Demagnetization of magnetic media by c doping for hdd patterned media application

Patent metadata

Field	Value
Publication number	US-2016305013-A1
Application number	US-201615193307-A
Country	US
Kind code	A1
Filing date	Jun 27, 2016
Priority date	Dec 16, 2011
Publication date	Oct 20, 2016
Grant date	—

Abstract

Embodiments described herein provide methods and apparatus for treating a magnetic substrate having an imprinted, oxygen-reactive mask formed thereon by implanting ions into a magnetically active surface of the magnetic substrate through the imprinted oxygen-reactive mask, wherein the ions do not reduce the oxygen reactivity of the mask, and removing the mask by exposing the substrate to an oxygen-containing plasma. The mask may be amorphous carbon, through which carbon-containing ions are implanted into the magnetically active surface. The carbon-containing ions, which may also contain hydrogen, may be formed by activating a mixture of hydrocarbon gas and hydrogen. A ratio of the hydrogen and the hydrocarbon gas may be selected or adjusted to control the ion implantation.

First claim

What is claimed is:

1 . A method of treating a magnetic substrate having an imprinted, oxygen-reactive mask formed thereon, comprising:
implanting ions into a magnetically active surface of a magnetic substrate using an imprinted oxygen-reactive mask to define a pattern on the magnetically active surface, wherein the ions do not reduce the oxygen reactivity of the mask; and removing the mask by exposing the substrate to an oxygen-containing plasma.

2 . The method of claim 1 , wherein the mask comprises amorphous carbon, and the ions are derived from a hydrocarbon gas.

3 . The method of claim 1 , wherein the implanting comprises exposing the magnetically active surface to a circulating plasma formed from a gas mixture comprising a hydrocarbon gas.

4 . The method of claim 2 , wherein the implanting comprises forming a circulating plasma from the hydrocarbon gas.

5 . The method of claim 4 , wherein the ions comprise carbon and hydrogen.

6 . The method of claim 3 , wherein the gas mixture further comprises B 2 H 6 .

7 . The method of claim 3 , wherein the gas mixture further comprises hydrogen gas.

8 . The method of claim 7 , wherein a ratio of the hydrogen gas to the hydrocarbon gas is selected or adjusted to control the ion implantation.

9 . A method of treating a substrate having a magnetically susceptible surface and an imprinted, oxygen-reactive barrier material formed on the magnetically susceptible surface, the method comprising:
disposing a substrate on a substrate support in a processing chamber; forming an activated gas mixture outside the processing chamber, the activated gas mixture comprising an oxygen-reactive material; flowing the activated gas mixture into the processing chamber; exposing the substrate to the activated gas mixture; implanting ions from the activated gas mixture into the magnetically susceptible surface through the barrier material by applying an electrical bias to the substrate; and exposing the substrate to an activated oxygen-containing gas to remove the barrier material, wherein the ions do not reduce the oxygen reactivity of the barrier material.

10 . The method of claim 9 , wherein each of the barrier material and the activated gas mixture comprises carbon.

11 . The method of claim 9 , wherein the activated gas mixture is a circulating plasma.

12 . The method of claim 9 , wherein the activated gas mixture is a torroidal plasma.

13 . The method of claim 10 , wherein the activated gas mixture is formed by applying RF power to a gas mixture comprising a hydrocarbon gas and a hydrogen gas.

14 . The method of claim 13 , wherein a ratio of the hydrogen gas to the hydrocarbon gas is adjusted or selected to control the ion implantation.

15 . A method of treating a magnetic substrate having an imprinted, oxygen-reactive mask formed thereon, comprising:
Implanting carbon-containing ions into a magnetically active surface of a magnetic substrate using an imprinted oxygen-reactive mask comprising carbon to define a pattern on the magnetically active surface, wherein the ions do not reduce the oxygen reactivity of the mask; and removing the mask by exposing the substrate to an oxygen-containing plasma.

16 . The method of claim 15 , wherein implanting carbon-containing ions into the magnetically active surface of the magnetic substrate comprises exposing the magnetic substrate to a circulating plasma.

17 . The method of claim 16 , wherein the circulating plasma is derived from a hydrocarbon gas.

18 . The method of claim 15 , wherein the carbon-containing ions are derived from a hydrocarbon gas.

19 . The method of claim 15 , wherein implanting carbon-containing ions into the magnetically active surface of the magnetic substrate comprises exposing the magnetic substrate to a plasma formed from a gas mixture comprising a hydrocarbon gas.

20 . The method of claim 19 , wherein the gas mixture further comprises B 2 H 6 .

Assignees

• Applied Materials Inc

Inventors

• Hilkene Martin A
• Gouk Roman
• Scotney-Castle Matthew D
• Porshnev Peter I

Classifications

• G11B5/851

  Coating a support with a magnetic layer by sputtering · CPC title

• G11B5/85

  Coating a support with a magnetic layer by vapour deposition · CPC title

• G11B5/62

  Record carriers characterised by the selection of the material · CPC title

• C23C14/042 Primary

  using masks · CPC title

• C23C14/5873

  Removal of material · CPC title