Semiconductor device manufacturing method and semiconductor device manufactured using the same
US-2024395745-A1 · Nov 28, 2024 · US
US2016336364A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016336364-A1 |
| Application number | US-201615219007-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jul 25, 2016 |
| Priority date | Jan 15, 2009 |
| Publication date | Nov 17, 2016 |
| Grant date | — |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A solid-state imaging device includes a layout in which one sharing unit includes an array of photodiodes of 2 pixels by 4×n pixels (where, n is a positive integer), respectively, in horizontal and vertical directions.
Opening claim text (preview).
What is claimed is: 1 . A solid-state imaging device comprising: a first structural unit including a first transfer transistor group sharing a first floating diffusion, the first transfer transistor group including four transfer transistors arranged around the first floating diffusion; and a second structural unit including a second transfer transistor group sharing a second floating diffusion, the second transfer group including four transfer transistors arranged around the second floating diffusion; wherein the first and second floating diffusions are coupled to each other in a first direction, wherein the first and second transfer transistor groups share at least an amplification transistor and a reset transistor, the amplification transistor coupled to a select transistor, wherein a select wiring coupled to a gate electrode of the select transistor extends along the first direction, and wherein a first power supply wiring coupled to a drain region of the reset transistor extends along a second direction different from the first direction. 2 . The solid-state imaging device according to claim 1 , wherein a second power supply wiring coupled to a drain region of the amplification transistor extends along the first direction. 3 . The solid-state imaging device according to claim 2 , wherein the first and second power supply wirings are formed in first and second layers respectively. 4 . The solid-state imaging device according to claim 2 , wherein each gate electrode of the first and second transfer transistor groups is substantially triangular or trapezoidal in shape. 5 . The solid-state imaging device according to claim 3 , wherein a reset wiring coupled to a gate electrode of the reset transistor extends along the second direction. 6 . The solid-state imaging device according to claim 5 , wherein each gate electrode of the first and second transfer transistor groups is coupled to a readout wiring extending along the second direction. 7 . The solid-state imaging device according to claim 6 , wherein a first connection wiring is coupled to the first floating diffusion, the second floating diffusion, an amplification gate electrode of the amplification transistor, and a source region of the reset transistor. 8 . The solid-state imaging device according to claim 7 , wherein a third power supply wiring coupled to a drain region of the select transistor extends along the first direction. 9 . The solid-state imaging device according to claim 8 , wherein a signal wiring coupled to a source region of the amplification transistor extends along the first direction. 10 . The solid-state imaging device according to claim 9 , wherein a second connection wiring is formed in a transverse direction to connect with the select wiring. 11 . The solid-state imaging device according to claim 10 , wherein the second connection wiring covers an entire width of the sharing unit. 12 . The solid-state imaging device according to claim 11 , wherein readout wirings which are connected to readout gate electrodes are formed in the transverse direction. 13 . The solid-state imaging device according to claim 12 , wherein the readout wirings are formed between adjacent pixels. 14 . The solid-state imaging device according to claim 2 , wherein the amplification transistor has an active region comprising a source region of the amplification transistor, the drain region of the amplification transistor, and a channel region, wherein the active region extends from the source region to the drain region of the amplification transistor via the channel region, wherein the active region is formed in a cross shape, and wherein the amplification gate electrode is formed on a vertical portion of the channel region. 15 . The solid-state imaging device according to claim 14 , wherein a reset gate electrode of the reset transistor is formed in a transverse direction with a length of two pixel pitches. 16 . The solid-state imaging device according to claim 10 , wherein the first connection wiring, the second connection wiring, a select transistor power supply wiring, the select wiring, and the readout wirings are formed in a four-layer wiring structure. 17 . An electronic apparatus comprising: a solid-state imaging device comprising: a first structural unit including a first transfer transistor group sharing a first floating diffusion, the first transfer transistor group including four transfer transistors arranged around the first floating diffusion; and a second structural unit including a second transfer transistor group sharing a second floating diffusion, the second transfer transistor group including four transfer transistors arranged around the second floating diffusion; wherein the first and second floating diffusions are coupled to each other in a first direction, wherein the first and second transfer transistor groups share at least an amplification transistor and a reset transistor, the amplification transistor coupled to a select transistor, wherein a select wiring coupled to a gate electrode of the select transistor extends along the first direction, and wherein a first power supply wiring coupled to a drain region of the reset transistor extends along a second direction different from the first direction.
SSIS architectures; Circuits associated therewith · CPC title
Addressed sensors, e.g. MOS or CMOS sensors · CPC title
Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components · CPC title
based on three different wavelength filter elements · CPC title
comprising amplifiers shared between a plurality of pixels, i.e. at least one part of the amplifier must be on the sensor array itself · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.