Refractive index measurement method, measurement apparatus, and optical element manufacturing method

Patent metadata

Field	Value
Publication number	US-2016363531-A1
Application number	US-201615174434-A
Country	US
Kind code	A1
Filing date	Jun 6, 2016
Priority date	Jun 10, 2015
Publication date	Dec 15, 2016
Grant date	—

Abstract

A phase refractive index of a test object is measured with high accuracy. A phase difference between a reference light beam and a test light beam is measured by dividing light from a light source into the reference light beam and the test light beam, and causing interference between the test light beam transmitted through the test object and the reference light beam. A phase refractive index of the test object is calculated by calculating a value corresponding to an integral multiple of 2π included in the phase difference, based on a slope of a phase refractive index of a reference object with respect to wavelength.

First claim

What is claimed is:

1 . A measurement method comprising:
measuring a phase difference between a reference light beam and a test light beam at a plurality of wavelengths, by dividing light from a light source into the reference light beam and the test light beam, and causing interference between the test light beam transmitted through a test object and the reference light beam; and calculating a phase refractive index of the test object, by calculating a value corresponding to an integral multiple of 2π included in the phase difference, based on a slope of a known phase refractive index of a reference object with respect to wavelength.

2 . The measurement method according to claim 1 , wherein the value corresponding to the integral multiple of 2π included in the phase difference is calculated based on a difference between a slope of the phase refractive index of the test object with respect to wavelength and the slope of the phase refractive index of the reference object with respect to wavelength.

3 . The measurement method according to claim 1 , wherein the value corresponding to the integral multiple of 2π included in the phase difference is calculated based on a tolerance of the slope of the phase refractive index of the reference object with respect to wavelength.

4 . The measurement method according to claim 1 , further comprising:
measuring the phase difference between the reference light beam and the test light beam at the plurality of wavelengths in a condition where a temperature of the test object is a first temperature; measuring the phase difference between the reference light beam and the test light beam at the plurality of wavelengths in a condition where the temperature of the test object is a second temperature different from the first temperature; and calculating a thickness of the test object, based on the phase difference between the reference light beam and the test light beam measured at each of the first temperature and the second temperature.

5 . The measurement method according to claim 1 , further comprising:
measuring the phase difference between the reference light beam and the test light beam at the plurality of wavelengths, by placing the test object in a first medium; measuring the phase difference between the reference light beam and the test light beam at the plurality of wavelengths, by placing the test object in a second medium having a refractive index different from a refractive index of the first medium; and calculating a thickness of the test object, based on the phase difference between the reference light beam and the test light beam measured by placing the test object in each of the first medium and the second medium.

6 . An optical element manufacturing method comprising:
molding an optical element; and evaluating the molded optical element, by measuring a refractive index of the optical element, wherein the refractive index of the optical element is measured by a measurement method including measuring a phase difference between a reference light beam and a test light beam at a plurality of wavelengths, by dividing light from a light source into the reference light beam and the test light beam, allowing the test light beam to be incident on a test object, and causing interference between the test light beam transmitted through the test object and the reference light beam, and calculating a phase refractive index of the test object, by calculating an a value corresponding to an integral multiple of 2π included in the phase difference, based on a slope of a known phase refractive index of a reference test object with respect to wavelength.

7 . A measurement apparatus comprising:
a light source; an interference optical system configured to divide light from the light source into a reference light beam and a test light beam, and to cause interference between the test light beam transmitted through a test object and the reference light beam; a detector configured to detect interference light between the reference light beam and the test light beam, the interference light being formed by the interference optical system; and a computer configured to calculate a phase difference between the reference light beam and the test light beam, based on an interference signal obtained from the detector detecting the interference light, wherein the computer calculates a phase refractive index of the test object, by calculating an a value corresponding to an integral multiple of 2π included in the phase difference, based on a slope of a known phase refractive index of a reference object with respect to wavelength.

8 . The measurement apparatus according to claim 7 , wherein the computer calculates the value corresponding to the integral multiple of 2π included in the phase difference, based on a difference between a slope of the phase refractive index of the test object with respect to wavelength and the slope of the phase refractive index of the reference object with respect to wavelength.

9 . The measurement apparatus according to claim 7 , wherein the computer calculates the value corresponding to the integral multiple of 2π included in the phase difference, based on a tolerance of the slope of the phase refractive index of the reference object with respect to wavelength.

10 . The measurement apparatus according to claim 7 , wherein the computer calculates a thickness of the test object, based on the phase difference between the reference light beam and the test light beam measured at a plurality of wavelengths in a condition where a temperature of the test object is a first temperature, and the phase difference between the reference light beam and the test light beam measured at the plurality of wavelengths in a condition where the temperature of the test object is a second temperature different from the first temperature.

11 . The measurement apparatus according to claim 7 , wherein the computer calculates a thickness of the test object, based on the phase difference between the reference light beam and the test light beam measured at a plurality of wavelengths in a state where the test object is placed in a first medium, and the phase difference between the reference light beam and the test light beam measured at the plurality of wavelengths in a state where the test object is placed in a second medium having a refractive index different from a refractive index of the first medium.

Assignees

• Canon Kk

Inventors

• Sugimoto Tomohiro

Classifications

• G01N2201/066

  Modifiable path; multiple paths in one sample · CPC title

• G01N21/45 Primary

  using interferometric methods; using Schlieren methods · CPC title

• G01M11/0271

  by using interferometric methods · CPC title

• G01B11/06 Primary

  for measuring thickness {; e.g. of sheet material (thickness measurement by thermal means G01B21/085)} · CPC title

• G01N2201/068

  Optics, miscellaneous · CPC title