Method for manufacturing silicon using silica and silicon manufactured using the same

US2017137295A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2017137295-A1
Application numberUS-201615200282-A
CountryUS
Kind codeA1
Filing dateJul 1, 2016
Priority dateNov 13, 2015
Publication dateMay 18, 2017
Grant date

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  1. Title

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Abstract

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A method of preparing silicon using silica includes placing silica in a reaction chamber; adding a reducing agent into the reaction chamber; feeding a material for impact into the reaction chamber and sealing the reaction chamber; and reducing the silica to silicon by allowing the material for impact to generate a physical impact inside the reaction chamber. The preparation method of silicon using silica does not employ a high-temperature high-pressure process and provides a preparation method of silicon by which the porous structure of the silica before a reduction reaction is maintained within the silicon even after the reaction.

First claim

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What is claimed is: 1 . A method of preparing silicon using silica, the method comprising: placing silica in a reaction chamber; adding a reducing agent into the reaction chamber; feeding a material for impact into the reaction chamber and sealing the reaction chamber; and reducing the silica to silicon by allowing the material for impact to generate a physical impact inside the reaction chamber. 2 . The method of claim 1 , wherein the silica is plant-derived silica. 3 . The method of claim 2 , wherein the silica is chaff-derived silica. 4 . The method of claim 3 , wherein the chaff-derived silica is acquired by heat-treating chaff at a temperature in the range of 500° C. to 700° C. for a period ranging from 30 minutes to 300 minutes under an oxygen or air atmosphere. 5 . The method of claim 1 , wherein the reducing agent includes at least one selected from the group consisting of sodium (Na), magnesium (Mg), calcium (Ca), potassium (K), manganese (Mn), iron (Fe), boron (B), aluminum (Al), titanium (Ti), and a mixture thereof. 6 . The method of claim 1 , wherein the reducing agent is added at 0.7 to 1.5 equivalent weights with respect to 1 equivalent weight of the silica. 7 . The method of claim 1 , further comprising: pressurizing the reaction chamber after the sealing of the reaction chamber so that the internal pressure thereof is in the range of 1 bar to 100 bar. 8 . The method of claim 1 , wherein the physical impact is generated by a linear motion or rotary motion of the material for impact inside the reaction chamber caused by a rotation of the reaction chamber. 9 . The method of claim 1 , wherein the reduction of silica is terminated after an observation of a dramatic change in temperature or pressure in the reaction chamber. 10 . The method of claim 9 , wherein the reduction of silica is terminated after an observation of a 1.5-fold to 20-fold increase followed by a decrease of the pressure inside the reaction chamber. 11 . The method of claim 1 , further comprising: acquiring reaction products from the reaction chamber and treating the reaction products with an acid after the reduction of silica. 12 . The method of claim 11 , wherein the treating the reaction products with an acid is carried out for 30 minutes to 200 minutes at a temperature in the range of 60° C. to 80° C. by adding an acid having pH in the range of 0.01 to less than 7.0. 13 . Silica-derived porous silicon prepared by the method of claim 1 . 14 . The silica-derived porous silicon of claim 13 , wherein the porosity of the silicon differs by 100% to 70% with respect to the porosity of the silica, which is a reactant.

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Classifications

  • C01B33/023Primary

    by reduction of silica or {free} silica-containing material · CPC title

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What does patent US2017137295A1 cover?
A method of preparing silicon using silica includes placing silica in a reaction chamber; adding a reducing agent into the reaction chamber; feeding a material for impact into the reaction chamber and sealing the reaction chamber; and reducing the silica to silicon by allowing the material for impact to generate a physical impact inside the reaction chamber. The preparation method of silicon us…
Who is the assignee on this patent?
Korea Energy Research Inst
What technology area does this patent fall under?
Primary CPC classification C01B33/023. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu May 18 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).