Tuner, microwave plasma source and impedance matching method

Patent metadata

Field	Value
Publication number	US-2016276139-A1
Application number	US-201615073762-A
Country	US
Kind code	A1
Filing date	Mar 18, 2016
Priority date	Mar 20, 2015
Publication date	Sep 22, 2016
Grant date	—

Abstract

A tuner 43 includes a microwave transmission path 51, having a coaxial structure, configured to transmit a supplied microwave to a planar slot antenna 101; slugs 61 a and 61 b made of a dielectric material and configured to be moved along the microwave transmission path 51; a slug driving unit 70 configured to move the slugs 61 a and 61 b along the microwave transmission path 51; and a control unit 80 configured to perform impedance matching by controlling positions of the slugs such that they are located at a matching position where a reflection coefficient is small, and configured to control, based on a state of the plasma, a matching track through which the slugs 61 a and 61 b reach the matching position.

First claim

We claim:

1 . A tuner, to which a microwave is supplied from a microwave power source, of transmitting the microwave to a planar antenna which radiates the microwave and matching an impedance of a plasma load with a characteristic impedance of the microwave power source in a plasma processing apparatus in which a plasma process is performed by generating plasma within a chamber with the microwave, the tuner comprising:
a microwave transmission path, having a coaxial structure, configured to transmit the supplied microwave to the planar antenna; at least two slugs made of a dielectric material and configured to be moved along the microwave transmission path; a driving unit configured to move the at least two slugs along the microwave transmission path; and a control unit configured to perform impedance matching by controlling positions of the at least two slugs such that the at least two slugs are located at a matching position where a reflection coefficient is small, and configured to control, based on a state of the plasma, a matching track through which the at least two slugs reach the matching position.

2 . The tuner of claim 1 ,
wherein the control unit is further configured to control the matching track of the at least two slugs such that a plasma state, where the plasma is extinguished or an operation becomes unstable, is not generated in the matching track.

3 . The tuner of claim 1 ,
wherein the control unit comprises a storage unit having stored therein a relationship between the positions of the at least two slugs and plasma emission intensity under each of various plasma conditions, and the control unit is further configured to control the matching track of the at least two slugs based on the relationship stored in the storage unit.

4 . The tuner of claim 1 ,
wherein the control unit is further configured to control the matching track of the at least two slugs based on a detection value of a plasma emission sensor configured to detect plasma emission intensity within the chamber.

5 . A microwave plasma source in a plasma processing apparatus in which a plasma process is performed by generating microwave plasma within a chamber, the microwave plasma source comprising:
a microwave output unit, having a microwave power source, configured to output a microwave; and a microwave supply unit configured to transmit the microwave outputted from the microwave output unit and radiate the microwave into the chamber, wherein the microwave supply unit comprises: a tuner as claimed in claim 1 ; and an antenna unit having a planar antenna configured to radiate the microwave transmitted from the tuner toward the chamber.

6 . The microwave plasma source of claim 5 ,
wherein the microwave output unit further comprises a splitter configured to split the microwave into multiple microwaves, the microwave supply unit further comprises a plurality of antenna modules configured to guide the multiple microwaves into the chamber, and each antenna module comprises the tuner and the antenna unit.

7 . An impedance matching method performed in a tuner, to which a microwave is supplied from a microwave power source, of transmitting the microwave to a planar antenna which radiates the microwave and matching an impedance of a plasma load with a characteristic impedance of the microwave power source in a plasma processing apparatus in which a plasma process is performed by generating plasma within a chamber with the microwave, the impedance matching method comprises:
performing an impedance matching by controlling positions of at least two slugs made of a dielectric material and configured to be moved along a microwave transmission path having a coaxial structure, such that the at least two slugs are located at a matching position where a reflection coefficient is small; and controlling, based on a state of the plasma, a matching track as a moving path through which the at least two slugs reach the matching position.

8 . The impedance matching method of claim 7 ,
wherein the matching track of the at least two slugs is controlled such that a plasma state, where the plasma is extinguished or an operation becomes unstable, is not generated in the matching track.

9 . The impedance matching method of claim 7 ,
wherein a relationship between the positions of the at least two slugs and plasma emission intensity under each of various plasma conditions is stored, and the matching track of the at least two slugs is controlled based on the stored relationship.

10 . The impedance matching method of claim 7 ,
wherein the matching track of the at least two slugs is controlled based on a detection value of a plasma emission sensor configured to detect plasma emission intensity within the chamber.

Assignees

• Tokyo Electron Ltd

Inventors

• Osada Yuki
• Miyashita Hiroyuki

Classifications

• H01J37/32311 Primary

  Circuits specially adapted for controlling the microwave discharge · CPC title

• H01J2237/334

  Etching · CPC title

• H01J37/3222

  Antennas · CPC title

• H01J37/32917

  Plasma diagnostics · CPC title

• H01J37/32192

  Microwave generated discharge (H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence) · CPC title