Sputtering device and method for replacing film roll in sputtering device

Patent metadata

Field	Value
Publication number	US-2016293383-A1
Application number	US-201415025825-A
Country	US
Kind code	A1
Filing date	Oct 10, 2014
Priority date	Oct 10, 2013
Publication date	Oct 6, 2016
Grant date	—

Abstract

In a sputtering device, a supply-side film roll chamber includes a supply-side vacuum pump and a supply-side main valve. A storage-side film roll chamber includes a storage-side vacuum pump and a storage-side main valve. A supply-side load-lock valve is provided between the supply-side film roll chamber and a layer forming chamber. A storage-side load-lock valve is provided between the storage-side film roll chamber and the layer forming chamber. In a method for replacing a film roll, a supply-side main valve and a supply-side load-lock valve are closed when replacing a supply-side film roll. A storage side-main valve and a storage-side load-lock valve are closed when replacing a storage-side film roll.

First claim

What is claimed is:

1 . A sputtering device, comprising:
a supply-side film roll chamber including a film supplying apparatus; a supply-side vacuum pump configured to evacuate the supply-side film roll chamber; a supply-side main valve that hermetically seals between the supply-side film roll chamber and the supply-side vacuum pump; a storage-side film roll chamber including a film storing apparatus; a storage-side vacuum pump configured to evacuate the storage-side film roll chamber; a storage-side main valve that hermetically seals between the storage-side film roll chamber and the storage-side vacuum pump; a layer forming chamber including a layer forming roll, at least one target facing to the layer forming roll, and at least one cathode to support the at least one target; a supply-side load-lock valve provided between the supply-side film roll chamber and the layer forming chamber; and a storage-side load-lock valve provided between the storage-side film roll chamber and the layer forming chamber.

2 . The sputtering device according to claim 1 , wherein the supply-side vacuum pump and the storage-side vacuum pump are each a turbo-molecular pump.

3 . A method for replacing a film roll in a sputtering device, comprising the steps of:
closing a supply-side main valve between a supply-side film roll chamber and a supply-side vacuum pump in a state of operating (ON) the supply-side vacuum pump to hermetically seal between the supply-side film roll chamber and the supply-side vacuum pump; closing a supply-side load-lock valve between the supply-side film roll chamber and a layer forming chamber in a state in which a film is penetrated through, leaving an end of the film in the supply-side film roll chamber to hermetically seal between the supply-side film roll chamber and the layer forming chamber; exposing the supply-side film roll chamber to the air; replacing a supply-side film roll to couple a tip of a new film to the end of the film; opening the supply-side main valve to evacuate the supply-side film roll chamber by use of the supply-side vacuum pump; and opening the supply-side load-lock valve to release the hermetic sealing between the supply-side film roll chamber and the layer forming chamber.

4 . A method for replacing a film roll in a sputtering device, comprising the steps of:
closing a storage-side main valve between a storage-side film roll chamber and a storage-side vacuum pump to hermetically seal between the storage-side film roll chamber and the storage-side vacuum pump; closing a storage-side load-lock valve between the storage-side film roll chamber and a layer forming chamber in a state in which a film is penetrated through to hermetically seal between the storage-side film roll chamber and the layer forming chamber; exposing the storage-side film roll chamber to the air; removing a storage-side film roll to couple the film to a film storing apparatus; opening the storage-side main valve to evacuate the storage-side film roll chamber by use of the storage-side vacuum pump; and opening the storage-side load-lock valve to release the hermetic sealing between the storage-side film roll chamber and the layer forming chamber.

Assignees

• Nitto Denko Corp

Inventors

• Nashiki Tomotake
• Hamada Akira

Classifications

• C23C14/566

  using a load-lock chamber · CPC title

• C23C14/562 Primary

  for coating elongated substrates · CPC title

• C23C14/34 Primary

  Sputtering · CPC title

• H01J37/3277 Primary

  of continuous material · CPC title

• H01J37/3417

  Arrangements · CPC title