Dust collecting apparatus, substrate processing system, and method of manufacturing semiconductor device

Patent metadata

Field	Value
Publication number	US-2017250069-A1
Application number	US-201615239243-A
Country	US
Kind code	A1
Filing date	Aug 17, 2016
Priority date	Feb 25, 2016
Publication date	Aug 31, 2017
Grant date	—

Abstract

In one embodiment, a dust collecting apparatus includes a container configured to contain a fluid that includes particles to be collected. The apparatus further includes one or more sound sources configured to generate, in the container, a standing sound wave including at least one node to trap the particles in a vicinity of the node. The one or more sound sources are configured to generate the standing sound wave so that the node does not contact a wall face of the container or contacts a predetermined portion of the wall face of the container. The predetermined portion is formed of a member that prevents the particles from leaving from the node located in a vicinity of the predetermined portion.

First claim

1 . A dust collecting apparatus comprising:
a container configured to contain a fluid that includes particles to be collected; and one or more sound sources configured to generate, in the container, a standing sound wave including at least one node to trap the particles in a vicinity of the node, wherein the one or more sound sources are configured to generate the standing sound wave so that the node does not contact a wall face of the container or contacts a predetermined portion of the wall face of the container, and the predetermined portion is formed of a member that prevents the particles from leaving from the node located in a vicinity of the predetermined portion.

2 . The apparatus of claim 1 , wherein a shape of the node is a point, a closed curve, a closed surface, an open curve that includes an end portion on the predetermined portion, or an open surface that includes an end portion on the predetermined portion.

3 . The apparatus of claim 1 , wherein the container comprises an introduction port configured to introduce the fluid into the container, and a discharge port configured to discharge, from the container, the fluid in which the particles are concentrated or reduced by the trapping.

4 . The apparatus of claim 1 , wherein
the container comprises a pair of opposed first wall faces, a pair of opposed second wall faces, and a pair of opposed third wall faces, and the sound sources include at least one first sound source provided in a vicinity of the first wall faces, at least one second sound source provided in a vicinity of the second wall faces, and at least one third sound source provided in a vicinity of the third wall faces.

5 . The apparatus of claim 4 , wherein at least any one among one of the pair of first wall faces, one of the pair of second wall faces, and one of the pair of third wall faces is formed as a reflector that reflects a sound wave from the sound sources.

6 . The apparatus of claim 4 , wherein at least any one of the first, second and third sound sources is provided in a vicinity of both of the pair of first wall faces, both of the pair of second wall faces, or both of the pair of third wall faces.

7 . The apparatus of claim 1 , wherein
the container comprises a pair of opposed first wall faces, and a second wall face having a cylindrical shape, and the sound sources include at least one first sound source provided in a vicinity of the first wall faces, and at least one second sound source provided in a vicinity of the second wall face.

8 . The apparatus of claim 7 , wherein one of the pair of first wall faces is formed as a reflector that reflects a sound wave from the sound sources.

9 . The apparatus of claim 7 , wherein the at least one first sound source is provided in a vicinity of both of the pair of first wall faces.

10 . The apparatus of claim 1 , wherein
the container comprises a first wall face having a spherical shape, and the sound sources include at least one first sound source provided in a vicinity of the first wall face.

11 . The apparatus of claim 10 , wherein
the container comprises an introduction port configured to introduce the fluid into the container, and a discharge port configured to discharge the fluid from the container, and a distance between the introduction port and a center of the spherical shape is different from a distance between the discharge port and the center of the spherical shape.

12 . The apparatus of claim 10 , wherein
the container comprises an introduction port configured to introduce the fluid into the container, and a discharge port configured to discharges the fluid from the container, and the introduction port and the discharge port are provided at positions such that the particles from the introduction port are unable to reach the discharge port without passing through the node.

13 . The apparatus of claim 1 , wherein
the container comprises a pair of opposed first wall faces, a pair of opposed second wall faces, and a pair of opposed third wall faces, the sound sources are provided in a vicinity of one pair or two pairs of wall faces among the pair of first wall faces, the pair of second wall faces and the pair of third wall faces, and the predetermined portion is provided on remaining one pair or two pairs of wall faces among the pair of first wall faces, the pair of second wall faces and the pair of third wall faces.

14 . The apparatus of claim 13 , wherein
the container comprises an introduction port configured to introduce the fluid into the container, and a discharge port configured to discharge the fluid from the container, the introduction port and the discharge port are provided on the first wall faces, and the predetermined portion is provided on the second or third wall faces.

15 . The apparatus of claim 1 , wherein
the container comprises a pair of opposed first wall faces, and a second wall face having a cylindrical shape, the sound sources are provided in a vicinity of the first wall faces, and the predetermined portion is provided in a vicinity of the second wall face.

16 . A substrate processing system comprising:
a container configured to contain a fluid that includes particles to be collected; one or more sound sources configured to generate, in the container, a standing sound wave including at least one node to trap the particles in a vicinity of the node; and a substrate processing apparatus configured to process a substrate with the fluid discharged from the container, wherein the one or more sound sources are configured to generate the standing sound wave so that the node does not contact a wall face of the container or contacts a predetermined portion of the wall face of the container, and the predetermined portion is formed of a member that prevents the particles from leaving from the node located in a vicinity of the predetermined portion.

17 . The system of claim 16 , wherein
the container is configured to discharge, to a first channel, the fluid in which the particles are concentrated by the trapping and to discharge, to a second channel, the fluid in which the particles are reduced by the trapping, and the substrate processing apparatus is configured to process the substrate with the fluid from the second channel.

18 . The system of claim 16 , wherein the substrate processing apparatus is configured to clean or rinse the substrate with the fluid.

19 . A method of manufacturing a semiconductor device, comprising:
containing, in a container, a fluid that includes particles to be collected; generating, in the container, a standing sound wave including at least one node by one or more sound sources to trap the particles in a vicinity of the node; and processing a substrate with the fluid discharged from the container, wherein the one or more sound sources generate the standing sound wave so that the node does not contact a wall face of the container or contacts a predetermined portion of the wall face of the container, and the predetermined portion is formed of a member that prevents the particles from leaving from the node located in a vicinity of the predetermined portion.

20 . The method of claim 19 , wherein
the container discharges, to a first channel, the fluid in which the particles are concentrated by the trapping and discharges, to a second channel, the fluid in which the particles are reduced by the trapping, and the substrate is processed with the fluid from the second channel.

Assignees

• Toshiba Kk

Inventors

• Sugita Tomohiko
• Llmori Hiroyasu
• Ogawa Yoshihiro

Classifications

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P70/20 Primary

  Cleaning during device manufacture · CPC title

• B01D43/00 Primary

  Separating particles from liquids, or liquids from solids, otherwise than by sedimentation or filtration (flotation processes B03D1/00; drying solid materials or objects F26B) · CPC title