Measurement method, measurement apparatus, and manufacturing method for optical element

Patent metadata

Field	Value
Publication number	US-2016356707-A1
Application number	US-201615163065-A
Country	US
Kind code	A1
Filing date	May 24, 2016
Priority date	Jun 2, 2015
Publication date	Dec 8, 2016
Grant date	—

Abstract

A test object is placed inside a medium, and wavefronts of light transmitted through the test object are measured at a plurality of wavelengths. From the transmitted wavefronts of the test object measured at the plurality of wavelengths and transmitted wavefronts at a plurality of wavelengths when a reference object having a specific group refractive index distribution is placed in the medium, a changing rate of a wavefront aberration with respect to wavelength corresponding to a difference between the transmitted wavefront of the test object and the transmitted wavefront of the reference object is calculated. A refractive index distribution of the test object is calculated on the basis of the changing rate of the wavefront aberration with respect to wavelength.

First claim

What is claimed is:

1 . A measurement method comprising:
a measurement step of placing a test object in a medium and measuring wavefronts of light of a plurality of wavelengths transmitted through the test object; and a calculation step of calculating, from the transmitted wavefronts of the test object measured at the plurality of wavelengths and from wavefronts of light of the plurality of wavelengths transmitted through a reference object having a specific group refractive index distribution placed in the medium, a changing rate of wavefront aberration corresponding to a difference between the transmitted wavefront of the test object and the transmitted wavefront of the reference object with respect to wavelength and calculating a refractive index distribution of the test object based on the changing rate of the wavefront aberration with respect to wavelength.

2 . The measurement method according to claim 1 , wherein the refractive index distribution of the test object is calculated by removing a shape component of the test object based on the changing rates of the wavefront aberrations with respect to wavelength at a plurality of wavelengths.

3 . The measurement method according to claim 1 ,
wherein, in the measurement step, first transmitted wavefronts in a first medium having a first refractive index and second transmitted wavefronts in a second medium having a second refractive index different from the first refractive index are measured at the plurality of wavelengths, and wherein, in the calculation step, first wavefront aberrations corresponding to differences between measurement results of the first transmitted wavefronts and transmitted wavefronts when the reference object is placed in the first medium is calculated at the plurality of wavelengths, second wavefront aberrations corresponding to differences between measurement results of the second transmitted wavefronts and transmitted wavefronts when the reference object is placed in the second medium is calculated at the plurality of wavelengths, a changing rate of the first wavefront aberration with respect to wavelength is calculated from the first wavefront aberrations calculated at the plurality of wavelengths, a changing rate of the second wavefront aberration with respect to wavelength is calculated from the second wavefront aberrations calculated at the plurality of wavelengths, and the refractive index distribution of the test object is calculated by removing a shape component of the test object based on the changing rate of the first wavefront aberration with respect to wavelength and the changing rate of the second wavefront aberration with respect to wavelength.

4 . A manufacturing method for an optical element, comprising:
a step of forming the optical element by mold forming; and a step of evaluating the formed optical element by measuring a refractive index distribution of the optical element, wherein the refractive index distribution of the optical element is measured by a measurement method including a measurement step of placing a test object in a medium and measuring wavefronts of light of a plurality of wavelengths transmitted through the test object, and a calculation step of calculating, from the transmitted wavefronts of the test object measured at the plurality of wavelengths and transmitted wavefronts at the plurality of wavelengths when a reference object having a specific group refractive index distribution is placed in the medium, a changing rate of a wavefront aberration corresponding to a difference between the transmitted wavefront of the test object and the transmitted wavefront of the reference object with respect to wavelength and calculating a refractive index distribution of the test object based on the changing rate of the wavefront aberration with respect to wavelength.

5 . A measurement apparatus comprising:
a light source; a wavefront sensor configured to measure transmitted wavefronts of a test object at a plurality of wavelengths by using light from the light source; and a computer configured to calculate, from the transmitted wavefronts of the test object measured at the plurality of wavelengths and transmitted wavefronts at the plurality of wavelengths when a reference object having a specific group refractive index distribution is placed in a medium, a changing rate of a wavefront aberration corresponding to a difference between the transmitted wavefront of the test object and the transmitted wavefront of the reference object with respect to wavelength and to calculate a refractive index distribution of the test object based on the changing rate of the wavefront aberration with respect to wavelength.

6 . The measurement apparatus according to claim 5 , wherein the computer calculates the refractive index distribution of the test object by removing a shape component of the test object based on the changing rates of the wavefront aberrations with respect to wavelength at a plurality of wavelengths.

7 . The measurement apparatus according to claim 5 ,
wherein the wavefront sensor measures first transmitted wavefronts in a first medium having a first refractive index and second transmitted wavefronts in a second medium having a second refractive index different from the first refractive index at a plurality of wavelengths, and wherein the computer calculates, at the plurality of wavelengths, first wavefront aberrations corresponding to differences between measurement results of the first transmitted wavefronts and transmitted wavefronts when the reference object is placed in the first medium, calculates, at the plurality of wavelengths, second wavefront aberrations corresponding to differences between measurement results of the second transmitted wavefronts and transmitted wavefronts when the reference object is placed in the second medium, calculates a changing rate of the first wavefront aberration with respect to wavelength from the first wavefront aberrations calculated at the plurality of wavelengths, calculates a changing rate of the second wavefront aberration with respect to wavelength from the second wavefront aberrations calculated at the plurality of wavelengths, and calculates the refractive index distribution of the test object by removing a shape component of the test object based on the changing rate of the first wavefront aberration with respect to wavelength and the changing rate of the second wavefront aberration with respect to wavelength.

8 . A method of measuring refractive index distribution, comprising:
measuring wavefronts of light of a plurality of wavelengths transmitted through a test object immersed in a liquid medium; calculating, from the transmitted wavefronts of the test object measured at the plurality of wavelengths and from wavefronts of light of the plurality of wavelengths transmitted through a reference object having a specific group refractive index distribution immersed in the liquid medium, a rate of change of wavefront aberration corresponding to a difference between the transmitted wavefront of the test object and the transmitted wavefront of the reference object; and calculating a refractive index distribution of the test object based on the calculated rate of change of wavefront aberration.

Assignees

• Canon Kk

Inventors

• Sugimoto Tomohiro

Classifications

• G01N21/4133 Primary

  Refractometers, e.g. differential · CPC title

• G01M11/0228 Primary

  by measuring refractive power · CPC title

• G01N21/45

  using interferometric methods; using Schlieren methods · CPC title

• G01M11/0285

  by measuring material or chromatic transmission properties (G01M11/0292 takes precedence) · CPC title

• G01N21/5911

  of the scanning type (scanning per se G02B) · CPC title