Printing System Assemblies and Methods
US-2015360462-A1 · Dec 17, 2015 · US
US2016293874A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016293874-A1 |
| Application number | US-201615079562-A |
| Country | US |
| Kind code | A1 |
| Filing date | Mar 24, 2016 |
| Priority date | Mar 30, 2015 |
| Publication date | Oct 6, 2016 |
| Grant date | — |
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A method of manufacturing a photoelectric conversion device of an embodiment includes: forming a layer on a substrate; and drying this layer. The layer contains a p-type semiconductor, an n-type semiconductor, and a compound represented by the following formula (1). The layer is dried under pressures of 100 Pa or less and substrate temperatures of 40 to 200° C. R 1 —(CH 2 ) n —R 2 (1) Here, n: 1 to 20, and R1, R2: halogen or SH
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What is claimed is: 1 . A method of manufacturing a photoelectric conversion device, comprising: forming a layer containing a p-type semiconductor, an n-type semiconductor, and a compound represented by the following formula (1) on a substrate; and drying the layer under pressures of 100 Pa or less and substrate temperatures of 40 to 200° C. R 1 —(CH 2 ) n —R 2 (1) n: 1 to 20 R1, R2: halogen or SH 2 . The method of claim 1 , wherein the pressures are 1×10 −3 Pa or less and the temperatures are 40 to 160° C. 3 . The method of claim 1 , wherein: the dried layer has a microphase-separated structure of the p-type semiconductor and the n-type semiconductor; the p-type semiconductor has a polymer; and the n-type semiconductor has a fullerene derivative. 4 . The method of claim 1 , wherein the compound is 1,8-diiodooctane. 5 . A photoelectric conversion device, comprising: a first electrode layer; a second electrode layer; and a photoelectric conversion layer disposed between the first and second electrode layers and including an organic active layer, the organic active layer containing a p-type semiconductor, an n-type semiconductor, and a compound represented by the following formula (1), and a concentration of the compound being 0.001 mass % or more to less than 0.1 mass %. R 1 —(CH 2 ) n —R 2 (1) n: 1 to 20 R1, R2: halogen or SH 6 . The photoelectric conversion device of claim 5 , wherein the photoelectric conversion layer has a microphase-separated structure of the p-type semiconductor and the n-type semiconductor, the p-type semiconductor has a polymer; and the n-type semiconductor has a fullerene derivative. 7 . The photoelectric conversion device of claim 5 , wherein the compound is 1,8-diiodooctane.
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