Inventors

• Nishita Tokio
• Shigaki Shuhei
• Fujitani Noriaki
• Endo Takafumi
• Sakamoto Rikimaru

Classifications

• H10P76/405

  characterised by their composition, e.g. multilayer masks · CPC title

• H10P76/204

  of organic photoresist masks · CPC title

• H10P70/23

  during, before or after processing of insulating materials · CPC title

• H10P50/287

  by chemical means · CPC title

• H10P14/683

  carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC · CPC title