Thermal chemical vapor deposition product and process of using a thermal chemical vapor deposition product

Patent metadata

Field	Value
Publication number	US-2016289124-A1
Application number	US-201514675806-A
Country	US
Kind code	A1
Filing date	Apr 1, 2015
Priority date	Apr 1, 2015
Publication date	Oct 6, 2016
Grant date	—

Abstract

Thermal chemical vapor deposition products and processes are disclosed. The products include a ceramic substrate and a non-porous surface on the ceramic substrate, the non-porous surface including a ceramic material. The process includes transporting fluid along a non-porous surface, the non-porous surface being positioned on a ceramic substrate and being a thermal chemical vapor deposition coating.

First claim

What is claimed is:

1 . A thermal chemical vapor deposition product, comprising:
a ceramic substrate; and a non-porous surface on the ceramic substrate, the non-porous surface including a ceramic material.

2 . The thermal chemical vapor deposition product of claim 1 , wherein the non-porous surface is formed from thermal chemical vapor deposition of dimethylsilane.

3 . The thermal chemical vapor deposition product of claim 2 , wherein the ceramic material comprises silicon oxide.

4 . The thermal chemical vapor deposition product of claim 2 , wherein the non-porous surface is oxidized.

5 . The thermal chemical vapor deposition product of claim 4 , wherein the non-porous surface is functionalized.

6 . The thermal chemical vapor deposition product of claim 2 , wherein the non-porous surface is treated with trimethylsilane.

7 . The thermal chemical vapor deposition product of claim 6 , wherein the trimethylsilane is functionalized.

8 . The thermal chemical vapor deposition product of claim 1 , wherein the ceramic substrate has porosity of greater than 50%.

9 . The thermal chemical vapor deposition product of claim 1 , wherein the ceramic substrate has porosity of greater than 70%.

10 . The thermal chemical vapor deposition product of claim 1 , wherein, in comparison to the ceramic substrate, the non-porous surface has one or more of lower surface activity, lower reactivity, and lower adsorption.

11 . The thermal chemical vapor deposition product of claim 1 , wherein the non-porous surface includes a porosity of less than 1%.

12 . The thermal chemical vapor deposition product of claim 1 , wherein the non-porous surface is deposited at a super-decomposition temperature of dimethylsilane.

13 . The thermal chemical vapor deposition product of claim 1 , wherein the non-porous surface is substantially devoid of surface activity.

14 . The thermal chemical vapor deposition product of claim 1 , wherein the non-porous surface is substantially devoid of discoloration.

15 . A thermal chemical vapor deposition product, comprising:
a ceramic substrate; and a non-porous surface on the ceramic substrate; wherein the non-porous surface is a thermal chemical vapor deposition coating, the thermal chemical vapor deposition coating including a silicon oxide; wherein the ceramic substrate includes a porosity of at least 50%; and wherein the non-porous surface includes a porosity of less than 1%.

16 . The thermal chemical vapor deposition product of claim 15 , wherein the non-porous surface is non-conductive.

17 . The thermal chemical vapor deposition product of claim 15 , wherein the non-porous surface comprises a thermal insulator.

18 . A process comprising transporting fluid along a non-porous surface, the non-porous surface being positioned on a ceramic substrate and being a thermal chemical vapor deposition coating.

19 . The process of claim 18 , wherein the process is a porosity-impacted process.

20 . The process of claim 19 , wherein the porosity-impacted process is selected from the group consisting of vacuum processing, plasma processing, and a combination thereof.

Assignees

• Silcotek Corp

Inventors

• Mattzela James B
• Yuan Min
• Smith David A
• Silvis Paul H

Classifications

• C23C16/44

  characterised by the method of coating (C23C16/04 takes precedence) · CPC title

• C04B35/62222 Primary

  obtaining ceramic coatings (coating of mortars, concrete, artificial or natural stone or ceramics C04B41/45; laminated ceramic products B32B18/00; coating of glass C03C17/00, applying ceramic coatings on silicon for semi-conductor purposes H10W; coating metallic materials C23) · CPC title

• C04B35/14

  based on silica · CPC title

• C23C16/50

  using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title

• C04B41/87

  Ceramics · CPC title