Organic layer composition and method of forming patterns

Patent metadata

Field	Value
Publication number	US-2016355699-A1
Application number	US-201615076694-A
Country	US
Kind code	A1
Filing date	Mar 22, 2016
Priority date	Jun 2, 2015
Publication date	Dec 8, 2016
Grant date	—

Abstract

An organic layer composition includes a first compound having a thermal shrinkage ratio of about 10% to about 70%, a second compound having a smaller thermal shrinkage ratio than the first compound, and a solvent, and an organic layer obtained by curing the organic layer composition and a method of forming patterns using the organic layer composition are disclosed.
A method of measuring the thermal shrinkage ratio is described in the detailed description.

First claim

What is claimed is:

1 . An organic layer composition, comprising
a first compound having a thermal shrinkage ratio of about 10% to about 70%, a second compound having a smaller thermal shrinkage ratio than the first compound, and a solvent, wherein the thermal shrinkage ratio is calculated by the Method of Measuring a Thermal Shrinkage Ratio as defined in the specification.

2 . The organic layer composition as claimed in claim 1 , wherein the first compound and the second compound are included in a weight ratio of about 1:99 to about 99:1.

3 . The organic layer composition as claimed in claim 1 , wherein the thermal shrinkage ratio of the first compound is about 10% to about 60%.

4 . The organic layer composition as claimed in claim 1 , wherein the first compound includes a moiety represented by Chemical Formula 1:

wherein, in Chemical Formula 1,
Ar 1 is a cyclic group including at least one substituted or unsubstituted benzene ring,
R 1 is a single bond, a substituted or unsubstituted C1 to C30 alkylene group, a substituted or unsubstituted C3 to C30 cycloalkylene group, a substituted or unsubstituted C6 to C30 arylene group, a substituted or unsubstituted C3 to C30 cycloalkenylene group, a substituted or unsubstituted C7 to C20 arylalkylene group, a substituted or unsubstituted C1 to C20 heteroalkylene group, a substituted or unsubstituted C2 to C30 heterocycloalkylene group, a substituted or unsubstituted C2 to C30 heteroarylene group, a substituted or unsubstituted C2 to C30 alkenylene group, a substituted or unsubstituted C2 to C30 alkynylene group, or a combination thereof,
n 1 is an integer of 1 to 100, and
* is a linking point.

5 . The organic layer composition as claimed in claim 1 , wherein Ar 1 in Chemical Formula 1 is selected from Group 1:

wherein, in Group 1,
R 10 to R 45 and R 47 to R 57 are independently hydrogen, a hydroxy group, a halogen, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C3 to C30 cycloalkenyl group, a substituted or unsubstituted C7 to C20 arylalkyl group, a substituted or unsubstituted C1 to C20 heteroalkyl group, a substituted or unsubstituted C20 to C30 heterocycloalkyl group, a substituted or unsubstituted C2 to C30 heteroaryl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, or a combination thereof,
n 10 to n 45 and n 47 to n 57 are independently integers of 1 to 6, as further limited by the number of binding sites of the ring to which the respective one of R 10 to R 45 and R 47 to R 57 is attached, and
Y is C═O, oxygen (O), sulfur (S), CR b R c , NR d , or a combination thereof, wherein R b to R d are independently hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen atom, or a combination thereof.

6 . The organic layer composition as claimed in claim 1 , wherein in Chemical Formula 1, R 1 is selected from Group 2:

wherein, in Group 2,
R 58 to R 114 are independently hydrogen, a hydroxy group, a halogen, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C3 to C30 cycloalkenyl group, a substituted or unsubstituted C7 to C20 arylalkyl group, a substituted or unsubstituted C1 to C20 heteroalkyl group, a substituted or unsubstituted C20 to C30 heterocycloalkyl group, a substituted or unsubstituted C2 to C30 heteroaryl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, or a combination thereof,
n 66 is an integer of 0 to 30, and
Z is C═O, oxygen (O), sulfur (S), CR b R c , NR d , or a combination thereof, wherein R b to R d are independently hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen atom, or a combination thereof.

7 . The organic layer composition as claimed in claim 1 , wherein the first compound is a polymer having a weight average molecular weight of about 1,000 to about 30,000.

8 . The organic layer composition as claimed in claim 1 , wherein the second compound is a compound including a moiety represented by Chemical Formula 2, a compound including a moiety represented by Chemical Formula 3, a compound including a moiety represented by Chemical Formula 4, or a combination thereof:

wherein, in Chemical Formula 2,
Ar 2 and Ar 3 are independently a cyclic group including at least one substituted or unsubstituted benzene ring,
R 2 and R 3 are independently a single bond, a substituted or unsubstituted C1 to C30 alkylene group, a substituted or unsubstituted C3 to C30 cycloalkylene group, a substituted or unsubstituted C6 to C30 arylene group, a substituted or unsubstituted C3 to C30 cycloalkenylene group, a substituted or unsubstituted C7 to C20 arylalkylene group, a substituted or unsubstituted C1 to C20 heteroalkylene group, a substituted or unsubstituted C2 to C30 heterocycloalkylene group, a substituted or unsubstituted C2 to C30 heteroarylene group, a substituted or unsubstituted C2 to C30 alkenylene group, a substituted or unsubstituted C2 to C30 alkynylene group, or a combination thereof,
n 2 is an integer of 1 to 100, and
* is a linking point,

wherein, in Chemical Formula 3,
A is a substituted or unsubstituted cyclic group,
R 4 to R 9 are independently a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C6 to C30 aromatic ring group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C3 to C20 cycloalkenyl group, or a combination thereof,
X 1 to X 6 are independently hydrogen, a hydroxy group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a halogen atom, a substituted or unsubstituted C1 to C30 alkoxy group, or a combination thereof,
n 3 to n 8 are independently integers of 0 to 6, and
1≦n 3 +n 4 +n 5 +n 6 +n 7 +n 8 ≦6,

wherein, in Chemical Formula 4,
B is a substituted or unsubstituted cyclic group,
B′ is a substituted or unsubstituted polycyclic aromatic group,
L is a single bond or a substituted or unsubstituted C1 to C6 alkylene group, and
n 9 is an integer ranging from 1 to 4.

9 . The organic layer composition as claimed in claim 8 , wherein in Chemical Formula 2, Ar 2 and Ar 3 are independently selected from Group 1:

Assignees

• Samsung Sdi Co Ltd

Inventors

• Kim Minsoo
• Nam Younhee
• Baek Jaeyeol
• SONG Hyunji
• Yoon Byeri
• Jeong Seulgi
• Hong Seunghee
• Hwang Sunmin

Classifications

• H10P76/405

  characterised by their composition, e.g. multilayer masks · CPC title

• G03F7/094

  Multilayer resist systems, e.g. planarising layers · CPC title

• C08G8/10

  with phenol · CPC title

• C08G8/24

  with mixtures of two or more phenols which are not covered by only one of the groups C08G8/10 - C08G8/20 · CPC title

• C08G8/20

  with polyhydric phenols · CPC title