Cleaning liquid composition
US-11905490-B2 · Feb 20, 2024 · US
Cleaning solution, cleaning facility and method of cleaning mount substrate
US2016376534A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016376534-A1 |
| Application number | US-201615263646-A |
| Country | US |
| Kind code | A1 |
| Filing date | Sep 13, 2016 |
| Priority date | Apr 22, 2014 |
| Publication date | Dec 29, 2016 |
| Grant date | — |
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Abstract
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A method of cleaning a mount substrate comprising the step of: preparing a cleaning solution and cleaning the mount substrate by using the cleaning solution. The cleaning solution is a chemical solution produced by providing organic amine as a content in a hydrocarbon-based solvent containing a ketone or an aromatic and by adding unsaturated carboxylic acid anhydride or carboxylic anhydride to this solvent.
First claim
Opening claim text (preview).
What is claimed is: 1 . An anhydrous cleaning solution produced by providing organic amine as a content in a hydrocarbon-based solvent containing at least one of a ketone, an aromatic, or a ketone and an aromatic, and by adding at least one of unsaturated carboxylic acid anhydride, carboxylic anhydride, or unsaturated carboxylic acid anhydride and carboxylic anhydride to this solvent. 2 . The anhydrous cleaning solution according to claim 1 , wherein the organic amine is at least one of a secondary organic amine, a tertiary organic amine, or a secondary and a tertiary organic amine 3 . The anhydrous cleaning solution according to claim 1 , wherein the organic amine is at least one of diethanolamine, trimethylamine, or diethanolamine and trimethylamine. 4 . The anhydrous cleaning solution according to claim 1 , wherein the unsaturated carboxylic acid anhydride is at least one of abietic anhydride, neoabietic anhydride, or abietic and neoabietic anhydride. 5 . The anhydrous cleaning solution according to claim 1 , wherein the carboxylic anhydride is at least one of formic acid, acetic anhydride, valeric anhydride, or any combination of the three.
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Inventors
Classifications
Amines or imines with one to four nitrogen atoms; Quaternized amines · CPC title
Alkanolamines or alkanolimines · CPC title
Hydrocarbons · CPC title
Carboxylic acids or salts thereof · CPC title
containing oxygen · CPC title
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- What does patent US2016376534A1 cover?
- A method of cleaning a mount substrate comprising the step of: preparing a cleaning solution and cleaning the mount substrate by using the cleaning solution. The cleaning solution is a chemical solution produced by providing organic amine as a content in a hydrocarbon-based solvent containing a ketone or an aromatic and by adding unsaturated carboxylic acid anhydride or carboxylic anhydride to …
- Who is the assignee on this patent?
- Mitsubishi Electric Corp
- What technology area does this patent fall under?
- Primary CPC classification C11D11/0047. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Thu Dec 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).