Photoelectric conversion device and method of manufacturing the same

US2016293874A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016293874-A1
Application numberUS-201615079562-A
CountryUS
Kind codeA1
Filing dateMar 24, 2016
Priority dateMar 30, 2015
Publication dateOct 6, 2016
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method of manufacturing a photoelectric conversion device of an embodiment includes: forming a layer on a substrate; and drying this layer. The layer contains a p-type semiconductor, an n-type semiconductor, and a compound represented by the following formula (1). The layer is dried under pressures of 100 Pa or less and substrate temperatures of 40 to 200° C. R 1 —(CH 2 ) n —R 2   (1) Here, n: 1 to 20, and R1, R2: halogen or SH

First claim

Opening claim text (preview).

What is claimed is: 1 . A method of manufacturing a photoelectric conversion device, comprising: forming a layer containing a p-type semiconductor, an n-type semiconductor, and a compound represented by the following formula (1) on a substrate; and drying the layer under pressures of 100 Pa or less and substrate temperatures of 40 to 200° C. R 1 —(CH 2 ) n —R 2   (1) n: 1 to 20 R1, R2: halogen or SH 2 . The method of claim 1 , wherein the pressures are 1×10 −3 Pa or less and the temperatures are 40 to 160° C. 3 . The method of claim 1 , wherein: the dried layer has a microphase-separated structure of the p-type semiconductor and the n-type semiconductor; the p-type semiconductor has a polymer; and the n-type semiconductor has a fullerene derivative. 4 . The method of claim 1 , wherein the compound is 1,8-diiodooctane. 5 . A photoelectric conversion device, comprising: a first electrode layer; a second electrode layer; and a photoelectric conversion layer disposed between the first and second electrode layers and including an organic active layer, the organic active layer containing a p-type semiconductor, an n-type semiconductor, and a compound represented by the following formula (1), and a concentration of the compound being 0.001 mass % or more to less than 0.1 mass %. R 1 —(CH 2 ) n —R 2   (1) n: 1 to 20 R1, R2: halogen or SH 6 . The photoelectric conversion device of claim 5 , wherein the photoelectric conversion layer has a microphase-separated structure of the p-type semiconductor and the n-type semiconductor, the p-type semiconductor has a polymer; and the n-type semiconductor has a fullerene derivative. 7 . The photoelectric conversion device of claim 5 , wherein the compound is 1,8-diiodooctane.

Assignees

Inventors

Classifications

  • Organic PV cells · CPC title

  • Photovoltaic [PV] devices · CPC title

  • comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains · CPC title

  • H10K71/15Primary

    characterised by the solvent used · CPC title

  • Electricity · mapped topic

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2016293874A1 cover?
A method of manufacturing a photoelectric conversion device of an embodiment includes: forming a layer on a substrate; and drying this layer. The layer contains a p-type semiconductor, an n-type semiconductor, and a compound represented by the following formula (1). The layer is dried under pressures of 100 Pa or less and substrate temperatures of 40 to 200° C. R 1 —(CH 2 ) n —R 2   (1…
Who is the assignee on this patent?
Toshiba Kk
What technology area does this patent fall under?
Primary CPC classification H10K71/15. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Oct 06 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).